SGER: Exploratory Methods for Nanowire Fabrication on Insulating Substrates

SGER：绝缘基板上纳米线制造的探索性方法

• 批准号: 0457370
• 负责人: John Harb
• 金额: --
• 依托单位: Brigham Young University
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2005
• 资助国家: 美国
• 起止时间: 2005-03-15 至 2007-02-28
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=0457370&HistoricalAwards=false
• 关键词: SGER; Exploratory; Methods; Nanowire; Fabrication

ABSTRACTPI: John N. Harb, Matthew R. Linford and Dean R. WheelerInstitution: Brigham Young UniversityProposal Number: 0457370ResearchNanodevices and nanocircuits require a myriad of electrical interconnections and there are significant and pressing problems related to the design, fabrication, and attachment of wires between and to these nanodevices. As the limits of optical lithography are approached, new classes of methods for fabricating suitable interconnects need to be explored. These methods must be economical and robust; that is, they must depend on chemistries and patterning methods that require relatively few process steps and are scalable to manufacturing situations. This exploratory project will assess the feasibility and potential utility of three different methods for nanowire fabrication on insulating substrates. These include electrochemomechanical patterning (ECMP), electrochemical lithography (ECL), and metallization of DNA templates (MDT). All three methods involve local chemical modification of a surface to create conducting paths in the desired pattern. The methods differ in the specific way that the local surface chemistry is modified (chemomechanically, electrochemically, or through molecular synthesis and placement). Chemical modification as a patterning strategy has the potential to reduce the number of process steps required for fabrication while increasing resolution. It is expected that such methods will have an impact on future generations of microelectronic devices, as well as immediate application in the laboratory for development of new types of devices that incorporate a host of new nanomaterials. Broad ImpactThe broader impacts of this work include the significance of this research for the emerging field of nanoelectronics, and the opportunity for both graduate and undergraduate students to work on cutting-edge, high-impact research in a multidisciplinary environment that involves chemical engineers, chemists, and physicists.

摘要/ abstract摘要：John N. Harb, Matthew R. Linford和Dean R. wheeler机构：杨百翰大学，提案号：0457370研究纳米器件和纳米电路需要无数的电互连，并且在这些纳米器件之间和之间的电线的设计、制造和连接方面存在着重大而紧迫的问题。随着光学光刻技术的极限越来越近，需要探索制造合适互连的新方法。这些方法必须经济且稳健；也就是说，它们必须依赖于化学和模式方法，这些方法需要相对较少的工艺步骤，并且可扩展到制造情况。这个探索性项目将评估在绝缘衬底上制造纳米线的三种不同方法的可行性和潜在效用。这些包括电化学机械图像化（ECMP）、电化学光刻（ECL）和DNA模板金属化（MDT）。这三种方法都需要对表面进行局部化学修饰，以形成所需模式的导电路径。这些方法的不同之处在于局部表面化学修饰的具体方式（化学力学、电化学或通过分子合成和放置）。化学改性作为一种图案化策略有可能减少制造所需的工艺步骤数量，同时提高分辨率。预计这些方法将对未来几代微电子设备产生影响，并立即应用于实验室开发包含大量新纳米材料的新型设备。广泛影响这项工作的广泛影响包括这项研究对新兴的纳米电子学领域的重要性，以及研究生和本科生在涉及化学工程师、化学家和物理学家的多学科环境中从事尖端、高影响力研究的机会。