International: US-China IRES with Collaborative Research on Nano Crystal Dot Electrostatic Discharge Protection for Integrated Circuits

国际：中美IRES合作研究集成电路纳米晶点静电放电防护

• 批准号: 1110838
• 负责人: Albert Wang
• 金额: $ 15万
• 依托单位: University of California-Riverside
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2011
• 资助国家: 美国
• 起止时间: 2011-10-01 至 2014-09-30
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=1110838&HistoricalAwards=false
• 关键词: International; US; China; IRES; Collaborative

This award supports an International Research Experiences for Students (IRES) project in China. Participating undergraduate students will engage in research on nano-scale crystal quantum-dot (NC-QD) integrated circuits (ICs) and particularly on electrostatic-discharge failure mechanisms and protection methods for sub-90nm nodes. This is an important and critical research area for the semiconductor industry. The research group in University of California at Riverside will collaborate with Tsinghua University, University of Electronic S&T, Shanghai Jiaotong University, and Huazhong University of S&T, all in China. A total of five US undergraduate students will be involved in this international collaborative research project in each of three years. The annual three-month IRES program consists of two phases: six weeks at Tsinghua University in Beijing and six weeks at a second university in a different Chinese city. The IRES activities include research projects on IC reliability through design and fabrication, joint education sessions, global industrial training and exposure to diversified cultures and social settings in China. IRES seminars are planned in each phase at the host Chinese institutions and back at home for the participating undergraduate students to present their IRES experiences. The language training and cultural experience gained by the students at universities in China will enable them to interact effectively in their future careers in a global setting.

该奖项支持中国的一个国际学生研究体验项目。参与的本科生将从事纳米级晶体量子点(NC-QD)集成电路(IC)的研究，特别是90 nm以下节点的静电放电失效机理和保护方法的研究。这是半导体行业的一个重要和关键的研究领域。加州大学河滨分校的研究小组将与清华大学、S电子科技大学、上海交通大学和S科技大学华中大学合作，全部由中国组成。每三年将有五名美国本科生参与这一国际合作研究项目。一年一度的IRES项目为期三个月，分为两个阶段：在北京的清华大学学习六周，在中国另一座城市的第二所大学学习六周。IRES的活动包括通过设计和制造实现IC可靠性的研究项目、联合教育会议、全球工业培训以及接触到中国的多元文化和社会环境。IRES研讨会计划在每个阶段在主办的中国机构和国内为参与的本科生介绍他们的IRES经验。中国大学的学生所获得的语言培训和文化经验将使他们能够在未来的全球职业生涯中有效地互动。