SBIR Phase I: Synchrotron Mimic for Lithography

这个小型企业创新研究(SBIR)第一阶段项目将开发一种紧凑型光刻光源。作为同步加速器的等价物，该方案提供了一种单步进、XUV或软X射线源，它具有高亮度、高准直度、中等工作真空度、良好的光谱和适中的成本。电子穿过由薄金属箔、晶体或多层膜构成的薄辐射体，在紧凑型电子加速器内产生正向X射线束，其光子能量可以是XUV、软X射线或硬X射线，具体取决于辐射体的选择。作为同步加速器的模拟器，源程序可以有很多应用。对于光刻，可以优化x射线波长以获得最高的光刻胶灵敏度，例如1.4 nm。在主要实验的证明中，观察到了安装在电子加速器内的薄晶体和多层辐射器发出的可调谐单色X射线。通过相对于电子束方向摇动晶体或多层膜来获得和调谐脉冲高度谱。我们将使用我们现有的实验设备来展示软X射线波长下的高X射线通量。潜在的商业应用努力将展示产生用于光刻和晶体学的XUV和X射线的能力。它还可以用作成像的医用信号源和用于科学目的的实验室信号源，目前仅限于同步加速器使用。

This Small Business Innovation Research (SBIR) Phase I project will develop a compact source for lithography. As a synchrotron equivalent, this proposal presents a single-stepper, XUV or soft-x-ray source, which offers high brightness, high collimation, modest operating vacuum, excellent spectrum and moderate cost. The x-rays are generated inside a compact betatron by the electrons passing through thin radiators made of thin metal foils, crystals or multi-layers producing a forward-directed beam of x-rays whose photon energies can be XUV, soft and hard x-ray depending upon choice of radiator. As a synchrotron mimic, the source can have many applications. For lithography the x-ray wavelength can be optimized for highest photo-resist sensitivity, e.g.1.4 nm. In a proof of principal experiments, tunable monochromatic x-rays from thin crystal and multi-layer radiators mounted inside a betatron have been observed. Pulse-height spectra were obtained and tuned by rocking the crystal or multi-layer relative to the electron-beam direction. We will use our existing experimental apparatus to demonstrate high x-ray flux at soft x-ray wavelengths.Potential commercial applications effort will demonstrate the capability of generating XUV and x-rays for lithography and crystallography. It can also function also as a medical source for imaging and as a laboratory source for scientific purposes now relegated exclusively to synchrotrons.