The Physics of Epitaxial Crystal Growth: A Quantitative X-ray Scattering Study

外延晶体生长的物理学：定量 X 射线散射研究

• 批准号: 9623827
• 负责人: Paul Miceli
• 金额: $ 23.44万
• 依托单位: University of Missouri-Columbia
• 依托单位国家: 美国
• 项目类别: Continuing Grant
• 财政年份: 1996
• 资助国家: 美国
• 起止时间: 1996-09-15 至 2002-08-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=9623827&HistoricalAwards=false
• 关键词: Physics; Epitaxial; Crystal; Growth; Quantitative

w:\awards\awards96\*.doc 9623827 Miceli The physical behavior of epitaxial crystal growth will be studied through experiments which critically test current theoretical predictions as well as motivate new ideas for fundamental inquiry. Using x-ray scattering instrumentation located at the University of Missouri and at the National Synchrotron Light Source (NSLS) at Brookhaven National Laboratory, the research quantitatively investigates height f1uctuations of a growing crystal surface which arise intrinsically from the growth process, as well as induced extrinsically from extended crystalline defects. The scientific program includes: (1) New experiments which utilize the unique combination of surface and bulk sensitivity of x-rays to address the origin of misfit dislocation induced surface roughness, (2) Extensive in situ experiments on metals to test theories of kinetic roughening, and (3) Novel experiments to investigate transient growth dynamics. The information from these experiments will provide insight on how atoms move and assemble on the surface, thereby leading to a better understanding of the growth dynamics. The project is fundamental in nature, but the results will be relevant to a range technologically important disciplines. %%% The object of this research is the investigation, at atomic scale, of fundamental physical processes that are involved in the growth of thin films. This is important because thin films are used in a myriad of technological applications; e. g. semiconductor devices, adhesives, catalysts and surface coatings. All of these applications rely on the ability to control the surface morphology of the films. The project will use unique x-ray scattering facilities at the University of Missouri and at the Brookhaven National Laboratory National Synchrotron Light Source (NSLS). I n particular, the extremely intense synchrotron x-ray radiation at the NSLS will allow the study of the temporal evolution of a rough surface film. The information from these experiments will provide insight on how atoms move and assemble on the surface, thereby leading to a better understanding of the growth dynamics. The project is fundamental in nature, but the results will be relevant to a range technologically important disciplines. ***

w：\awards\awards96\*.doc 9623827 Miceli 外延晶体生长的物理行为将通过严格测试当前的理论预测，以及激发基本调查的新想法的实验进行研究。 使用位于密苏里州大学和布鲁克海文国家实验室的国家同步加速器光源（NSLS）的X射线散射仪器，该研究定量研究了生长晶体表面的高度波动，这种波动本质上是由晶体生长引起的。 成长过程， 作为 以及从 扩展的晶体缺陷。该科学计划包括：（1）利用X射线表面和体敏感性的独特组合的新实验，以解决失配位错引起的表面粗糙度的起源，（2）对金属进行广泛的原位实验，以测试动力学粗糙化理论，和（3）研究瞬时生长动力学的新实验。 这些实验的信息将提供关于原子如何在表面上移动和组装的见解，从而更好地理解生长动力学。 该项目本质上是基础性的，但其结果将与一系列技术上重要的学科有关。 本研究的目的是在原子尺度上研究薄膜生长过程中的基本物理过程。这一点很重要，因为使用薄膜 在 无数的技术应用; e. G. 半导体器件、粘合剂、催化剂和表面涂层。 所有这些应用都依赖于控制薄膜表面形态的能力。该项目将使用密苏里州大学和布鲁克海文国家实验室国家同步加速器光源（NSLS）的独特X射线散射设施。特别是，在NSLS的极强的同步加速器X射线辐射将允许粗糙表面膜的时间演化的研究。这些实验的信息将提供关于原子如何在表面上移动和组装的见解，从而更好地理解生长动力学。该项目本质上是基础性的，但其结果将与一系列技术上重要的学科有关。 ***