U.S.-India Advanced Studies Institute for Nanoscale Science and Engineering

美印纳米科学与工程高级研究所

基本信息

  • 批准号:
    0732645
  • 负责人:
  • 金额:
    $ 9.8万
  • 依托单位:
  • 依托单位国家:
    美国
  • 项目类别:
    Standard Grant
  • 财政年份:
    2007
  • 资助国家:
    美国
  • 起止时间:
    2007-09-01 至 2009-08-31
  • 项目状态:
    已结题

项目摘要

0732645Ganapathiraman Ramanath The U.S.-India Advanced Studies Institute for Nanoscale Science and Engineering will take place in Chennai, India from January 13-19, 2008. The organizers are Professors G. Ramanath, Rensselaer Polytechnic Institute, Troy, New York and S. Ramasamy, University of Madras, Chennai, India. Ramanath is a materials scientist and engineer at the Rensselaer Nanotechnology Center; Ramasamy is a physicist and Coordinator for the newly established Center for Nanoscience and Nanotechnology in Chennai. The Nanoscale Advanced Studies Institute will bring together world-class senior researchers from the U.S. and India to deliver state-of-the-art lectures covering scientific, techno-logical, educational and societal aspects of nanoscience and engineering. The participants from the U.S. number about 25 and include advanced graduate students, postdoctoral researchers, early-career faculty and industry researchers. The Institute is organized to generate highly interactive exchanges on fundamental topics and cutting-edge developments across a broad set of nanoscience and engineering disciplines.This activity is intended to stimulate student interest in nanoscale science and engineering, strengthen the connections between the science and engineering communities in both countries, and enhance S&T collaboration in areas of mutual interest as set-forth in the United States-India Science & Technology Agreement of 2005. Funding for this Advanced Studies Institute is provided by the Office of International Science and Engineering and the Directorate for Engineering at the National Science Foundation and by the Government of India's Department of Science and Technology (DST) under the NSF-DST Joint Program.
Ganapathiraman Ramanath美印纳米科学与工程高级研究所将于2008年1月13日至19日在印度金奈举行。组织者是纽约特洛伊伦斯勒理工学院的G.Ramanath教授和印度金奈马德拉斯大学的S.Ramasamy教授。Ramanath是伦斯勒纳米技术中心的材料科学家和工程师;Ramasamy是金奈新成立的纳米科学和纳米技术中心的物理学家和协调员。纳米级高级研究所将汇集来自美国和印度的世界级高级研究人员,发表最先进的讲座,涵盖纳米科学和工程的科学、技术、教育和社会方面。来自美国的参与者约有25人,包括高级研究生、博士后研究人员、职业早期教师和行业研究人员。组织该研究所的目的是就纳米科学和工程学科的基本主题和前沿发展进行高度互动的交流。这项活动旨在激发学生对纳米科学和工程的兴趣,加强两国科学界和工程界之间的联系,并加强S与印度在共同感兴趣的领域的合作,这是2005年《美国-印度科学与技术协议》的规定。该高级研究所的资金由国家科学基金会国际科学与工程办公室和工程局以及印度政府科技部(DST)根据NSF-DST联合计划提供。

项目成果

期刊论文数量(0)
专著数量(0)
科研奖励数量(0)
会议论文数量(0)
专利数量(0)

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Ganpati Ramanath其他文献

Microstructure control and property switching in stress-free van der Waals epitaxial VOsub2/sub films on mica
云母上无应力范德华外延 VO₂ 薄膜的微观结构控制和性能转换
  • DOI:
    10.1016/j.matdes.2023.111864
  • 发表时间:
    2023-05-01
  • 期刊:
  • 影响因子:
    7.900
  • 作者:
    Erik Ekström;Simon Hurand;Arnaud le Febvrier;Anna Elsukova;Per O.Å. Persson;Biplab Paul;Fredrik Eriksson;Geetu Sharma;Oleksandr Voznyy;Davide G. Sangiovanni;Ganpati Ramanath;Per Eklund
  • 通讯作者:
    Per Eklund
Civil Society-Driven Drug Policy Reform for Health and Human Welfare—India
  • DOI:
    10.1016/j.jpainsymman.2016.10.362
  • 发表时间:
    2017-03-01
  • 期刊:
  • 影响因子:
  • 作者:
    Nandini Vallath;Tripti Tandon;Tania Pastrana;Diederik Lohman;S. Asra Husain;James Cleary;Ganpati Ramanath;M.R. Rajagopal
  • 通讯作者:
    M.R. Rajagopal

Ganpati Ramanath的其他文献

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{{ truncateString('Ganpati Ramanath', 18)}}的其他基金

BRITE Relaunch: Manufacturing Multilayers of Molecularly-Bonded Inorganic Nanointerfaces for Accessing and Tuning Novel Properties
BRITE 重新推出:制造多层分子键合无机纳米界面以获取和调整新特性
  • 批准号:
    2135725
  • 财政年份:
    2021
  • 资助金额:
    $ 9.8万
  • 项目类别:
    Standard Grant
Collaborative Research: Understanding Mechanical and Thermal Properties and Their Coupling at Nanomolecularly Modified Metal-Ceramic Interfaces
合作研究:了解纳米分子改性金属陶瓷界面的机械和热性能及其耦合
  • 批准号:
    1100933
  • 财政年份:
    2011
  • 资助金额:
    $ 9.8万
  • 项目类别:
    Standard Grant
COLLABORATIVE RESEARCH: MOSFETS WITH ATOMICALLY ENGINEERED METAL/HIGH-K INTERFACES
合作研究:具有原子工程金属/高 K 界面的 MOSFET
  • 批准号:
    1002282
  • 财政年份:
    2010
  • 资助金额:
    $ 9.8万
  • 项目类别:
    Standard Grant
MRI: Acquisition of a Multipurpose X-Ray Diffractometer for Advanced Materials Research and Education
MRI:购买多功能 X 射线衍射仪用于先进材料研究和教育
  • 批准号:
    0821536
  • 财政年份:
    2008
  • 资助金额:
    $ 9.8万
  • 项目类别:
    Standard Grant
Self-Assembled Molecular Nanolayers for Interfacial Isolation in Device Interconnections
用于器件互连中界面隔离的自组装分子纳米层
  • 批准号:
    0501488
  • 财政年份:
    2005
  • 资助金额:
    $ 9.8万
  • 项目类别:
    Continuing Grant
A New-Class of Molecularly-Engineered Nanoporous Dielectric Materials for Insulation in Device Wiring for Integrated Circuits
一种新型分子工程纳米多孔介电材料,用于集成电路器件布线的绝缘
  • 批准号:
    0519081
  • 财政年份:
    2005
  • 资助金额:
    $ 9.8万
  • 项目类别:
    Continuing Grant
Collaborative Research: MEMS from Organized Mesoscale Architectures of Carbon Nanotubes
合作研究:来自碳纳米管有序介观结构的 MEMS
  • 批准号:
    0424322
  • 财政年份:
    2004
  • 资助金额:
    $ 9.8万
  • 项目类别:
    Continuing Grant
REU SITE: Research Experiences for Undergraduates in Materials Science and Engineering
REU 网站:材料科学与工程本科生的研究经验
  • 批准号:
    0097589
  • 财政年份:
    2001
  • 资助金额:
    $ 9.8万
  • 项目类别:
    Continuing Grant
CAREER: Microstructure Evolution and Interfacial Reaction Paths in Cu Alloy Thin Films
职业:铜合金薄膜中的微观结构演变和界面反应路径
  • 批准号:
    9984478
  • 财政年份:
    2000
  • 资助金额:
    $ 9.8万
  • 项目类别:
    Continuing Grant

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