In-situ X-ray Scattering Studies of Oxide Epitaxial Growth Kinetics and Dynamics
In-situ X-ray Scattering Studies of Oxide Epitaxial Growth Kinetics and Dynamics
批准号:
2336506
负责人:
Randall Headrick
金额:
$73.54万
依托单位国家:
美国
项目类别:
Continuing Grant
财政年份:
2024
资助国家:
美国
项目状态:
未结题
起止时间:
2024-02-01 至 2027-01-31
中文摘要
第1部分:非技术性和X射线是探索材料的有力工具,由于其波长短,能够在没有强吸收的情况下穿透材料,因此能够通过衍射测量原子结构。在X射线源中,同步加速器是科学家可用的最亮的X射线源。该项目使用实时X射线散射来研究金属氧化物的结构和性质,金属氧化物以其显著的电学和磁性而闻名。研究人员的目标是通过密切研究这些材料的生长过程,特别是薄膜,来揭示这些材料的全部潜力。薄膜可能会产生与薄膜所源自的主体母体化合物显著不同的特性。通过连续捕捉生长过程中不断演变的X射线散射图案,该团队获得了晶层从汽相组装时的原子结构的见解。这一认识对于创造具有增强或全新性能的创新材料至关重要,包括通过晶格中正负离子的移动来存储电荷的能力(铁电效应)或在变形下产生电压的能力(压电效应)。这种效应,以及其他更奇特的效应,可以通过人工生产的薄膜的生长来定制,比如那些由两种不同材料交替排列的薄膜,每种材料只有几个原子厚。金属氧化物的独特性质在电子存储器、探测器、致动器和能量收集器中得到了应用。除了其科学影响,该项目还通过为研究生提供实践培训,并让本科生参与尖端研究,在教育和多样性方面发挥了关键作用。第二部分:技术概述本项目探索了围绕生长过程对金属氧化物薄膜的结构、界面和功能特性的影响的基本问题。除了获得高质量薄膜的传统目标之外,重点是发现独特的生长模式和界面,这些模式和界面可能导致性能与主体母体化合物中观察到的性能显著不同。该项目整合了铁电薄膜的互补测量,以建立合成、结构表征和所产生的材料特性之间的反馈回路,从而允许与传统材料的基准特性进行比较。该研究计划包括三个关键目标:1)现场研究脉冲激光外延(PLE)过程,以揭示具有不同表面扩散速率的单个物种在生长过程中的作用;2)调整铁电薄膜的组成以控制磁区取向、偏置和开关行为;3)动态探索铁电超晶格中极化和磁区结构随薄膜厚度、静电和应变边界条件的变化。利用相干X射线散射方法,该项目旨在探索通过其他方法无法轻易获得的时空相关性,从而为该领域的知识深度做出重大贡献。该项目由陶瓷项目和既定的激励竞争研究计划(EPSCoR)联合资助。该奖项反映了NSF的法定使命,并通过使用基金会的智力价值和更广泛的影响审查标准进行评估,被认为值得支持。
英文摘要
PART 1: NON-TECHNICAL SUMMARYX-rays are a powerful tool for exploring materials, capable of measuring atomic structures through diffraction owing to their short wavelength and their ability to penetrate materials without strong absorption. Synchrotrons, among X-ray sources, stand out as the brightest available to scientists. This project employs real-time X-ray scattering to investigate the structure and properties of metal oxides, known for their remarkable electrical and magnetic properties. The researchers aim to unveil the full potential of these materials by closely studying their growth processes, with a specific focus on thin films. Thin films could give rise to properties significantly different to those in the bulk parent compounds from which the films derive. By continuously capturing an evolving X-ray scattering pattern during growth, the team gains insights into the atomic structure of crystalline layers as they assemble from the vapor phase. This understanding is pivotal in creating innovative materials with enhanced or entirely new properties, including the ability to store an electrical charge via a shift in positive and negative ions in the crystal lattice (ferroelectric effect) or generate electrical voltage under deformation (piezoelectric effect). Such effects, along with other more exotic ones, can be tailored through the growth of artificially produced thin films, such as those with alternating layers of two different materials, each only a few atoms thick. The unique properties of metal oxides find applications in electronic memories, detectors, actuators, and energy harvesters. Beyond its scientific impact, the project plays a crucial role in education and diversity by offering hands-on training to graduate students and involving undergraduates in cutting-edge research. PART 2: TECHNICAL SUMMARY This project explores fundamental questions surrounding the influence of growth processes on the structure, interfaces, and functional properties of metal oxide thin films. Going beyond the conventional goal of achieving high-quality films, the focus is on uncovering unique growth modes and interfaces that could lead to properties significantly divergent from those observed in the bulk parent compounds. The project integrates complementary measurements of ferroelectric films to establish a feedback loop between synthesis, structural characterization, and resulting material properties, allowing for comparisons with baseline properties of conventional materials. The research plan includes three key pursuits: 1) In-situ study of processes in Pulsed Laser Epitaxy (PLE) to unveil the roles of individual species with disparate surface diffusion rates on growth, 2) Tuning the composition of ferroelectric thin films to engineer domain orientation, bias, and switching behavior, and 3) Dynamic exploration of polarization and domain structure in ferroelectric superlattices as a function of thin film thickness and electrostatic and strain boundary conditions. Utilizing coherent X-ray scattering methods, the project aims to probe spatiotemporal correlations that are not readily accessible by other means, thereby contributing significantly to the intellectual depth of the field.This project is jointly funded by Ceramics Program and the Established Program to Stimulate Competitive Research (EPSCoR).This award reflects NSF's statutory mission and has been deemed worthy of support through evaluation using the Foundation's intellectual merit and broader impacts review criteria.
期刊论文(0)
专著(0)
科研奖励(0)
会议论文
PFI-RP: Scalable Fabrication of Flexible Electronics and Solar Cells with Improved Environmental Stability
-
批准号:1918723
-
项目类别:Standard Grant
-
资助金额:$54.72万
-
财政年份:2019
-
负责人:Randall Headrick
-
依托单位:
In-situ and Operando Studies of Metastable and Transient States of Organic Semiconductor Thin Films
-
批准号:1701774
-
项目类别:Standard Grant
-
资助金额:$42.0万
-
财政年份:2017
-
负责人:Randall Headrick
-
依托单位:
Real-time X-ray Scattering Studies of Oxide Epitaxial Growth
-
批准号:1506930
-
项目类别:Standard Grant
-
资助金额:$48.0万
-
财政年份:2015
-
负责人:Randall Headrick
-
依托单位:
Real-Time Studies of Solution-Processed Organic Semiconductor Thin Films
-
批准号:1307017
-
项目类别:Continuing Grant
-
资助金额:$37.19万
-
财政年份:2013
-
负责人:Randall Headrick
-
依托单位:
MRI-R2: Development of a System for Real-Time X-Ray Scattering Analysis of Complex Oxide Thin Film Growth
-
批准号:0959486
-
项目类别:Standard Grant
-
资助金额:$28.72万
-
财政年份:2010
-
负责人:Randall Headrick
-
依托单位:
MRI: Development of a System for Thin Film Deposition of Highly Ordered Organic Materials.
-
批准号:0722451
-
项目类别:Standard Grant
-
资助金额:$18.85万
-
财政年份:2007
-
负责人:Randall Headrick
-
依托单位:
CAREER: X-Ray Diffraction Studies of Semiconductor and Metal Thin Film Growth
-
批准号:0348354
-
项目类别:Continuing Grant
-
资助金额:$0.0万
-
财政年份:2004
-
负责人:Randall Headrick
-
依托单位:
Development of a System for Time-resolved Studies of Film Growth and Processing and Student Training
-
批准号:0216704
-
项目类别:Continuing Grant
-
资助金额:$14.0万
-
财政年份:2002
-
负责人:Randall Headrick
-
依托单位:
REG: Semiconductor Thin Film Growth/X-Ray Diffraction System
-
批准号:9411668
-
项目类别:Standard Grant
-
资助金额:$5.34万
-
财政年份:1994
-
负责人:Randall Headrick
-
依托单位:
国内基金
海外基金
登录
查看更多内容
基于慧眼-HXMT宽能段观测的X射线吸积脉冲星磁场研究
-
批准号:12373051
-
项目类别:面上项目
-
资助金额:55.00万元
-
批准年份:2023
-
负责人:侯贤
-
依托单位:
同步X-ray成像对调控自噬的联合疗法抗三阴性乳腺癌机制研究
-
批准号:22ZR1470600
-
项目类别:省市级项目
-
资助金额:--
-
批准年份:2022
-
负责人:张瑜
-
依托单位:
基于时空信息融合的2D X-ray到3D CT图像配准实时引导肺癌放疗研究
-
批准号:
-
项目类别:省市级项目
-
资助金额:--
-
批准年份:2022
-
负责人:肖汉光
-
依托单位:
土壤孔隙结构调控斥水性土壤水分运动的作用机理研究
-
批准号:42107329
-
项目类别:青年科学基金项目(C类)
-
资助金额:30.0万元
-
批准年份:2021
-
负责人:李生平
-
依托单位:
蛋白质紫外吸收光谱的机器学习模拟
-
批准号:22103019
-
项目类别:青年科学基金项目(C类)
-
资助金额:30.0万元
-
批准年份:2021
-
负责人:张衿潇
-
依托单位:
不同基因型大豆根系生长改善压实土壤结构的机制研究
-
批准号:42007010
-
项目类别:青年科学基金项目
-
资助金额:24.0万元
-
批准年份:2020
-
负责人:任利东
-
依托单位:
荷载、浸水条件下花岗岩残积土微细观结构演化及损伤本构关系
-
批准号:51978413
-
项目类别:面上项目
-
资助金额:60.0万元
-
批准年份:2019
-
负责人:赵燕茹
-
依托单位:
基于X射线线形分析技术的钒高温高压强度特性研究
-
批准号:11872056
-
项目类别:面上项目
-
资助金额:63.0万元
-
批准年份:2018
-
负责人:敬秋民
-
依托单位:
基于原位局域表面等离子体共振技术的CeO2/Ag催化剂表界面效应探索及在催化氧化甲醛中应用
-
批准号:21802066
-
项目类别:青年科学基金项目
-
资助金额:26.6万元
-
批准年份:2018
-
负责人:卜奕玢
-
依托单位:
CAT、DSA、x-ray与解剖技术相结合确立小腿后外侧皮支链皮瓣血管构筑
-
批准号:31860294
-
项目类别:地区科学基金项目
-
资助金额:42.0万元
-
批准年份:2018
-
负责人:秦向征
-
依托单位: