GOALI: Plasma Enhanced Chemical Vapor Deposition of Photorefractive Ferroelectric Waveguides
GOALI: Plasma Enhanced Chemical Vapor Deposition of Photorefractive Ferroelectric Waveguides
批准号:
9423666
负责人:
Mark Cronin-Golomb
金额:
$32.9万
依托单位:
依托单位国家:
美国
项目类别:
Continuing Grant
财政年份:
1996
资助国家:
美国
项目状态:
已结题
起止时间:
1996-08-01 至 2000-07-31
中文摘要
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英文摘要
9423666 Cronin-Golomb The object of this research is to investigate the use of plasma enhanced metalorganic chemical vapor deposition (PE-CVD) grown electro-optic and photorefractive thin films as nonlinear optical waveguide devices. Potential applications include compact self-aligning reconfigurable optical interconnects and switches and compact high speed electrooptic modulators. This Tufts University/NZ Applied Technologies project will be performed as a collaboration between university researchers with expertise in photorefractive nonlinear optics and researchers in industry with expertise in perovskite PE-CVD. The first part of the project will be devoted to developing PE-CVD grown epitaxial films of the ferroelectric perovskites barium titanate and strontium barium niobate. The films will be evaluated as waveguides, figures of merit for photorefractive and electro-optic response will be determined, and their use as phase conjugate mirrors and beam couplers will be studied. The films will be grown on various substrates to determine those which might be suitable for direct integration of photorefractive thin film devices into optoelectronic integrated circuits. ***
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批准号:8714699
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依托单位:
Presidential Young Investigator Award: Photo Refractive Non-Linear Optics
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批准号:8658025
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资助金额:$31.75万
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负责人:Mark Cronin-Golomb
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依托单位:
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负责人:Santosh Kumar
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依托单位: