NER: Atomic Lithography of Arbitrary Two-Dimensional Nanostructures

该提案是对NSE，NSF 01-157的回应。 该项目的重点是开发一种新的结构化原子沉积和光刻方法。 利用驻波光场聚焦中性原子束的光刻技术在纳米级制造方面显示出巨大的潜力。 然而，到目前为止，该方法仅限于产生空间周期性图案，这极大地限制了该技术的通用性。 在这种新的方法中，将使用一种新的合成光诱导透镜的方法，该方法允许在平面中的任意位置处产生单个局部光斑。 可以使用空间光调制器在没有机械运动的情况下扫描光斑，使得可以生成任意二维图案。 该项目由数学和物理科学理事会的物理和材料研究部门共同资助。

This proposal was received in response to NSE, NSF 01-157. The project focuses on the development of a new approach to structured atomic deposition and lithography. Lithography using neutral atom beams focused by standing wave light fields shows great promise for nanoscale fabrication. However, the method has so far been limited to the production of spatially periodic patterns, which greatly limits the versatility of the technique. In this new approach a new method of synthesizing light induced lenses which permit the creation of a single localized spot at an arbitrary position in the plane will be used. The spot can be scanned without mechanical motion using spatial light modulators, such that arbitrary two-dimensional patterns can be generated. The project is jointly funded by the Divisions of Physics and Materials Research in the Mathematical and Physical Sciences Directorate.