SBIR Phase II: Ultra Low Power InAsN Semiconductor Transistors
SBIR Phase II: Ultra Low Power InAsN Semiconductor Transistors
批准号:
1127568
负责人:
Matt Kim
金额:
$50.0万
依托单位:
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
2011
资助国家:
美国
项目状态:
已结题
起止时间:
2011-11-15 至 2014-04-30
中文摘要
这个小型企业创新研究(SBIR)二期项目将展示一种新的III-V型氮化物半导体合金和双极晶体管结构,具有在需要射频(RF)和数字电子设备的应用中实现超低功耗设备操作的潜力。射频功率放大器要解决的问题是,提高功率效率一直是便携式和高性能电子设备的主要问题。研究目标是在标准砷化镓(GaAs)晶体管平台上证明,包含我们的低带隙氮化半导体将显着降低导通电压,从而增加设备的电池寿命。我们的研究将从低带隙材料的开发到晶体管的制造开始,这将与基于蜂窝的射频放大器的规格进行比较。该计划将从设备设计和材料合成开始,并与我们的商业合作伙伴一起以原型演示结束。随着对手机更大功能的需求的增加,该项目的广泛影响/商业潜力将对高性能个人通信电子领域的功耗产生巨大影响。GaAs晶圆在无线通信产品放大器市场占据主导地位。晶体管比现有的基于gaas的标准器件具有更低的功耗优势,可能会影响整个电子行业。随着便携式或无线蜂窝设备的功能不断增强,它们将需要更低的开启电压,以最大限度地减少功耗,同时保持更长的运行时间。该项目的整体结构旨在为研究生和大学研究人员提供丰富的教学和培训机会。工业界和学术界之间的思想交流将确保研究候选人具有良好的技术背景和对工业环境的深刻理解。
英文摘要
This Small Business Innovation Research (SBIR) Phase II project will demonstrate a new III-V nitride semiconductor alloy and bipolar transistor structure with the potential to enable ultra low power device operation in applications requiring both Radio Frequency (RF) and digital electronics. The problem to be solved is that for RF power amplifier increasing power efficiency has been a major issue for portable and high performance electronic devices. The research objectives is to demonstrate on a standard gallium arsenide (GaAs) transistor platform that the inclusion of our low band gap nitride semiconductor will significantly reduce the turn on voltage, thus increasing the battery life of the device. Our research will start from the development of a low bandgap material to the fabrication of transistor that will be compared to the specifications of cellular based RF amplifiers. This program will begin with device design and material synthesis and end with prototype demonstrations, with our commercial partners. The broader impact/commercial potential of this project will have a huge impact on power consumption in the realm of high-performance personal communication electronics, as the requirement for greater functionality in cell phones rises. GaAs wafers dominate the market for amplifiers in wireless communication products. Transistors have advantages over existing standard GaAs-based devices with reduced power consumption could impact the entire electronics industry. As portable or wireless cellular devices continue to become ever more functional they will require significantly lower turn-on voltages so as to minimize power consumption while sustaining operation over longer periods of time. The overall structure of the project has been designed to provide enriching opportunities in the areas of teaching and training for both the graduate students and university researchers. The exchange ideas between industry and academia will ensure research candidates with an excellent technical background and a sophisticated understanding of the industrial environment.
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SBIR Phase I: Ultra Low Power InAsN Semiconductor Transistors
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批准号:0946000
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项目类别:Standard Grant
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资助金额:$15.0万
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财政年份:2010
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负责人:Matt Kim
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依托单位:
STTR Phase I: Broadband Silicon-Germanium Based Quantum Dot Materials
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批准号:0930623
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项目类别:Standard Grant
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资助金额:$15.0万
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财政年份:2009
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负责人:Matt Kim
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依托单位:
SBIR Phase I:Si-Ge Quantum Dot Laser
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批准号:0839718
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财政年份:2009
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负责人:Matt Kim
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依托单位:
STTR Phase I: Ultra-high Performance InAsN Transistor for RF Power Amplifiers
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批准号:0638227
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项目类别:Standard Grant
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资助金额:$0.0万
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财政年份:2007
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负责人:Matt Kim
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依托单位:
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