Acquisition of a Versataile Microwave Plasma CVD System

微波等离子体化学气相的获得 具有ECR（电子）能力的CVD系统 回旋共振）源、原位加热器级和DC 偏压将创造一个多功能的CVD设施， 为 在宽范围的压力下沉积， 温度 附加组件，包括12个通道 质量流量控制器、真空泵、疏水阀和压力 指示器/控制器将完成CVD 系统 此外，2个额外的反应室将避免 交叉污染，因为不同的沉积物 材料通过Co-PI提供灵活的清洁 而不会造成反应堆停机 微波等离子cvd 系统还将能够增强化学蒸汽 难以处理的沉积和独特的非平衡态 材料/相，例如立方氮化硼（c）-BN， 范围 的 温度（包括中等温度） 到 低 由于ECR源和原位加热器， 阶段 该系统将具有初始能力， 沉积 的 一 广泛 范围 的 高科技 几个研究项目所需的材料/涂层 PI和Co-PI。 该CVD系统将用于 合成 先进薄膜/涂层 和 独特 材料特别包括：（a）碳化物，氮化物， 或氧化物涂层， 工程纤维基质界面，用于研究其 在裂纹桥接，断裂， 和基体开裂行为的研究， 纤维增强陶瓷复合材料项目 （B） 高温合金上的热/氧化屏障涂层， 复合材料 为 飞机/航空航天应用; （c）第（1）款 用于电子、传感器和腐蚀的陶瓷薄膜 （d）超硬c-BN涂层 因为这种材料性能 比金刚石涂层更好地切割铁基合金 还有几家美国公司，比如肯纳金属公司，MegaDiamond公司，通用电气公司， 和Milacron对c-BN和热性能表现出了兴趣 阻隔涂层 虽然所有这些都很有趣 材料，只有几个重要的，如氧化 纤维涂层，c-BN，热/氧化阻挡层 (ZrO2/Al_2O_3）和PZT。 一个 跨学科团队由多个 来自材料科学系的教师和 工程和访问学者将使用 用于处理涂层的微波等离子体CVD系统 目前和未来的研究项目。 一起 该团队拥有超过40年的累积经验， 化学气相沉积材料的加工和表征 他们的财产。 该系统的可用性将 增强 他们的 综合能力 独特 用于纤维增强的无机涂层 复合材料， 切割 工具， 腐蚀 保护， 电子和环境相关领域。 一个强大 许多行业对研究表示出兴趣， 工作将成为可能，因为可用性 这个设施。

Acquisition of a microwave plasma chemical vapor deposition (CVD) system with capability for ECR (electron cyclotron resonance) source, in situ heater stage, and DC bias will create a versatile CVD facility with capability for deposition over a wide range of pressures and temperatures. Additional components including 12 channel mass flow controllers, vacuum pump, traps, and pressure indicators/controllers will complete the CVD system. Furthermore, the 2 additional reactor chambers will avoid cross contamination because of the deposition of different materials by Co-PIs providing flexibility in cleaning without the reactor downtime. The microwave plasma CVD system will also be capable of enhancing chemical vapor deposition of hard-to-process and unique nonequilibrium materials/phases such as cubic boron nitride (c)-BN over a range of temperatures (including moderate to low temperatures) because of the ECR source and in situ heater stage. The system will have an initial capability for deposition of a broad range of high-tech materials/coatings required for several research projects of PI and Co-PIs. This CVD system will be used to synthesize advanced thin films/coatings and unique materials including in particular: (a) Carbide, nitride, or oxide coatings on a broad range of fibers to create engineered fiber-matrix interfaces for studying their roles on the micromechanics of crack bridging, fracture, and matrix cracking behaviors in a number of research, projects on fiber-reinforced ceramic composites; (b) Thermal/oxidation barrier coatings on superalloys and composites for aircraft/aerospace applications; (c) Ceramic thin films for electronics, sensor, and corrosion protection applications; and (d) Super-hard c-BN coating for cutting tool inserts because this material performance better than diamond coating for cutting iron-based alloys and several US companies like Kennametal, MegaDiamond, GE, and Milacron have showed interest in c-BN and thermal barrier coatings. While all of these are interesting materials, only a few important ones, such as oxidation resistant fiber coatings, c-BN, thermal/oxidation barrier (ZrO2/Al2O3) , and PZT will be synthesized initially. An interdisciplinary team consisting of several faculty from the Department of Materials Science and Engineering and a Visiting Scholar will be using the proposed microwave plasma CVD system to process coatings for the current and future research projects. Together this team has over 40 years of cumulative experience with the processing of materials by CVD and characterization of their properties. The availability of the system will enhance their capabilities for synthesizing unique inorganic coatings for applications in fiber-reinforced composites, cutting tools, corrosion protection, electronics, and environmental-related areas. A strong interest is shown by a number of industries on research work that will become possible because of the availability of this facility.