MRI: Acquisition of True 3D Laser Lithography System with Sub-Micrometer Resolution

MRI：获得亚微米分辨率的真正 3D 激光光刻系统

• 批准号: 1428694
• 负责人: Marko Loncar
• 金额: $ 44.17万
• 依托单位: Harvard University
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2014
• 资助国家: 美国
• 起止时间: 2014-08-15 至 2017-07-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=1428694&HistoricalAwards=false
• 关键词: MRI; Acquisition; True; 3D; Laser

Non-technical: The purpose of this activity is the acquisition of a Nanoscribe 3D laser lithography system (Photonic Professional GT) and its installation in the Center for Nanoscale Systems (CNS) at Harvard University. As the biggest shared facility center of nanotechnology in New England area, CNS is currently supporting more than 1,400 users (both academic and industrial) with research interests ranging from bio-engineering and micro-fluidics to quantum optics and fuel cells. Our diverse research population, working with wide range of materials and structures, has a need for fabrication of three-dimensional structures. Conventional nanofabrication techniques currently available in CNS, however, are planar in nature and are limited to realization of two-dimensional structures only. Nanoscribe 3D overcomes this limitation, and allows for fabrication of complex, hierarchical, structures spanning wide range of length scales, that cannot be realized using conventional nanofabrication techniques. With its appeal to area as diverse as nanoscale optics and electronics, bio-mimetic, microfluidics and tissue engineering, Nanoscribe 3D promotes interdisciplinary collaborations between physicists, chemists, biologists, material scientists and engineers, and enables excellent educational opportunities for a diverse population of students at all levels (undergraduate, graduate and post-graduate).Technical: Current methods for fabrication of 3D structures are based on a sequence of layer-by-layer fabrication using standard planar techniques. This approach is costly, time-consuming, suffers from stringent alignment requirements between successive photolithography steps, and cannot produce arbitrary 3D geometries. Nanoscribe 3D takes advantage of multi-photon absorption processes that occur in the focal spot of tightly focused femto-second laser beam and can realize true 3D structures with ~100nm lateral and ~200nm vertical resolution. For optics research, the tool is used to realize hybrid meso-scale structures that combine bottom-up synthesized nano-materials (nanowires, quantum dots, etc) with top-down defined photonic components, including gratings, cavities, photonic crystals and meta-materials. Of interest to biomimetics research, ability to replicate complex biological structures is crucial, and enables deeper understanding of the functional morphology of these structures, including structural colors. Cell and tissue engineering research benefits from the tool?s ability to realize cm-sized scaffolds with micron-scale detail, as well as other structures. Finally, Nanoscribe 3D allows for efficient fabrication of 3D nanoelectronic arrays that can be used to measure extracellular and intracellular biological signals (e.g. from cardiac and neural cells and tissues).

非技术性： 此次活动的目的是收购Nanoscribe 3D激光光刻系统（Photonic Professional GT）并将其安装在哈佛大学的纳米系统中心（CNS）。作为新英格兰地区最大的纳米技术共享设施中心，CNS目前支持1,400多个用户（包括学术和工业），研究兴趣从生物工程和微流体到量子光学和燃料电池。我们多样化的研究人群，使用各种材料和结构，需要制造三维结构。然而，目前在CNS中可用的常规纳米纤维技术本质上是平面的，并且仅限于实现二维结构。Nanoscribe 3D克服了这一限制，并允许制造复杂的，分层的，跨越广泛的长度尺度的结构，这是无法实现使用传统的纳米制造技术。凭借其对纳米级光学和电子学，仿生学，微流体学和组织工程等不同领域的吸引力，Nanoscribe 3D促进了物理学家，化学家，生物学家，材料科学家和工程师之间的跨学科合作，并为各级学生提供了良好的教育机会技术：当前用于制造3D结构的方法是基于使用标准平面技术的逐层制造的序列。这种方法是昂贵的，耗时的，受到严格的对准要求之间的连续光刻步骤，并不能产生任意的3D几何形状。Nanoscribe 3D利用了紧聚焦飞秒激光束焦斑中发生的多光子吸收过程，可以实现具有约100 nm横向和约200 nm垂直分辨率的真正3D结构。对于光学研究，该工具用于实现混合介观结构，该结构将联合收割机自下而上合成的纳米材料（纳米线、量子点等）与自上而下定义的光子组件（包括光栅、腔、光子晶体和超材料）相结合。对于仿生学研究来说，复制复杂生物结构的能力至关重要，并且能够更深入地了解这些结构的功能形态，包括结构颜色。细胞和组织工程研究受益的工具？的能力，实现厘米级的支架与微米级的细节，以及其他结构。最后，Nanoscribe 3D允许有效制造3D纳米电子阵列，可用于测量细胞外和细胞内生物信号（例如来自心脏和神经细胞和组织）。