A Collimated X-Ray Lithography Source Using a Kumakhov Lens

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9303184 Piestrup The primary objective of the proposed work is the construction of a prototype x-ray-lithography source for the production of microintegrated circuits. Using an available 10-kW electron beam the source will deliver a uniform x-ray distribution of 3-5 mW/cm2 over an area of 6 cm2 at a distance of 2 m from the radiator. The transition-radiation source without optics will deliver 48 mW of x-ray power in the 1-4 keV photon energy range. Previously, we have obtained 15.2 mW of total power with a nonuniform power density of 1 mW/Cm2 at a distance of 3m. Uniformity and collection of the x-rays will be accomplished by a novel x-ray capillary (Kumakhov) optic. Phase I measurements and computer simulations show that good x-ray transmission through the lens can be obtained for the 1 to 3 key photon-energy range. An existing high-current accelerator, x-ray beamline and optic aligner are available for this work. A transition-x-ray lithography system promises performance that is superior to laser-plasma sources and is considerably less expensive than synchrotron sources. ***