Impact Ionization Coefficients in Ga2O3
Impact Ionization Coefficients in Ga2O3
批准号:
1856662
负责人:
Stephen Pearton
金额:
$33.12万
依托单位:
依托单位国家:
美国
项目类别:
Continuing Grant
财政年份:
2019
资助国家:
美国
项目状态:
已结题
起止时间:
2019-07-01 至 2023-06-30
中文摘要
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英文摘要
Nontechnical description: The project is focused on fundamental materials properties of wide bandgap semiconductor, gallium oxide, which shows promise in a range of electrical and optical systems. Since this is a relatively unexplored material, there is a need to establish its basic properties, including parameters that are important for understanding how the material will behave under high electric fields. The research is particularly addressing the impact ionization coefficients, which are currently not established experimentally. The proposed research plan is tackling these parameters at different electric fields and temperatures and is comparing them to the established theory for high voltage behavior in other semiconductor materials. The research, which combines both experimental studies and advanced simulations, is aimed at developing a fundamental understanding of the way in which electrons and holes behave in this promising wide bandgap semiconductor. The role of defects and impurities on the high voltage characteristics of this material impacts a range of technologies including power control electronics in electric vehicles and associated charging infrastructure, ultraviolet emitters and detectors and high frequency/high temperature electronics. The activities provide collaborative research opportunities for a graduate student and several undergraduate students and also engages high school students from underrepresented groups and economically disadvantaged backgrounds.Technical description: The research focuses on fundamental studies of the breakdown mechanism and the role of common defect types and their density on carrier multiplication in gallium oxide. This is a promising material for high power, high temperature systems applications. This proposal will establish basic materials parameters and their electric field and temperature dependence, which are needed to understand the carrier transport and multiplication mechanisms in gallium oxide. The fundamental relations governing the electron and hole transport at high electric fields and over a range of temperatures in gallium oxide needs to be established experimentally. More specifically, the experimental studies focus on examining the temperature dependence of impact ionization coefficients using carrier injection into structures which are biased at a variety of voltages to establish an electric field. The carrier multiplication anticipated under such conditions effect can also be affected by the type and density of defects in the material and this needs to be quantified by examining samples with different defect densities. The research employs electrical characterization techniques, including temperature-dependent current-voltage and diffusion length measurements, with structural analysis using transmission electron microscopy with chemical analysis to provide detailed insights on how defects affect the breakdown characteristics of gallium oxide at high voltages. The experiments are supported by advanced electrical simulations as a function of temperature and voltage, which are used to study the expected influence of these parameters on impact ionization of carriers and transport through the gallium oxide layers. The studies are establishing the transport parameters, which are relevant not only for the basic materials science but also for understanding high temperature operation of gallium oxide based power electronics and solar-blind photodetectors.This award reflects NSF's statutory mission and has been deemed worthy of support through evaluation using the Foundation's intellectual merit and broader impacts review criteria.
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Electron beam probing of non-equilibrium carrier dynamics in 18 MeV alpha particle- and 10 MeV proton-irradiated Si-doped β -Ga 2 O 3 Schottky rectifiers
18 MeV α 粒子和 10 MeV 质子辐照 Si 掺杂 β -Ga 2 O 3 肖特基整流器中非平衡载流子动力学的电子束探测
DOI:
10.1063/5.0052601
发表时间:
2021
期刊:
Applied Physics Letters
影响因子:
4
作者:
[Modak, Sushrut, Chernyak, Leonid, Schulte, Alfons, Xian, Minghan, Ren, Fan, Pearton, Stephen J., Lubomirsky, Igor, Ruzin, Arie, Kosolobov, Sergey S., Drachev, Vladimir P.]
通讯作者:
Drachev, Vladimir P.
Transport and trap states in proton irradiated ultra-thick κ-Ga2O3
质子辐照超厚 γ-Ga2O3 中的输运态和俘获态
DOI:
10.1116/6.0002673
发表时间:
2023
期刊:
Journal of Vacuum Science & Technology A
影响因子:
2.9
作者:
[Polyakov, A. Y., Nikolaev, V. I., Pechnikov, A. I., Yakimov, E. B., Lagov, P. B., Shchemerov, I. V., Vasilev, A. A., Kochkova, A. I., Chernykh, A. V., Lee, In-Hwan]
通讯作者:
Lee, In-Hwan
Comparison of 10 MeV Neutron Irradiation Effects on NiO/Ga 2 O 3 Heterojunction Rectifiers and Ni/Au/Ga 2 O 3 Schottky Rectifiers
10 MeV中子辐照对NiO/Ga 2 O 3 异质结整流器和Ni/Au/Ga 2 O 3 肖特基整流器效果的比较
DOI:
10.1149/2162-8777/ace54e
发表时间:
2023
期刊:
ECS Journal of Solid State Science and Technology
影响因子:
2.2
作者:
[Li, Jian-Sian, Xia, Xinyi, Chiang, Chao-Ching, Wan, Hsiao-Hsuan, Ren, Fan, Kim, Jihyun, Pearton, S. J.]
通讯作者:
Pearton, S. J.
Editors’ Choice—Vibrational Properties of Oxygen-Hydrogen Centers in H + - and D + -Implanted Ga 2 O 3
编辑选择 – H 和 D 注入 Ga 2 O 3 中氧-氢中心的振动特性
DOI:
10.1149/2162-8777/abd458
发表时间:
2020
期刊:
ECS Journal of Solid State Science and Technology
影响因子:
2.2
作者:
[Portoff, Amanda, Venzie, Andrew, Qin, Ying, Stavola, Michael, Fowler, W. Beall, Pearton, Stephen J.]
通讯作者:
Pearton, Stephen J.
Deep level defect states in β-, α-, and ɛ -Ga 2 O 3 crystals and films: Impact on device performance
β-、α- 和 É-Ga 2 O 3 晶体和薄膜中的深能级缺陷态:对器件性能的影响
DOI:
10.1116/6.0001701
发表时间:
2022
期刊:
Journal of Vacuum Science & Technology A
影响因子:
2.9
作者:
[Polyakov, Alexander Y., Nikolaev, Vladimir I., Yakimov, Eugene B., Ren, Fan, Pearton, Stephen J., Kim, Jihyun]
通讯作者:
Kim, Jihyun
共 39 条
Band Offsets and Interface State Densities in Crystalline and Amorphous Oxide Systems for Photonics, Sensors and Electronics
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批准号:1159682
-
项目类别:Standard Grant
-
资助金额:$32.55万
-
财政年份:2012
-
负责人:Stephen Pearton
-
依托单位:
p-type Doping of ZnO Using Ion Implantation
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批准号:0703340
-
项目类别:Standard Grant
-
资助金额:$24.0万
-
财政年份:2007
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负责人:Stephen Pearton
-
依托单位:
Materials Processing for ZnO
-
批准号:0400416
-
项目类别:Continuing grant
-
资助金额:$0.0万
-
财政年份:2004
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负责人:Stephen Pearton
-
依托单位:
Materials Processing for Ferromagnetic Wide Bandgap Nitride Heterostructures
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批准号:0101438
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项目类别:Continuing grant
-
资助金额:$0.0万
-
财政年份:2001
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负责人:Stephen Pearton
-
依托单位:
Ion Implantation Doping Isolation of III-Nitrides
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批准号:9732865
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项目类别:Continuing grant
-
资助金额:$0.0万
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财政年份:1998
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负责人:Stephen Pearton
-
依托单位:
Role of Light Ion Impurities (Hydrogen, Oxygen, Carbon) in III-V Nitrides
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批准号:9421109
-
项目类别:Continuing grant
-
资助金额:$0.0万
-
财政年份:1995
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负责人:Stephen Pearton
-
依托单位:
海外基金