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Investigations of Chemical Mechanical Polishing

Investigations of Chemical Mechanical Polishing
化学机械抛光的研究
批准号:
9872595
负责人:
Steven Danyluk
金额:
$5.0万
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
1998
资助国家:
美国
项目状态:
已结题
起止时间:
1998-09-01 至 2001-07-31

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英文摘要
ABSTRACTEEC-9872595Danyluk/GA Tech This is an Exploratory Research Project to augment the Industry/University Cooperative Research Center for Engineering Tribology.This joint project involves a study of the fundamental issues associated with chemical mechanical polishing. In particular, the research will develop fundamental relationships between a 'soft' and a 'hard' surface in the presence of fluids trapped at the interface. To be studied are asperity size, mechanical properties and geometric placement, and the influence of multiple pad liners structures on polishing characteristics. The research should lead to new strategies for polishing and for the development of polishing machines
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