In-Situ Film Thickness and Stress Measurement Using Infrared Sensing

使用红外传感进行原位薄膜厚度和应力测量

• 批准号: 0217469
• 负责人: Thomas Mackin
• 金额: $ 16万
• 依托单位: University of Illinois at Urbana-Champaign
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2002
• 资助国家: 美国
• 起止时间: 2002-09-01 至 2005-06-30
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=0217469&HistoricalAwards=false
• 关键词: Situ; Film; Thickness; Stress; Measurement

The proposed research project presents a new method for measuring the thickness of thin films. A non-destructive, non-contacting infrared imaging system is synchronized to an AC heat source located within or below the film layer of interest. An AC approach is chosen to exploit differencing schemes that enable high-resolution thickness measurements. The proposed method provides a new tool for measuring the thickness of film coatings with implications in both research and technology. Preliminary experiments have shown that the proposed method is perfectly suitable for measuring film thickness in the range of several microns to millimeters. This proposal aims to extend the method to nanometer thick films by utilizing a radiative heat transfer scheme. The proposed experimental method can be implemented into a production environment for closed-loop feedback control during film deposition. The method is also amenable to quality control in high throughput production environments. As such, the proposed experimental method will significantly improve coating processes and dramatically decrease the time and expense required to improve coating performance and reliability.Using the infrared sensing technology developed in this program, film thickness, integrity and stress can be quantified at any stage of the coating process, both during deposition and/or after manufacture. The ability to monitor film thickness in-situ is a critical need for many applications, as current techniques are based largely on empirical processing studies and post-priori destructive evaluation. Add to that the ability to quantify stress and the method emerges as a significant contribution to the technology of thin film processing and characterization. The proposed method can be used in an enormous range of industrial applications, including (but not limited to): microelectronic fabrication and assembly, MEMS fabrication and performance, thermal barrier coatings used in the energy conversion industry, metallic coatings on glass, and paint or protective coatings in everything from airplanes to cell phones.

拟议的研究项目提出了一种测量薄膜厚度的新方法。非破坏性、非接触式红外成像系统与位于感兴趣的薄膜层内或下方的交流热源同步。选择 AC 方法来利用差分方案，从而实现高分辨率厚度测量。所提出的方法提供了一种测量薄膜涂层厚度的新工具，对研究和技术都有影响。初步实验表明，该方法非常适合测量几微米至毫米范围内的薄膜厚度。该提案旨在通过利用辐射传热方案将该方法扩展到纳米厚膜。所提出的实验方法可以实施到生产环境中，用于薄膜沉积过程中的闭环反馈控制。该方法还适合高通量生产环境中的质量控制。因此，所提出的实验方法将显着改进涂层工艺，并显着减少提高涂层性能和可靠性所需的时间和费用。使用本项目中开发的红外传感技术，可以在涂层过程的任何阶段（沉积期间和/或制造后）量化薄膜厚度、完整性和应力。原位监测薄膜厚度的能力是许多应用的关键需求，因为当前的技术主要基于经验加工研究和事后破坏性评估。除此之外，量化应力的能力和该方法对薄膜加工和表征技术做出了重大贡献。所提出的方法可用于广泛的工业应用，包括（但不限于）：微电子制造和组装、MEMS制造和性能、能源转换行业中使用的热障涂层、玻璃上的金属涂层以及从飞机到手机等各种领域的油漆或保护涂层。