Acquisition of Deep Reactive Ion Etching Instrument
购置深度反应离子蚀刻仪
基本信息
- 批准号:0116144
- 负责人:
- 金额:$ 30.58万
- 依托单位:
- 依托单位国家:美国
- 项目类别:Standard Grant
- 财政年份:2001
- 资助国家:美国
- 起止时间:2001-09-01 至 2003-08-31
- 项目状态:已结题
- 来源:
- 关键词:
项目摘要
0116144DalalRecently, the advent of MEMS and the ability to deposit thin film electronic devices on virtually any substrate has made many novel electronic, MEMS, microfluidic and biological devices possible. Examples of such devices would be in-situ thin-film electronic sensors and thin film transistors deposited in etched groves for detecting and controlling fluid flow in microfluidic and biological devices; neural reconnection using trenches etched in quartz or Si; electrical stimulation of nerve growth in trenches using in-situ deposited active devices; MEMS devices for sensing chemical pollutants, using ultra-thin piezoelectric membranes and selective receptor sites; DNA analysis using microchambers; implantable micropumps for drug delivery; Soi1CHIP for in-situ testing of soils; chemical lab on a chip etc. Most of these devices need the ability to etch deeply and controllably in a variety of substrates, such as Si wafers, polymers and quartz microplates. Some of the etching has to go ~100 micrometer deep.At Iowa State University, and also at the PIs sister institution, the University of Iowa, a number of innovative projects are underway in this area which integrate electronic technology with biological and microfluidic technologies. Some of the noteworthy projects involve directed nerve regrowth in severed central nervous systems, using trenches in Si ,quartz or polymers to guide the direction of the regrowth; microfluidic channels for implantable micropumps; detection of trace chemicals for forensic testing using specialized chemical coatings on MEMS type structures; analytical laboratory on a chip; development of thin film transistors in deep trenches; development of nanocoatings for surfaces in MEMS type channels; measurement of structure and stress in cytoskeletons etc. All these projects need a deep reactive ion etching system. The one the PIs have stops at about 5 micrometer. In this project, they propose to purchase a versatile, laboratory-scale, deep uv reactive ion etching system from Oxford Instruments, which uses the patented Bosch process to achieve etching as deep as 100 micrometer. It is expected that this new system will allow them to successfully carry out some of the current and future projects in these very new and exciting fields of electro-biology, chemical MEMS, medical MEMS and opto-mechanical MEMS.This instrument is capable of deep etching, using both Chlorine and Fluorine-based gases. The Oxford Instruments system is a proven lab-scale system, with a high density ICP plasma source, RE biasing of the substrate, capabilities for backside cooling of substrates and the provision for a load-lock. It is a cluster tool which can be added on to in later stages. It comes equipped with the appropriate flow controllers and corrosive service pumps. They propose to add to it, at their cost, an in-line high-resolution, computer-controlled optical emission spectroscopy (OES) system from Acton Research which will be very useful for understanding and controlling the different plasmas that one needs when etching quartz and polymers such as polyimide, PET and biological polymers.This instrument will be housed at the Microelectronics Research Center(MRC) at Iowa State University. MRC is an interdisciplinary facility set up by Iowa State to provide research capabilities in the general area of semiconductors and MEMS for faculty and students from all departments. The PIs currently have students and faculty from EE, Materials Science and Engineering, ChemE, Physics, Chemistry, Mechanical Engineering, Industrial Engineering and Biology using MRC facilities extensively. They have many federally and industrially supported projects, and this new instrument will be useful to a wide group of faculty. Nearly 30 graduate students would benefit from having this instrument at MRC.MRC has qualified, experienced, technicians available for installing and running this instrument. They have the necessary environmental monitoring and gas-disposal facilities required for such an instrument. And they have over 20 years of experience in running plasma reactors, including a PIE system, which unfortunately does not do deep etching.The instrument will also help the PIs develop new courses in this area. They already have an extensive offering in the general semiconductor field, including several lab-based courses. They expect to add two inter-disciplinary course on plasma based manufacturing of electronic, MEMS and biological devices, and on measurement techniques if we get this instrument. Note that these courses will be open to both senior--level and graduate-level students. Thus, the educational impact will be felt both at undergraduate and graduate levels. The semiconductor and MEMS industries are very interested in having trained engineers in this field. So is the biomedical industry.The PIs have planned an extensive outreach
最近,MEMS的出现和在几乎任何衬底上存款薄膜电子器件的能力使得许多新颖的电子、MEMS、微流体和生物器件成为可能。这种装置的实例是沉积在蚀刻的格罗夫斯中的原位薄膜电子传感器和薄膜晶体管,用于检测和控制微流体和生物装置中的流体流动;使用蚀刻在石英或Si中的沟槽的神经重连;使用原位沉积的有源装置的沟槽中神经生长的电刺激;利用超薄压电膜和选择性受体位点检测化学污染物的MEMS装置;利用微室进行DNA分析;用于药物输送的可植入微型泵; Soi 1CHIP用于土壤的原位测试;芯片上的化学实验室等。这些设备中的大多数都需要能够在各种衬底上进行深度和可控的蚀刻,例如Si晶片,聚合物和石英微孔板。在爱荷华州州立大学,以及PI的姐妹机构爱荷华州大学,在这个领域正在进行一些创新项目,这些项目将电子技术与生物和微流体技术相结合。其中一些值得注意的项目涉及:利用硅、石英或聚合物中的沟槽来引导再生方向,在切断的中枢神经系统中定向神经再生;用于植入式微型泵的微流体通道;利用MEMS型结构上的专门化学涂层来检测法医检验所需的微量化学品;芯片上的分析实验室;在深沟中开发薄膜晶体管; MEMS型通道表面纳米涂层的开发;细胞骨架结构和应力的测量等。所有这些项目都需要一个深反应离子蚀刻系统。PI的一个停止在大约5微米处。在这个项目中,他们建议从Oxford Instruments购买一个多功能的实验室规模的深紫外反应离子蚀刻系统,该系统使用专利的Bosch工艺实现蚀刻深度达100微米。预计这一新系统将使他们能够成功地开展一些当前和未来的项目,这些非常新的和令人兴奋的领域包括电生物学,化学MEMS,医疗MEMS和光机械MEMS。该仪器能够使用氯基和氟基气体进行深度蚀刻。Oxford Instruments系统是一个经过验证的实验室规模系统,具有高密度ICP等离子体源、衬底的RE偏置、衬底背面冷却能力和负载锁定装置。这是一个组合工具,可在以后阶段添加。它配备了适当的流量控制器和腐蚀性服务泵。他们建议增加一个在线高分辨率,计算机控制的光学发射光谱(OES)系统,从阿克顿研究,这将是非常有用的理解和控制不同的等离子体时,需要蚀刻石英和聚合物,如聚酰亚胺,PET和生物聚合物。这台仪器将被安置在微电子研究中心(MRC)在爱荷华州州立大学。MRC是由爱荷华州建立的跨学科设施,为来自所有部门的教师和学生提供半导体和MEMS一般领域的研究能力。PI目前有来自EE,材料科学与工程,ChemE,物理,化学,机械工程,工业工程和生物学的学生和教师广泛使用MRC设施。他们有许多联邦政府和工业界支持的项目,这种新仪器将对广大教师有用。近30名研究生将受益于有这个仪器在MRC。MRC有合格的,经验丰富的,技术人员可用于安装和运行这个仪器。它们拥有这种仪器所需的必要环境监测和气体处理设施。他们在运行等离子体反应器方面有超过20年的经验,包括PIE系统,不幸的是,该系统不能进行深蚀刻。该仪器还将帮助PI开发该领域的新课程。他们已经在一般半导体领域提供了广泛的服务,包括几个基于实验室的课程。如果我们获得这台仪器,他们希望增加两门跨学科课程,涉及基于等离子体的电子、MEMS和生物设备制造以及测量技术。请注意,这些课程将开放给高年级和研究生水平的学生。因此,本科生和研究生都将感受到教育影响。半导体和MEMS行业对这一领域的训练有素的工程师非常感兴趣。生物医学产业也是。私家侦探计划了一个广泛的推广
项目成果
期刊论文数量(0)
专著数量(0)
科研奖励数量(0)
会议论文数量(0)
专利数量(0)
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Vikram Dalal其他文献
Larger nanodiscs support a more native-like membrane environment across a range of lipids
- DOI:
10.1016/j.bpj.2023.11.1881 - 发表时间:
2024-02-08 - 期刊:
- 影响因子:
- 作者:
Mark J. Arcario;Vikram Dalal;Wayland W. Cheng - 通讯作者:
Wayland W. Cheng
Exploring the effects of nanodiscs on the conformation of a pentameric ligand-gated ion channel
- DOI:
10.1016/j.bpj.2022.11.2134 - 发表时间:
2023-02-10 - 期刊:
- 影响因子:
- 作者:
Mark J. Arcario;Vikram Dalal;Grace H. Brannigan;Wayland W. Cheng - 通讯作者:
Wayland W. Cheng
Influence of oxygen on defect densities in nanocrystalline Si
- DOI:
10.1016/j.jnoncrysol.2012.01.049 - 发表时间:
2012-09-01 - 期刊:
- 影响因子:
- 作者:
Daniel Congreve;Shantan Kajjam;Nayan Chakravarty;Vikram Dalal - 通讯作者:
Vikram Dalal
Identification and evaluation of potential inhibitor molecules against TcyA from <em>Candidatus</em> Liberibacter asiaticus
- DOI:
10.1016/j.jsb.2023.107992 - 发表时间:
2023-09-01 - 期刊:
- 影响因子:
- 作者:
Sapna Lonare;Monica Sharma;Vikram Dalal;Mrugendra Gubyad;Pranav Kumar;Deena Nath Gupta;Akshay Pareek;Shailly Tomar;Dilip Kumar Ghosh;Pravindra Kumar;Ashwani Kumar Sharma - 通讯作者:
Ashwani Kumar Sharma
Amorphous and nanocrystalline p–i–n Si and Si,Ge photodetectors for structurally integrated O<sub>2</sub> sensors
- DOI:
10.1016/j.jnoncrysol.2007.09.065 - 发表时间:
2008-05-01 - 期刊:
- 影响因子:
- 作者:
Debju Ghosh;Ruth Shinar;Vikram Dalal;Zhaoqun Zhou;Joseph Shinar - 通讯作者:
Joseph Shinar
Vikram Dalal的其他文献
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{{ truncateString('Vikram Dalal', 18)}}的其他基金
EAGER:TDM Solar Cells: Research on CdSe-Si tandem junction cells
EAGER:TDM太阳能电池:CdSe-Si串联结电池的研究
- 批准号:
1664945 - 财政年份:2017
- 资助金额:
$ 30.58万 - 项目类别:
Standard Grant
Collaborative Proposal: High Efficiency Tandem Perovskite/CIS Solar Cell
合作提案:高效串联钙钛矿/CIS太阳能电池
- 批准号:
1507291 - 财政年份:2015
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$ 30.58万 - 项目类别:
Standard Grant
Collaborative Proposal: Fundamental Research on Physics of Instability of Organic Solar Cells
合作提案:有机太阳能电池不稳定性物理基础研究
- 批准号:
1336134 - 财政年份:2013
- 资助金额:
$ 30.58万 - 项目类别:
Standard Grant
US-India workshop on organic photovoltaic materials and devices
美印有机光伏材料与器件研讨会
- 批准号:
1332934 - 财政年份:2013
- 资助金额:
$ 30.58万 - 项目类别:
Standard Grant
GOALI: Novel Photonic Enhanced Inorganic-Organic Multi-junction Solar cell
GOALI:新型光子增强无机-有机多结太阳能电池
- 批准号:
1232067 - 财政年份:2012
- 资助金额:
$ 30.58万 - 项目类别:
Continuing Grant
EAGER: Novel Hybrid Inorganic-organic Tandem Junction Solar cells
EAGER:新型混合无机-有机串联结太阳能电池
- 批准号:
1140766 - 财政年份:2011
- 资助金额:
$ 30.58万 - 项目类别:
Standard Grant
MRI: Acquisition of Nanolithography Equipment
MRI:购置纳米光刻设备
- 批准号:
0922614 - 财政年份:2009
- 资助金额:
$ 30.58万 - 项目类别:
Standard Grant
GOALI: Thin Film Silicon Solar Cells on Plastic Substrates
目标:塑料基板上的薄膜硅太阳能电池
- 批准号:
0824091 - 财政年份:2008
- 资助金额:
$ 30.58万 - 项目类别:
Standard Grant
GOALI: Novel Nanocrystalline Silicon Solar Cells on Plastic Substrates
目标:塑料基板上的新型纳米晶硅太阳能电池
- 批准号:
0501251 - 财政年份:2005
- 资助金额:
$ 30.58万 - 项目类别:
Continuing Grant
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MRI:获得双面亚微米掩模对准器
- 批准号:
0420630 - 财政年份:2004
- 资助金额:
$ 30.58万 - 项目类别:
Standard Grant
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