Collaborative Research: A Diagnostic and Modeling Investigation of Pulsed PECVD
合作研究:脉冲 PECVD 的诊断和建模研究
基本信息
- 批准号:0829043
- 负责人:
- 金额:$ 22.79万
- 依托单位:
- 依托单位国家:美国
- 项目类别:Standard Grant
- 财政年份:2008
- 资助国家:美国
- 起止时间:2008-08-01 至 2012-07-31
- 项目状态:已结题
- 来源:
- 关键词:
项目摘要
CBET-0829043WoldenThe goal of this collaborative research project is to develop a fundamental understanding of pulsed plasma-enhanced chemical vapor deposition (PECVD) through a synergistic combination of advanced diagnostics and high-performance computer simulations. Low-frequency modulation of plasma power is critical to processes such as pulsed PECVD and plasma-enhanced atomic layer deposition (PE-ALD). These advanced deposition techniques impart nm-level control over thickness and composition that is critical to advancing nanotechnology. In particular, pulsed PECVD is being applied to oxide structures that have numerous applications as high-performance dielectrics, optical components, and diffusion barriers. However, process development is completely empirical at present. Time-resolved Langmuir probe, impedance spectroscopy, and emission spectroscopy will be coupled to state-of-the-art modeling in order to provide fundamental insights into the dynamics controlling the plasma chemistry in these systems. In pulsed PECVD the role of both neutrals (fluid flow, transport phenomena, gas- and surface chemistry) and activated species (ion, electrons, metastables) are of comparable importance. Coupled to the transient nature of the process, this challenging problem will require the development of novel techniques to both ensure high-fidelity measurements and to design tractable computational models. The modeling challenges will be addressed through transformative approaches to accelerate computations for plasma simulations with large number of species and chemical reactions. A shared-memory, data-parallel computing approach will be used to address plasma-simulation problems that typically have moderate-sized meshes but large degrees of freedom resulting from the large number of species and reactions. The systematic approach used to address this complex problem posed by pulsed PECVD will provide fundamental insight into both PE-ALD and conventional PECVD. The broader impacts of this work will also include the training of two PhD candidates and the engagement of undergraduate researchers in areas of great technological importance in a unique interdisciplinary environment. One student will focus on plasma modeling and simulation, while the second develops expertise in plasma diagnostics and deposition. These students, along with undergraduate REU participants, will work together in developing an integrated platform for the analysis of pulsed PECVD. The co-PIs will participate in established faculty outreach programs directed at underrepresented groups at the University of Texas Austin and Colorado School of Mines, working together to develop K-12 educational modules. They will also collaborate to develop and improve a graduate elective course on plasma processing.
CBET-0829043 Wolden该合作研究项目的目标是通过先进诊断和高性能计算机模拟的协同组合,对脉冲等离子体增强化学气相沉积(PECVD)有一个基本的了解。 等离子体功率的低频调制对于诸如脉冲PECVD和等离子体增强原子层沉积(PE-ALD)的工艺至关重要。这些先进的沉积技术赋予纳米级控制的厚度和组成,这是至关重要的推进纳米技术。特别是,脉冲PECVD正被应用于氧化物结构,具有许多应用,如高性能光刻胶,光学元件和扩散屏障。然而,目前流程开发完全是经验性的。时间分辨的朗缪尔探针,阻抗谱和发射光谱将被耦合到国家的最先进的建模,以提供基本的见解控制在这些系统中的等离子体化学动力学。在脉冲PECVD中,中性粒子(流体流动,传输现象,气体和表面化学)和活化物质(离子,电子,可吸收物)的作用具有相当的重要性。再加上过程的瞬态性质,这个具有挑战性的问题将需要开发新的技术,以确保高保真度的测量和设计易于处理的计算模型。 建模挑战将通过变革性的方法来解决,以加速具有大量物种和化学反应的等离子体模拟的计算。一个共享内存,数据并行计算方法将被用来解决等离子体模拟问题,通常有中等大小的网格,但自由度大,导致大量的物种和反应。用于解决脉冲PECVD带来的这个复杂问题的系统方法将为PE-ALD和传统PECVD提供基本的见解。这项工作的更广泛的影响还将包括两名博士候选人的培训和本科研究人员在一个独特的跨学科环境中具有重大技术意义的领域的参与。 一名学生将专注于等离子体建模和仿真,而第二个发展等离子体诊断和沉积的专业知识。这些学生,沿着与本科REU参与者,将共同开发一个综合平台,用于脉冲PECVD的分析。共同PI将参加针对德克萨斯大学奥斯汀分校和科罗拉多矿业学院代表性不足的群体的既定教师推广计划,共同开发K-12教育模块。他们还将合作开发和改进等离子体处理的研究生选修课程。
项目成果
期刊论文数量(0)
专著数量(0)
科研奖励数量(0)
会议论文数量(0)
专利数量(0)
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Colin Wolden其他文献
Colin Wolden的其他文献
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