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Materials Processing for Ferromagnetic Wide Bandgap Nitride Heterostructures

Materials Processing for Ferromagnetic Wide Bandgap Nitride Heterostructures
铁磁宽带隙氮化物异质结构的材料加工
批准号:
0101438
负责人:
Stephen Pearton
金额:
$0.0万
依托单位:
依托单位国家:
美国
项目类别:
Continuing grant
财政年份:
2001
资助国家:
美国
项目状态:
已结题
起止时间:
2001-04-01 至 2004-03-31

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中文摘要
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英文摘要
This project will investigate advanced materials processing methods that do not disrupt spin-injection and transport in order to polarize, inject, transport, control, store and detect spins in semiconductors. The discovery of ferromagnetism in (In, Mn)As and (Ga,Mn)As opens an opportunity to explore the combination of high purity heterostructures and ferromagnetism. However the low Curie temperature for these materials (35K and 110K, respectively), limits their practical impact; in sharp contrast, (Ga,Mn)N is predicted to have a TC ~400K. This project will address the following topics: (i) development of low resistance p-ohmic contacts with sharp metal/semiconductor interfaces to allow efficient injection of spin-polarized currents into various heterostructures, e.g., (Ga,Mn)N/GaN, (Ga,Mn)N/InGaN; (ii) the development of appropriate plasma chemistries for equi-rate and selective dry etching of (Ga,Mn)N and related materials. For etching Mn, high density F2-based plasma chemistries have been successful. The normal Cl2-based chemistries for GaN will need to be altered in order to obtain equi-rate removal of all three lattice constituents in the (Ga,Mn)N; (iii) implantation/isolation needed in selective area doping for contact formation and for intra-device electrical and optical isolation. It is expected to achieve efficient doping of (Ga,Mn)N using Si+ for n-type and Mg+/P+ for p-type doping. The thermal stability of the (Ga,Mn)N during annealing will also be explored, in order to study formation of other phases or precipitates; (iv) examine the interaction of H with Mn-if passivation occurs, this will lower TC. The thermal stability of the effect, the reactivation kinetics (both thermal and by minority-carrier injection) and the H diffusivity, will be investigated; (v) fabrication of various test structures to enable a measurement of the spin injection efficiency-these include a GaMnN/AlGaN/GaN light-emitting diode and a GaMnN spinfet. The significance of the research will be the development of an understanding of how to process (Ga,Mn)N to achieve efficient spin injection and transport, as the basis for novel device structures.%%%The project addresses basic research issues in a topical area of materials science having high technological relevance. The research will contribute basic materials science knowledge at a fundamental level to important aspects of electronic/photonic devices. The basic knowledge and understanding gained from the research is expected to contribute to improving the perform-ance and stability of advanced devices and circuits by providing a fundamental understanding and a basis for designing and producing improved materials, and materials combinations. An important feature of the program is the integration of research and education through the training of students in a fundamentally and technologically significant area.***
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Impact Ionization Coefficients in Ga2O3
  • 批准号:
    1856662
  • 项目类别:
    Continuing Grant
  • 资助金额:
    $33.12万
  • 财政年份:
    2019
  • 负责人:
    Stephen Pearton
  • 依托单位:
Band Offsets and Interface State Densities in Crystalline and Amorphous Oxide Systems for Photonics, Sensors and Electronics
  • 批准号:
    1159682
  • 项目类别:
    Standard Grant
  • 资助金额:
    $32.55万
  • 财政年份:
    2012
  • 负责人:
    Stephen Pearton
  • 依托单位:
p-type Doping of ZnO Using Ion Implantation
  • 批准号:
    0703340
  • 项目类别:
    Standard Grant
  • 资助金额:
    $24.0万
  • 财政年份:
    2007
  • 负责人:
    Stephen Pearton
  • 依托单位:
Materials Processing for ZnO
  • 批准号:
    0400416
  • 项目类别:
    Continuing grant
  • 资助金额:
    $0.0万
  • 财政年份:
    2004
  • 负责人:
    Stephen Pearton
  • 依托单位:
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Sirt1通过调控Gli3 processing维持SHH信号促进髓母细胞瘤的发展及机制研究
  • 批准号:
    82373900
  • 项目类别:
    面上项目
  • 资助金额:
    48万元
  • 批准年份:
    2023
  • 负责人:
    王媛
  • 依托单位:
靶向Gli3 processing调控Shh信号通路的新型抑制剂治疗儿童髓母细胞瘤及相关作用机制研究
  • 批准号:
    82104210
  • 项目类别:
    青年科学基金项目(C类)
  • 资助金额:
    30.0万元
  • 批准年份:
    2021
  • 负责人:
    丰涛
  • 依托单位: