REG: Semiconductor Thin Film Growth/X-Ray Diffraction System
REG: Semiconductor Thin Film Growth/X-Ray Diffraction System
批准号:
9411668
负责人:
Randall Headrick
金额:
$5.34万
依托单位:
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
1994
资助国家:
美国
项目状态:
已结题
起止时间:
1994-08-01 至 1995-07-31
中文摘要
9411668 Headrick康奈尔高能同步加速器源(CHESS)和工程与应用物理学院以及康奈尔大学将建造一个半导体薄膜生长/X射线衍射系统,致力于支持薄膜微结构的研究。 具体而言,该设备将支持几个新的和现有的研究计划,研究使用气体源分子束外延(GSMBE),原子层外延(ALE)和其他新提出的使用离子,自由基和分子源的生长技术的宽带隙III-V材料薄膜的生长。 通过利用可用的高强度X射线束和CHESS,该系统将能够对生长过程中半导体薄膜的结构进行时间分辨测量。 这项研究的时间依赖性的影响,预计将在先进的生长技术和新的微观结构材料的发展产生关键的洞察力。 基于III-V族氮化物(即AlN、GaN和InN)的电子器件、光电子器件、光存储介质、保护涂层和UV透射窗口需要这样的结构。 ***
英文摘要
9411668 Headrick The Cornell High Energy Synchrotron Source(CHESS) and the School of Engineering and Applied Physics and Cornell University will construct a Semiconductor Thin Film Growth/X-ray Diffraction System dedicated to support research in thin film microstructures. Specifically, this equipment will support several new and existing research programs studying the growth o thin films of wide bandgap III-V materials using Gas Source Molecular Beam Epitaxy (GSMBE), Atomic Layer Epitaxy (ALE), and other new proposed growth techniques using ion, radical and molecular sources. By utilizing the high intensity x-ray bams available and CHESS, this system will be able to perform time resolved measurements of the structure of semiconductor thin films during growth. This research studying time-dependent effects is expected to yield critical insight in the development of advanced growth techniques and new microscopically structured materials. Such structures are needed for electronic devices, optoelectronic devices, optical storage media, protective coatings and UV-transmitting windows based on the III-V nitrides, i.e. AIN, GaN and InN. ***
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会议论文
In-situ X-ray Scattering Studies of Oxide Epitaxial Growth Kinetics and Dynamics
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批准号:2336506
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项目类别:Continuing Grant
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资助金额:$73.54万
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财政年份:2024
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负责人:Randall Headrick
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依托单位:
PFI-RP: Scalable Fabrication of Flexible Electronics and Solar Cells with Improved Environmental Stability
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批准号:1918723
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项目类别:Standard Grant
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资助金额:$54.72万
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财政年份:2019
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负责人:Randall Headrick
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依托单位:
In-situ and Operando Studies of Metastable and Transient States of Organic Semiconductor Thin Films
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批准号:1701774
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项目类别:Standard Grant
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资助金额:$42.0万
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财政年份:2017
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负责人:Randall Headrick
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依托单位:
Real-time X-ray Scattering Studies of Oxide Epitaxial Growth
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批准号:1506930
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项目类别:Standard Grant
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资助金额:$48.0万
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财政年份:2015
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负责人:Randall Headrick
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依托单位:
Real-Time Studies of Solution-Processed Organic Semiconductor Thin Films
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批准号:1307017
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项目类别:Continuing Grant
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资助金额:$37.19万
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财政年份:2013
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负责人:Randall Headrick
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依托单位:
MRI-R2: Development of a System for Real-Time X-Ray Scattering Analysis of Complex Oxide Thin Film Growth
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批准号:0959486
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项目类别:Standard Grant
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资助金额:$28.72万
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财政年份:2010
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负责人:Randall Headrick
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依托单位:
MRI: Development of a System for Thin Film Deposition of Highly Ordered Organic Materials.
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批准号:0722451
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项目类别:Standard Grant
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资助金额:$18.85万
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财政年份:2007
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负责人:Randall Headrick
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依托单位:
CAREER: X-Ray Diffraction Studies of Semiconductor and Metal Thin Film Growth
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批准号:0348354
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项目类别:Continuing Grant
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资助金额:$0.0万
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财政年份:2004
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负责人:Randall Headrick
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依托单位:
Development of a System for Time-resolved Studies of Film Growth and Processing and Student Training
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批准号:0216704
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项目类别:Continuing Grant
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资助金额:$14.0万
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财政年份:2002
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负责人:Randall Headrick
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依托单位:
海外基金