U.S.-Japan Cooperative Research: Optoelectronic Circuit Design and Fabrication

点击翻译按钮获取中文摘要

9315335 Bachmann This award supports a two-year collaborative research project between Professor Klaus Bachmann, Department of Materials Science and Engineering, North Carolina State University, and Dr. Mitsumasa Koyanagi, Research Center for Integrated Systems, Hiroshima University, Japan. The joint research will focus on the development of new technologies for vertical optical interconnection of silicon (Si) devices by III-V compound semiconductor optoelectronic devices using active and passive optical components. The following research issues will be addressed: (1) heteroepitaxy of III-V optoelectronic materials on Si chips; (2) heteroepitaxy of Si on III-V optoelectronic heterostructures devices; (3) low-damage dry- etching of Si and III-V's; (4) metal contacts to Si and III-V's; and (5) passive optical components including waveguides and dielectric mirrors. The U.S. and Japanese research groups are already working on projects closely related to the broader goals of the integrated program, and the interactions will build on and enhance the value of these programs. The expertise and facilities at Hiroshima University are in nanofabrication and optical integration, while the North Carolina State University group is strong in fundamental knowledge of materials growth, device processing, and materials characterization. These complementary attributes will permit the researchers to address advanced topics in both scientific and technological research areas that could not be pursued by either institution separately. This research is important for the successful development of new parallel processing computer system concepts such as optically coupled three dimensional common memory structures. ***