Implementation of Deep Reactive Ion Etching Technology for the Advancement of MEMS and Micro/nanotechnology Research at the University of Louisville

路易斯维尔大学实施深度反应离子蚀刻技术以促进 MEMS 和微/纳米技术研究

• 批准号: 0079650
• 负责人: Kevin Walsh
• 金额: $ 33.3万
• 依托单位: University of Louisville Research Foundation Inc
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2000
• 资助国家: 美国
• 起止时间: 2000-08-01 至 2002-07-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=0079650&HistoricalAwards=false
• 关键词: Implementation; Deep; Reactive; Ion; Etching

This MRI proposal enhances and expands upon the active MEMS and Micro/Nanotechnology research program at the University of Louisville through the acquisition of an Inductively Coupled Plasma (ICP) Deep Reactive Ion Etching (DRIE) System. The proposal builds upon (a) existing competitive research facilities in micro/nanotechnology, (b) an interdisciplinary collection of research-oriented faculty from engineering and science departments across the campus, and (c) a significant commitment by the University. The requested DRIE System will provide the enabling technology needed to realize the promise of MEMS and micro/nantechnology over the next decade and to train the engineers and scientists who will use this technology. The specific research activities addresses in this proposal can be grouped into the following concentration areas and are consistent with the expertise of the PIs: 1) Novel DRIE Processing Methodologies, 2) RF MEMS, 3) DRIE-fabricated Sensors and Detectors, 4) Optical MEMS (MOEMS), 5) Microfluidics and Lab-on-a-Chip Systems, 6) Diamond MEMS, 7) CVD Processing of High Aspect Ratio DRIE-fabricated Micromolds, and 8) Application of ICP RIE to Nanolithography. While the heart of this proposal is the development and application of exciting new research opportunities, an education and outreach program will be developed with both updated and new courses that implement DRIE technology, MEMS, and micro/nanofabrication and an associated new Certificate Program. Involved students and industrial professionals will graduate after immersion in an environment with sound science, state-of-the-art technical expertise, and applications to real world problems.

该MRI建议通过获取电感耦合等离子体（ICP）深度反应离子蚀刻（DRIE）系统，增强和扩展了路易斯维尔大学的主动MEM和微/纳米技术研究计划。该提案建立在（a）微/纳米技术中的现有竞争性研究设施，（b）校园内工程和科学部门的跨学科研究集合，以及（c）大学的重要承诺。 所需的DRIE系统将提供所需的能力技术，以实现未来十年中MEMS和微技术的承诺，并培训将使用该技术的工程师和科学家。该提案中的具体研究活动可以分组到以下集中区域中，并且与PIS的专业知识一致：1）新型的Drie处理方法，2）RF MEMS，3）DRIE制作的传感器和检测器，4）光学MEMS（MOEMS）（MOEMS），5）MICROFLUIDICS和LAB-ON-AN-A-A-A-A-A-CHIPS SYSTEMS，6）钻石，6），6），6），6），6），6），6），6），6）diamond Mems，6） Drie型的微质量和8）将ICP RIE应用于纳米光刻。尽管该提案的核心是开发和应用令人兴奋的新研究机会，但将开发一个教育和外展计划，并使用更新和新课程来实施DRIE技术，MEMS和微型/纳米改造以及相关的新证书计划。参与的学生和工业专业人员将在具有合理科学，最先进的技术专长以及对现实世界问题的应用中浸入环境后毕业。