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SBIR Phase II: Vertical Electroabsorptive Modulated Laser (EML) Source for High-Speed Interconnects

SBIR Phase II: Vertical Electroabsorptive Modulated Laser (EML) Source for High-Speed Interconnects
SBIR 第二阶段:用于高速互连的垂直电吸收调制激光 (EML) 源
批准号:
0450619
负责人:
Majid Riaziat
金额:
$0.0万
依托单位:
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
2005
资助国家:
美国
项目状态:
已结题
起止时间:
2005-06-15 至 2008-05-31

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中文摘要
翻译
该SBIR第二阶段项目旨在制造并商业化用于高速(高达40Gbps)光互连的垂直电吸收调制激光器(V-EML),用于芯片到芯片、板对板和机架内光学应用。与目前使用铜互连或传统光纤链路的电数据总线相比,V-EML将能够制造用于计算机和通信网络中的多通道光纤数据总线的更高速度、更低成本、更低功耗和更小的光发射机。这项技术实际上消除了VCSEL光发射机的调制速度限制。同时,它以低成本保持了高的信道密度。V-EML的低功耗(~20 mW)和潜在的低体积成本(~1.0美元)将为多处理器计算机和服务器中的互连速度和功率障碍提供解决方案。利用V-EML可以实现50到100微米的阵列间距。这意味着2.5Tbps容量的阵列占用的空间不到1.0mm2。这比现有的铜互连技术节省了大量空间,并为过渡创造了另一个强大的动机。这项技术可以通过实现更快、更广泛的宽带服务部署,从该技术的商业化中提供社会效益。视听信息超快传输的潜力是巨大的,因为V-EML技术有助于消除数据通信瓶颈。V-EML开发的教育和科学益处出现在超级计算机领域,超级计算机具有足够的计算能力来进行复杂的科学模拟。应用包括气候建模以获得更好的预测,分子水平建模,如医学中的蛋白质折叠,农业中的生态系统建模,以及商业信息和经济统计的大规模分析。然后,当互联速度限制提高时,这些计算机可以运行得更快、更高效。
英文摘要
This SBIR Phase II project aims to fabricate and commercialize a Vertical Electro-absorptive Modulated Laser (V-EML) for high-speed (up to 40Gbps) optical interconnects for chip-to-chip, board-to-board, and intra-rack optical applications. Compared to current electrical data buses using copper interconnects or conventional fiber optic links, the V-EML will enable the fabrication of higher speed, lower cost, lower power consumption and smaller optical transmitters for multi-channel fiber optic data buses in computer and communication networks. This technology virtually removes the modulation speed limit of VCSEL optical transmitters. At the same time it maintains high channel density at low cost. The low power consumption of the V-EML (~20 mW) and its potential low cost in volume (~$1.0) will provide a solution to the interconnect speed and power barriers in multiprocessor computers and servers. An array spacing of 50 to 100 microns will be possible with V-EMLs. This means that an 8x8 array with 2.5 Tbps of capacity has less than 1.0 mm2 of footprint. This offers substantial space savings over the existing copper interconnect technology and creates another strong incentive for transition.This technology could provide societal benefits from the commercialization of this technology by enabling faster and more widespread deployment of broadband services. The potential for ultra-fast delivery of audiovisual information is enormous as the V-EML technology helps to remove data-com bottlenecks. Educational and scientific benefits of the V-EML development arise in the area of supercomputers with sufficient computing power for complex scientific simulations. Applications include climate modeling for better predictions, molecular level modeling such as protein folding in medicine, ecosystem modeling in agriculture, and large-scale analysis of business information and economic statistics. These computers could then operate much faster and much more efficiently when interconnect speed limits are increased.
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SBIR Phase II:Next Generation Vertical Cavity Surface Emitting Lasers
  • 批准号:
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  • 项目类别:
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  • 项目类别:
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  • 资助金额:
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  • 负责人:
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  • 项目类别:
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  • 资助金额:
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  • 负责人:
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