High Throughput Manufacturing of Nanolaminates

纳米层压材料的高通量制造

• 批准号: 0826323
• 负责人: Colin Wolden
• 金额: $ 29.86万
• 依托单位: Colorado School of Mines
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2008
• 资助国家: 美国
• 起止时间: 2008-09-01 至 2012-08-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=0826323&HistoricalAwards=false
• 关键词: Throughput; Manufacturing; Nanolaminates

The objective of this research award is to develop high throughput manufacturing processes for the efficient production of multi-layer nanolaminates. Low frequency (~1 Hz) pulsed plasma-enhanced chemical vapor deposition (PECVD) has been engineered as an alternative to atomic layer deposition for self-limiting growth of metal oxides (i.e. 1 Å/pulse). Pulsed PECVD offers a number of benefits including high net rates ( 30 nm/min), a larger process window, and wide applicability to a large number of precursors / materials. The proposed work is directed at accomplishing two major goals. The first will be an examination of interfacial issues associated with the formation of mixed metal oxide nanolaminates. Second, pulsed PECVD synthesis of oxides will be integrated with self-limiting deposition of polymers by the same method to form inorganic/organic nanolaminates. Acrylate and silicone based polymers are targeted to extend nanolaminate manufacturing to an array of flexible polymer substrates. If successful this process technology is expected to impact the manufacturing of nanolaminates for numerous applications, including high performance dielectrics, optical components, and diffusion barriers for flexible electronics. A robust approach to the synthesis of high quality organic/inorganic nanolaminates will be an enabling technology with broad cross-cutting potential. The broader impacts of this work will also include the training of a PhD candidate and the engagement of undergraduate researchers in areas of great technological importance. The materials and expertise produced by this work will be incorporated into an existing silicon processing lab course and a graduate elective in plasma processing. The PI and his students will work with the Colorado School of Mines K-12 outreach team, developing teacher workshop materials in the areas of optics, plasmas, and photovoltaics for school districts with large populations of poor and minority students.

该研究奖项的目标是开发高效生产多层纳米层合材料的高通量制造工艺。低频（~ 1hz）脉冲等离子体增强化学气相沉积（PECVD）已被设计为原子层沉积的替代方案，用于金属氧化物的自我限制生长（即1 Å/脉冲）。脉冲PECVD具有许多优点，包括高净速率（30 nm/min）、更大的工艺窗口以及对大量前驱体/材料的广泛适用性。拟议的工作旨在实现两个主要目标。首先将是与混合金属氧化物纳米层合物形成相关的界面问题的检查。其次，脉冲PECVD合成氧化物将与聚合物的自限制沉积相结合，以相同的方法形成无机/有机纳米层合物。丙烯酸酯和硅基聚合物的目标是将纳米层压制造扩展到一系列柔性聚合物基材。如果成功，该工艺技术有望影响纳米层合材料的许多应用，包括高性能电介质、光学元件和柔性电子产品的扩散屏障。一种合成高质量有机/无机纳米层合物的稳健方法将是一种具有广泛交叉潜力的使能技术。这项工作的更广泛的影响还将包括博士候选人的培训和在重要技术领域的本科研究人员的参与。这项工作产生的材料和专业知识将被纳入现有的硅加工实验课程和等离子体加工研究生选修课。PI和他的学生将与科罗拉多矿业学院K-12外展小组合作，为拥有大量贫困和少数民族学生的学区开发光学、等离子体和光伏领域的教师讲习班材料。