SBIR Phase II: Trapping Particle Detector for On-Line Monitoring

SBIR 第二阶段：用于在线监测的捕获粒子探测器

• 批准号: 0646388
• 负责人: Chris Doughty
• 金额: --
• 依托单位: Verionix
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2007
• 资助国家: 美国
• 起止时间: 2007-03-15 至 2009-02-28
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=0646388&HistoricalAwards=false
• 关键词: SBIR; Phase; II; Trapping; Particle

This Small Business Innovation Research (SBIR) Phase II project will develop improved particle detectors for monitoring of semiconductor manufacturing tools. This detection technology will increase count rates for greater than 0.2 micron diameter particles by 100 to 1000 times improving correlations between the particle detector and wafer by greater than 10 times. For smaller particles this detector will enable detection, ultimately to the nanoparticle regime (less than 25 nanometers). The intellectual merit of this proposal is that it will advance the state of knowledge in the field of engineering and physics of microplasmas. It will broaden knowledge of plasma scaling and of the behavior of particles in plasmas. The project will involve the following tasks: Optical detector hardware development ; Trap development for capturing particles; Data analysis, Control system and Software interface development and ; Field testing of prototypes. This project will provide currently unavailable detection technology for monitoring particles. Commercially, this project will improve the performance of semiconductor process tool manufacturer's products by enabling cost-effective, real-time monitoring. The broad economic benefit of this program will be to enhance the competitiveness of domestic semiconductor manufacturers where particle issues account for approximately 11% of manufacturing tool down time and are a major cause of scrap and yield losses. For the future nanotechnology industry as a whole this detector will enhance workplace and public safety by enabling monitoring of nanoparticle levels and production processes.

该小型企业创新研究（SBIR）第二阶段项目将开发用于监测半导体制造工具的改进型粒子探测器。这种检测技术将使直径大于0.2微米的颗粒的计数率提高100至1000倍，使颗粒检测器和晶片之间的相关性提高10倍以上。对于较小的颗粒，该检测器将能够检测，最终达到纳米颗粒范围（小于25纳米）。这一建议的智力价值在于，它将推进微等离子体工程和物理领域的知识状态。它将拓宽等离子体定标和等离子体中粒子行为的知识。 该项目将涉及以下任务：光学探测器硬件开发;捕获粒子的陷阱开发;数据分析，控制系统和软件接口开发;原型的现场测试。该项目将提供目前尚不具备的监测颗粒物的探测技术。在商业上，该项目将通过实现成本效益高的实时监控来提高半导体工艺工具制造商产品的性能。该计划的广泛经济效益将是提高国内半导体制造商的竞争力，其中颗粒问题约占制造工具停机时间的11%，并且是报废和产量损失的主要原因。对于整个未来的纳米技术行业，该探测器将通过监测纳米颗粒水平和生产过程来提高工作场所和公共安全。