U.S.-Japan Joint Seminar: Formation of Ion Nanobeams and Application to Material Processing

该奖项支持美国科学家/工程师参加将于1997年11月16日至21日在日本奈良举行的“离子纳米束的形成及其在材料加工中的应用”美日研讨会。共同组织者是马里兰大学的John Malngailis教授和日本大阪大学的Kenji Gamo教授。本次研讨会将讨论与离子束及其在材料加工中的应用有关的广泛主题，包括离子源和光学，离子束辐照效应，纳米制造，聚焦离子束在无掩模器件加工中的应用，以及离子束在微量分析中的应用。聚焦离子束现在广泛应用于集成电路行业，在故障分析期间精确切割集成电路中的单个组件，在原型设计阶段重新布线集成电路，以及修复掩模。随着集成电路最小尺寸的缩小，离子微束继续发挥这些功能将需要取得重大进展。此外，目前的研究可能会在微机械加工和半导体器件制造方面带来新的应用。精细聚焦离子束领域的主要实际发展发生在美国和日本。这次研讨会汇集了来自大学和工业界的研究人员。与该领域的日本专家交流想法和数据将使美国参与者能够推进自己的工作，并为未来的合作项目奠定基础。＊＊＊

9603429 Melngailis This award supports the participation of American scientists/engineers in a U.S.-Japan seminar on Formation of Ion Nanobeams and Applications to Materials Processing to be held in Nara, Japan from November 16-21, 1997. The co- organizers are Professors John Malngailis of the University of Maryland and Kenji Gamo of Osaka University in Japan. This seminar will address a broad range of topics related to ion beams and their application to materials processing, including ion sources and optics, ion beam irradiation effects, nanofabrication, application of focused ion beams to maskless device processing, and the use of ion beams for microanalysis. %%% Focused ion beams are now widely used in the integrated circuits industry for precisely sectioning individual components in integrated circuits during failure analysis, for rewiring integrated circuits during the prototyping phase, and for repair of masks. As minimum dimensions in integrated circuits shrink, significant advances will be needed for ion microbeams to continue to serve these functions. In addition, present research may lead to new applications in micromachining and semiconductor devise fabrication. The main practical developments in the area of finely focused ion beams have occurred in the United States and Japan. This seminar brings together researchers from both universities and industry. The exchange of ideas and data with Japanese experts in this field will enable U.S. participants to advance their own work, and will set the stage for future collaborative projects. ***