Stability of Intermetallic Contacts to Compound Semiconductor Alloys Lattice-Matched to Indium Phosphide

小行星9424478 本研究的目的是调查的稳定性的金属间化合物接触到两种化合物半导体合金，InGaAs和InAlAs，这是晶格匹配的InP，并研究选定的金属间化合物接触到这两种化合物半导体合金的电学行为。 四元体系的热力学稳定性将通过测定相关的相平衡来研究。 四点探针法和传输线法将被用来研究欧姆接触的电学行为。 对于那些提供显著肖特基接触的材料组合，将使用I-V和C-V方法。 金属间化合物膜将通过溅射沉积而沉积在化合物半导体合金上，并且接触的退火将使用快速热退火炉来进行。 金属/半导体界面将在沉积状态和退火后使用各种表面敏感技术进行表征，包括TEM，SAM和GAXRD（掠射角X射线衍射）。所提出的研究的结果，预计将提供改进的基本理解的金属间化合物/化合物半导体合金组合的电行为之间的关系，在其界面处的热力学和动力学稳定性。 同时，研究调查可以对实际应用的光电和高速电子设备的设计和开发产生重大影响。 该计划的一个重要特点是在材料研究的基础和技术重要领域对学生进行培训。***

9424478 Chang The objectives of this research are to investigate the stability of intermetallic contacts to two compound semiconductor alloys, InGaAs and InAlAs, which are lattice-matched to InP, and to study the electrical behavior of selected intermetallic contacts to these two compound semiconductor alloys. The thermodynamic stabilities of the quaternary systems will be studied by determining relevant phase equilibria. Both the four-point probe and transmission line methods will be used to study the electrical behavior of the ohmic contacts. For those material combinations giving significant Schottky contacts, both I-V and C-V methods will be used. Films of intermetallics will be deposited on the compound semiconductor alloys by sputter deposition, and annealing of the contacts will be carried out using a rapid thermal annealing furnace. The metal/semiconductor interfaces will be characterized in the as-deposited state and after annealing using a variety of surface-sensitive techniques, including TEM, SAM and GAXRD (glancing angle x-ray diffraction). %%% The results of the proposed study are expected to provide improved fundamental understanding of the relationship between electrical behavior of intermetallics/compound semiconductor alloy combinations, and the thermodynamic and kinetic stabilities at their interfaces. Concurrently, the research investigation can have a significant impact on the design and development of optoelectronic and high-speed electronic devices for practical applications. An important feature of the program is the training of students in a fundamentally and technologically significant area of materials research. ***