权益分类	功能权益	普通用户	{{item.name}}会员
{{category.name}}	{{benefitItem.name}}

EAGER: Massively Parallel, Maskless, Direct-Write Plasmonics Nanolithography

EAGER：大规模并行、无掩模、直写等离子体纳米光刻

基本信息

批准号：
1049552
负责人：
Palaniappa Molian
金额：
$ 6.07万
依托单位：
Iowa State University
依托单位国家：
美国
项目类别：
Standard Grant
财政年份：
2010
资助国家：
美国
起止时间：
2010-09-01 至 2012-08-31
项目状态：
已结题

来源：
https://www.nsf.gov/awardsearch/showAward?AWD_ID=1049552&HistoricalAwards=false
关键词：
EAGER Massively Parallel Maskless Direct

项目摘要

The objective of this EArly-concept Grant for Exploratory Research (EAGER) is to demonstrate that the laser-induced plasmonics would improve resolution, increase throughput and reduce cost of nanolithography processes and will be superior to the existing grating-based, mask-containing plasmonic systems. A nanosecond pulsed Nd:YAG laser beam will be enlarged and impinged on a unique plasmonic lens that consists of nanoporous alumina deposited with silver to generate and transmit plasmons; the constructive interference of the plasmons in the near field can create numerous nanodots on the silicon substrate. A piezoelectric actuator nanopositioning system will then be utilized to move these nanodots in direct-writing fashion to pattern the resist or etch silicon and fabricate copious two dimensional nanopattern of arbitrary shapes in a high-speed, massively-parallel manner. The proposed research represents an unprecedented application area for basic science as well as practical contributions learned from how laser-induced plasmons interact with materials, and what feature sizes and capabilities can be obtained. The novel nanolithography system proposed in this study has potential to advance the capabilities of lithography required in high-density integrated circuit device fabrication and for producing nanoscale devices for microelectronics, MEMS, tribology, optics, electro-optics, magnetics, communication, and medicine. The educational efforts include recruitment and participation of woman and/or underrepresented student in the research and assimilation of the research outcomes into a cutting edge laboratory for the undergraduate manufacturing course.

这项早期概念探索性研究资助（EAGER）的目的是证明激光诱导等离子体将提高分辨率，增加产量并降低纳米光刻工艺的成本，并上级现有的基于光栅的含掩模等离子体系统。纳秒脉冲Nd：YAG激光束将被放大并撞击在由沉积有银的纳米多孔氧化铝组成的独特的等离子体透镜上以产生和传输等离子体;等离子体激元在近场中的相长干涉可以在硅衬底上产生许多纳米点。压电致动器纳米定位系统，然后将被用来移动这些纳米点在直接写入的方式图案化的抗蚀剂或蚀刻硅和制造丰富的二维纳米图案的任意形状的高速，平行的方式。拟议的研究代表了基础科学的一个前所未有的应用领域，以及从激光诱导等离子体激元如何与材料相互作用以及可以获得的特征尺寸和能力中学到的实际贡献。在这项研究中提出的新的纳米光刻系统有可能提高高密度集成电路器件制造和生产微电子，MEMS，摩擦学，光学，电光，磁学，通信和医学的纳米级器件所需的光刻能力。教育方面的努力包括招聘和妇女和/或代表性不足的学生参与研究，并将研究成果纳入本科制造课程的尖端实验室。