Non-Local Electron Transport in Inductively Coupled Plasmas

本项目使用分析方法和数值模拟来了解低压下（低于10 mTorr）电感耦合等离子体（icp）中的近无碰撞电子传输。研究了无碰撞加热和反常集肤效应，重点研究了射频电流引起的振荡磁场和外加静态磁场对无碰撞加热和反常集肤效应的影响。由于功率沉积剖面的效率是使用ICP放电的重要问题，因此特别注意施加的放电频率与自生电位阱中电子的弹跳频率之间的共振，或施加静态磁场时回旋加速器频率之间的共振。在后一种情况下，研究了低强度静态磁场，以努力确定功率沉积剖面。非局部方法是一种分析低压等离子体的强大方法，它被扩展到包括电正性（氩）和电负性（氯）等离子体的近无碰撞状态。从这些电子动力学和输运研究中获得的见解被纳入了极低压力下icp的自一致模拟中。通过测量表征良好的ICP反应器中的电磁场和电子分布函数，对模型和模拟结果进行了实验验证。强调了方法，以便该方法可以扩展到其他高密度，低压等离子体，如电子回旋共振（ECR）和螺旋等离子体工具。低压、高密度等离子体，包括电感耦合等离子体（icp），对于保持大面积表面加工的均匀性是必要的，这是微电子工业的首要目标。它们也与材料加工、荧光灯照明和其他等离子体应用相关。该项目包括与欧司朗Sylvania、普林斯顿等离子体物理实验室、韩国先进科学技术研究所和萨斯喀彻温大学的合作。

This project uses analytical methods and numerical simulations to understand the near-collisionless electron transport in inductively coupled plasmas (ICPs) at low pressures - below 10 mTorr. Collisionless heating and the anomalous skin effect are studied with emphasis on the influence of the oscillatory magnetic field induced by the RF current and an externally applied static magnetic field. Since the efficiency of power deposition profiles are important issues in the use of ICP discharges, particular attention is paid to resonances between the applied discharge frequency and the bounce frequency of electrons in the self-generated potential well, or the cyclotron frequency in the case of the applied static magnetic field. In the latter case, low-intensity static magnetic fields are studied in an effort to contour the power deposition profiles. The non-local approach, a powerful method for analyzing low-pressure plasmas, is extended to cover the near-collisionless regime in both electropositive (argon) and electronegative (chlorine) plasmas. The insight from these studies of electron kinetics and transport are incorporated into self-consistent simulations of ICPs at very low pressures. The models and simulations are tested experimentally by measurement of electromagnetic fields and electron distribution functions in well-characterized ICP reactors. Methodology is stressed so that the approach can be extended to other high-density, low-pressure plasmas such as electron cyclotron resonance (ECR) and helicon plasma tools.Low-pressure, high-density plasmas, including inductively coupled plasmas (ICPs) are necessary to maintain uniformity when processing large-area surfaces, a paramount goal of the microelectronics industry. They also have relevance for materials processing, fluorescent lighting, and other plasma applications.This project includes collaborations with Osram Sylvania, the Princeton Plasma Physics Laboratory, the Korea Advanced Institute of Science and Technology, and the University of Saskatchewan.