High Throughput Manufacturing of Nanolaminates

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The objective of this research award is to develop high throughput manufacturing processes for the efficient production of multi-layer nanolaminates. Low frequency (~1 Hz) pulsed plasma-enhanced chemical vapor deposition (PECVD) has been engineered as an alternative to atomic layer deposition for self-limiting growth of metal oxides (i.e. 1 Å/pulse). Pulsed PECVD offers a number of benefits including high net rates ( 30 nm/min), a larger process window, and wide applicability to a large number of precursors / materials. The proposed work is directed at accomplishing two major goals. The first will be an examination of interfacial issues associated with the formation of mixed metal oxide nanolaminates. Second, pulsed PECVD synthesis of oxides will be integrated with self-limiting deposition of polymers by the same method to form inorganic/organic nanolaminates. Acrylate and silicone based polymers are targeted to extend nanolaminate manufacturing to an array of flexible polymer substrates. If successful this process technology is expected to impact the manufacturing of nanolaminates for numerous applications, including high performance dielectrics, optical components, and diffusion barriers for flexible electronics. A robust approach to the synthesis of high quality organic/inorganic nanolaminates will be an enabling technology with broad cross-cutting potential. The broader impacts of this work will also include the training of a PhD candidate and the engagement of undergraduate researchers in areas of great technological importance. The materials and expertise produced by this work will be incorporated into an existing silicon processing lab course and a graduate elective in plasma processing. The PI and his students will work with the Colorado School of Mines K-12 outreach team, developing teacher workshop materials in the areas of optics, plasmas, and photovoltaics for school districts with large populations of poor and minority students.