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SBIR Phase II: A New Scale-Up Technology for Industrial Production of High Quality Semiconductor Nanocrystals

SBIR Phase II: A New Scale-Up Technology for Industrial Production of High Quality Semiconductor Nanocrystals
SBIR 第二阶段:用于工业生产高质量半导体纳米晶体的新型放大技术
批准号:
0321611
负责人:
Yongqiang Wang
金额:
$49.84万
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
2003
资助国家:
美国
项目状态:
已结题
起止时间:
2003-08-01 至 2005-07-31
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中文摘要
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英文摘要
This Small Business Innovation Research (SBIR) Phase II project proposes to develop the so-called Continuous Batch (CB) technology for the massive production of high quality semiconductor nanocrystals inexpensively. The CB technology has the following advantages over the most closely competitive technology, continuous flow production (CFP: It uses much less toxic and less expensive chemicals as reactants). To date, production of high quality semiconductor nanocrystals can only be performed in well-equipped labs and in very small (dozens of milligram) quantities. The CB's potential for cost savings, improved qualities (i.e. size distribution, optical absorption, and photoluminescence emission)and the high productivity (thousand kilograms/year) makes it superior in comparison to the existing CFP technology.
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