Low dimensional H2 gas in semiconductors
Low dimensional H2 gas in semiconductors
批准号:
106393372
负责人:
Privatdozent Dr. Eduard Lavrov
金额:
$0.0万
依托单位国家:
德国
项目类别:
Research Grants
财政年份:
2009
资助国家:
德国
项目状态:
已结题
起止时间:
2008-12-31 至 2011-12-31
中文摘要
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英文摘要
In Si, Ge, and GaAs, high concentrations of hydrogen result in extended planar defects called platelets. In semiconductors hydrogenated from a plasma, the dominating structures are those lying in the {111} crystallographic planes. At least two types of the {111} platelets are known to exist in Si and Ge. The one which will be addressed in this project is characterized by a dielectric constant є ≈ 1 and holds a two dimensional gas of molecular hydrogen. The present project is focused on a fundamental aspect of the platelets, the properties of the two dimensional H2 gas trapped within the {111} platelets. Our main interests include phase transitions; H2 nuclear spin-flip; intermolecular interaction; and interaction of H2 with the host atoms.
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依托单位:
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