Dynamics of Electron Beam Ablation

吉尔根巴赫CTS-9522282建议将他在脉冲激光烧蚀方面的工作扩展到沟道火花脉冲电子束烧蚀这一新的薄膜生长方法。其目标将是开发一个关于电子束烧蚀的知识库和标度律，可以与激光烧蚀相比较，从而评估新的工程应用。将解决五项研究任务。这些包括：(1)电子束表征、能量沉积机制和电效率；(2)使用激光和光学技术的物种组成(原子、离子和电子)的诊断表征；(3)颗粒和熔滴的产生机制、大小和密度；(4)电子传输、聚焦和背景气体中的等离子体化学的影响；(5)电子束烧蚀沉积薄膜及其与诊断的相关性。在适用的情况下，将与相应的激光消融结果进行比较。电子束将使用沟道火花装置产生，其中使用大电流(~1.5kA)和中等电压(~20keV)，产生大约1J/脉冲的束流能量。PI计划在本次调查过程中进行实验和建模工作。

Abstract Gilgenbach CTS-9522282 The PI proposes to extend his work on pulsed laser ablation to the new film growth method of channel-spark pulsed electron beam ablation. The objectives would be to develop a knowledge base and scaling laws on electron beam ablation, which can be compared to laser ablation and thus evaluate new engineering applications. Five research tasks will be addressed. These include: (1) electron beam characterization, energy deposition mechanisms and electrical efficiency; (2) diagnostic characterization, using laser and optical techniques, of species composition (atoms, ions and electrons); (3) particulate and molten droplet generation mechanisms, size and density; (4) effects of electron transport, focusing, and plasma chemistry in background gases; and (5) electron beam ablative deposition of thin films and correlation with diagnostics. Where applicable comparisons will be made with the corresponding laser ablation results. The electron beams will be generated using a channel-spark device in which high currents (~1.5 kA),and moderate voltages (~20 keV) are employed, resulting in beam energy of approximately 1 J/pulse. The PI plans to carry out both experimental and modeling efforts during the course of this investigation.