SBIR Phase II: Photon Enhanced SEM (Scanning Electron Microscopes) Platform for Nano-Manufacturing

SBIR 第二阶段：用于纳米制造的光子增强 SEM（扫描电子显微镜）平台

• 批准号: 0956765
• 负责人: Thomas Moore
• 金额: $ 50万
• 依托单位: Omniprobe
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2010
• 资助国家: 美国
• 起止时间: 2010-02-15 至 2013-01-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=0956765&HistoricalAwards=false
• 关键词: SBIR; Phase; II; Photon; Enhanced

This Small Business Innovation Research (SBIR) Phase II project aims to develop a platform for photon beam enhanced and electron beam induced nanoscale processing. Focused electron beam induced processing is a nanoscale process generally capable of about 10nm resolution and 1nm has been demonstrated. However, materials deposited via focused nanoscale electron beam induced deposition (EBID) contain significant amounts of residual contamination due to insufficient by-product desorption from the precursor molecules. In addition, electron beam induced etching (EBIE) is typically limited by desorption of the resultant electron beam induced etch product, thus is prohibitively slow. This project will address these limitations by developing an instrument capable of delivering a pulsed photon beam to facilitate desorption of contaminate by-products for the EBID process, and accelerate desorption of etch products during the EBIE process. The objective is to design and construct a platform capable of precise delivery of photons over a broad spectroscopic range for nanoscale processing and simultaneous microscale imaging in standard scanning electron microscopes (SEM) or dual ion and electron beam systems. Finally, requisite pulsed electron-photon-mass transport synchronization strategies will be developed for advanced nanoscale prototyping, editing, and sample preparation. The broader/commercial impact of this project will be the development of a new tool to enable improved rapid prototyping of nanoscale devices by offering a cost-effective solution for nanoscale synthesis compatible with widespread SEM and dual beam platforms. This will accelerate the research efforts on next generation nanoscale devices with new and/or enhanced functionality, which is expected to benefit many facets of society ranging from physical to life sciences. This project may also improve the understanding of critical photon-electron-substrate-vapor interactions which will ultimately lead to a directed assembly approach capable of depositing 3-dimensional, complex and multi-component materials with nanometer scale lateral resolution and atomic scale z-dimensional control.

这个小型企业创新研究（SBIR）第二阶段项目旨在开发一个光子束增强和电子束诱导纳米级加工的平台。 聚焦电子束诱导加工是一种纳米级工艺，通常能够实现约10 nm的分辨率，并且已经证明了1 nm的分辨率。 然而，通过聚焦纳米级电子束诱导沉积（EBID）沉积的材料由于前体分子的副产物脱附不足而含有大量残留污染物。 此外，电子束诱导蚀刻（EBIE）通常受到所得电子束诱导蚀刻产物的解吸的限制，因此非常慢。 该项目将通过开发一种能够提供脉冲光子束的仪器来解决这些限制，以促进EBID过程中污染副产品的解吸，并在EBIE过程中加速蚀刻产品的解吸。 我们的目标是设计和构建一个平台，能够精确地提供光子在一个广泛的光谱范围内的纳米级处理和同时在标准的扫描电子显微镜（SEM）或双离子和电子束系统的微尺度成像。 最后，必要的脉冲电子-光子-质量传输同步策略将被开发用于先进的纳米级原型制作、编辑和样品制备。该项目的更广泛/商业影响将是开发一种新工具，通过提供与广泛的SEM和双光束平台兼容的纳米级合成的成本效益解决方案，改进纳米级器件的快速原型制作。 这将加速具有新功能和/或增强功能的下一代纳米器件的研究工作，预计将使从物理科学到生命科学的许多方面受益。 该项目还可以提高对关键的光子-电子-衬底-蒸气相互作用的理解，这将最终导致能够沉积具有纳米级横向分辨率和原子级z维控制的三维，复杂和多组分材料的定向组装方法。