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The Physics of Epitaxial Crystal Growth: A Quantitative X-ray Scattering Study

The Physics of Epitaxial Crystal Growth: A Quantitative X-ray Scattering Study
外延晶体生长的物理学:定量 X 射线散射研究
批准号:
9623827
负责人:
Paul Miceli
金额:
$23.44万
依托单位国家:
美国
项目类别:
Continuing Grant
财政年份:
1996
资助国家:
美国
项目状态:
已结题
起止时间:
1996-09-15 至 2002-08-31

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w:\awards\awards96\*.doc 9623827 Miceli The physical behavior of epitaxial crystal growth will be studied through experiments which critically test current theoretical predictions as well as motivate new ideas for fundamental inquiry. Using x-ray scattering instrumentation located at the University of Missouri and at the National Synchrotron Light Source (NSLS) at Brookhaven National Laboratory, the research quantitatively investigates height f1uctuations of a growing crystal surface which arise intrinsically from the growth process, as well as induced extrinsically from extended crystalline defects. The scientific program includes: (1) New experiments which utilize the unique combination of surface and bulk sensitivity of x-rays to address the origin of misfit dislocation induced surface roughness, (2) Extensive in situ experiments on metals to test theories of kinetic roughening, and (3) Novel experiments to investigate transient growth dynamics. The information from these experiments will provide insight on how atoms move and assemble on the surface, thereby leading to a better understanding of the growth dynamics. The project is fundamental in nature, but the results will be relevant to a range technologically important disciplines. %%% The object of this research is the investigation, at atomic scale, of fundamental physical processes that are involved in the growth of thin films. This is important because thin films are used in a myriad of technological applications; e. g. semiconductor devices, adhesives, catalysts and surface coatings. All of these applications rely on the ability to control the surface morphology of the films. The project will use unique x-ray scattering facilities at the University of Missouri and at the Brookhaven National Laboratory National Synchrotron Light Source (NSLS). I n particular, the extremely intense synchrotron x-ray radiation at the NSLS will allow the study of the temporal evolution of a rough surface film. The information from these experiments will provide insight on how atoms move and assemble on the surface, thereby leading to a better understanding of the growth dynamics. The project is fundamental in nature, but the results will be relevant to a range technologically important disciplines. ***
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Crystal Growth at the Nanoscale: New Phenomena Revealed by In situ X-ray Scattering
  • 批准号:
    0706278
  • 项目类别:
    Continuing Grant
  • 资助金额:
    $32.28万
  • 财政年份:
    2007
  • 负责人:
    Paul Miceli
  • 依托单位:
New Mechanisms in Epitaxial Crystal Growth: The Role of Incorporated Defects Revealed By In-Situ X-ray Scattering
  • 批准号:
    0405742
  • 项目类别:
    Standard Grant
  • 资助金额:
    $0.0万
  • 财政年份:
    2004
  • 负责人:
    Paul Miceli
  • 依托单位:
Development of an In Situ Growth and Analysis Chamber for X-Ray Scattering Experiments at the Advanced Photon Source
  • 批准号:
    9414013
  • 项目类别:
    Continuing Grant
  • 资助金额:
    $28.73万
  • 财政年份:
    1995
  • 负责人:
    Paul Miceli
  • 依托单位:
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