NER: Supercritical Carbon Dioxide Assisted Deposition and Interfacial Properties of Metal Oxide Thin Films

NER：超临界二氧化碳辅助金属氧化物薄膜的沉积和界面性能

• 批准号: 0506690
• 负责人: Theodosia Gougousi
• 金额: $ 10万
• 依托单位: University of Maryland Baltimore County
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2005
• 资助国家: 美国
• 起止时间: 2005-07-01 至 2007-06-30
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=0506690&HistoricalAwards=false
• 关键词: NER; Supercritical; Carbon; Dioxide; Assisted

NER: Supercritical carbon dioxide assisted deposition and Interfacial properties of metal oxide thin films.NSF Nanoscale Exploratory ResearchPI: Prof. Theodosia GougousiDepartment of Physics, University of Maryland Baltimore CountyThis proposal was received in response to Nanoscale Science and Engineering initiative, NSF 04-043, category NER. The objective of this research is to investigate whether salvation forces from supercritical fluids can be used to enable deposition of thin insulating films with good interfacial properties. Mainstream vacuum-based deposition techniques are usually mass transport limited by the low vapor pressure of the precursors, and proceed through a chemical reaction on a heated substrate (300 C), high pressure process that uses soluble organic peroxides and metal organic precursors to a surface, b) provide energy for film formation, and c) accomplish reaction by-product removal.This research is important because fabrication of future nanoscale devise may entail formation of multilayer miniaturized structures on patterned surfaces, and may involve depositions on microporous structures and on temperature sensitive materials such as organic or biological molecules. Nanoscale materials have different properties from bulk materials because the proportion of surfaces and interfaces in significant compared to the volume. As a result, interface phenomena are important because they define the operation of nanodevices. Conventional chemical vapor deposition techniques are unable to deposit uniform films on deep, narrow wells or inside porous materials. They involve high temperature steps that augment undesirable interface reactivity and would either destroy or render inactive most organic/biological molecules. Processing in supercritical carbon dioxide may provide a low temperature avenue for the deposition of uniform, high purity, thin films, with desirable interfacial properties and quality on patterned surfaces or microporpous structures, impacting technological fields such nanoelectronics, molecular electronics, biocatalysis, NEMS and bioNEMS. Students will be trained in these novel approaches providing the human infrastructure required for the wider implementation of these techniques.

NER：NSF Nanoscale Exploratory ResearchPI：Prof. Theodosia Gougousi物理系，马里兰州巴尔的摩县大学本提案是响应Nanoscale Science and Engineering initiative，NSF 04-043，category NER而收到的。 本研究的目的是调查是否可以使用超临界流体的拯救力，使薄绝缘膜的沉积具有良好的界面性能。 主流的基于真空的沉积技术通常是受前体低蒸气压限制的质量传输，并通过在加热的基底（300 ℃）上的化学反应、使用可溶性有机过氧化物和金属有机前体到表面的高压工艺进行，B）为膜形成提供能量，和c）完成反应副产物的去除。这项研究是重要的，因为未来纳米级器件的制造可能需要在图案化表面上形成多层小型化结构，并且可以包括在微孔结构上和在温度敏感材料例如有机或生物分子上的沉积。 纳米尺度材料具有与体材料不同的性质，因为与体积相比，表面和界面的比例很大。 因此，界面现象很重要，因为它们定义了纳米器件的操作。 传统的化学气相沉积技术不能在深、窄的威尔斯阱上或多孔材料内部存款均匀的膜。 它们涉及高温步骤，这增加了不期望的界面反应性，并且会破坏大多数有机/生物分子或使其失活。 在超临界二氧化碳中的处理可以提供用于在图案化表面或微孔结构上沉积具有期望的界面性质和质量的均匀、高纯度薄膜的低温途径，从而影响诸如纳米电子学、分子电子学、生物催化、NEMS和bioNEMS的技术领域。 学生将接受这些新方法的培训，为更广泛地实施这些技术提供所需的人力基础设施。