Dynamics of Electron Beam Ablation

电子束烧蚀动力学

• 批准号: 9522282
• 负责人: Ronald Gilgenbach
• 金额: $ 26.05万
• 依托单位: Regents of the University of Michigan - Ann Arbor
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 1995
• 资助国家: 美国
• 起止时间: 1995-08-15 至 1999-07-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=9522282&HistoricalAwards=false
• 关键词: Dynamics; Electron; Beam; Ablation

Abstract Gilgenbach CTS-9522282 The PI proposes to extend his work on pulsed laser ablation to the new film growth method of channel-spark pulsed electron beam ablation. The objectives would be to develop a knowledge base and scaling laws on electron beam ablation, which can be compared to laser ablation and thus evaluate new engineering applications. Five research tasks will be addressed. These include: (1) electron beam characterization, energy deposition mechanisms and electrical efficiency; (2) diagnostic characterization, using laser and optical techniques, of species composition (atoms, ions and electrons); (3) particulate and molten droplet generation mechanisms, size and density; (4) effects of electron transport, focusing, and plasma chemistry in background gases; and (5) electron beam ablative deposition of thin films and correlation with diagnostics. Where applicable comparisons will be made with the corresponding laser ablation results. The electron beams will be generated using a channel-spark device in which high currents (~1.5 kA),and moderate voltages (~20 keV) are employed, resulting in beam energy of approximately 1 J/pulse. The PI plans to carry out both experimental and modeling efforts during the course of this investigation.

Gilgenbach CTS-9522282摘要 PI建议将他在脉冲激光烧蚀方面的工作扩展到通道火花脉冲电子束烧蚀的新薄膜生长方法。 其目标是开发一个知识库和电子束烧蚀的比例律，可以与激光烧蚀进行比较，从而评估新的工程应用。 将开展五项研究工作。其中包括：（1）电子束表征、能量沉积机制和电效率;（2）利用激光和光学技术对物种组成进行诊断表征（3）微粒和熔滴产生机制、尺寸和密度;（4）背景气体中电子传输、聚焦和等离子体化学的影响;（5）电子束烧蚀沉积薄膜及其与诊断的相关性。如适用，将与相应的激光消融结果进行比较。 电子束将使用通道火花装置产生，其中采用高电流（~1.5 kA）和中等电压（~20 keV），导致约1 J/脉冲的束能量。 PI计划在调查过程中进行实验和建模工作。