Investigations of Chemical Mechanical Polishing

化学机械抛光的研究

• 批准号: 9872595
• 负责人: Steven Danyluk
• 金额: $ 5万
• 依托单位: Georgia Tech Research Corporation
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 1998
• 资助国家: 美国
• 起止时间: 1998-09-01 至 2001-07-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=9872595&HistoricalAwards=false
• 关键词: Investigations; Chemical; Mechanical; Polishing

ABSTRACTEEC-9872595Danyluk/GA Tech This is an Exploratory Research Project to augment the Industry/University Cooperative Research Center for Engineering Tribology.This joint project involves a study of the fundamental issues associated with chemical mechanical polishing. In particular, the research will develop fundamental relationships between a 'soft' and a 'hard' surface in the presence of fluids trapped at the interface. To be studied are asperity size, mechanical properties and geometric placement, and the influence of multiple pad liners structures on polishing characteristics. The research should lead to new strategies for polishing and for the development of polishing machines

摘要EEC-9872595 Danyluk/GA Tech 这是一个探索性的研究项目，以加强工业/大学合作研究中心的工程摩擦学。这个联合项目涉及的基本问题的研究与化学机械抛光。 特别是，该研究将开发一个“软”和“硬”表面之间的基本关系，在界面处被困的流体的存在。 要研究的是微凸体的尺寸，机械性能和几何位置，以及多垫衬垫结构对抛光特性的影响。 这项研究将为抛光和抛光机的发展带来新的策略