Collaborative Research: Photolytic CVD Processes for Thermally Sensitive Substrates
合作研究:热敏基材的光解 CVD 工艺
基本信息
- 批准号:1608873
- 负责人:
- 金额:$ 30.74万
- 依托单位:
- 依托单位国家:美国
- 项目类别:Standard Grant
- 财政年份:2016
- 资助国家:美国
- 起止时间:2016-09-01 至 2021-08-31
- 项目状态:已结题
- 来源:
- 关键词:
项目摘要
Non-Technical Summary:Next-generation electronic devices using plastics and other flexible materials have the potential for revolutionary societal benefits in medicine, sustainable energy and information technology. Development of reliable, widely applicable methods to apply metals to heat-sensitive materials such as organic and polymer thin films will be an important step in the production of these devices. This project is developing methods to use light as an energy source to drive placement of metal contacts on heat-sensitive materials. Because the metal can be applied in patterns, the method could eventually be used to print circuits on flexible electronics. Participation in this research provides graduate students with technical and collaborative skills valuable in either academic or industrial careers. Undergraduate researchers contribute significantly to the proposed work, which encourages them to pursue graduate education in the physical sciences and engineering. To communicate the excitement of science to the general public, participants in the project are involved in public outreach on chemistry and chemistry-based nanotechnology.Technical Summary:This project is developing photolytic chemical vapor deposition (CVD) processes for the selective deposition of metals onto thermally sensitive materials, such as organic thin films. The reliable formation of stable metallic contacts to organic thin films is critical to many technologies from energy harvesting to sensing to organic/molecular electronics. The development of photoassisted low temperature CVD will advance the state-of-the-art in organic electronics by enabling the integration of molecular assemblies into complex devices. In this collaborative project, design and synthesis of ruthenium, platinum and gold complexes as photosensitive CVD precursors is followed by a screening process involving identification of the primary photoprocess, determination of the quantum yield for ligand loss, elucidation of thermal decomposition steps, and modeling reactivity with functional groups on the substrate surface. Promising precursor complexes are subjected to photolytic chemical vapor deposition experiments with self-assembled monolayers (SAMs) as model substrate systems. SAMs are used as the substrates because they have highly organized structures with a uniform density of terminal organic functional groups that will allow the quantitative investigation of the precursor-molecule interactions. Further, SAMs can be easily patterned to produce multifunctional surfaces, which are used to determine the selectivity of the deposition reactions.
非技术概述:使用塑料和其他柔性材料的下一代电子设备在医学、可持续能源和信息技术方面具有革命性的社会利益。开发可靠的、广泛适用的方法将金属应用于有机和聚合物薄膜等热敏材料将是生产这些器件的重要一步。该项目正在开发利用光作为能源的方法,以推动金属触点在热敏材料上的放置。由于这种金属可以应用于图案中,这种方法最终可能被用于在柔性电子产品上印刷电路。参与这项研究为研究生提供了在学术或工业职业生涯中有价值的技术和协作技能。本科生研究人员对拟议的工作做出了重大贡献,这鼓励他们继续物理科学和工程方面的研究生教育。为了向公众传播科学的兴奋,该项目的参与者参与了关于化学和基于化学的纳米技术的公共宣传。技术摘要:该项目正在开发光解化学气相沉积(CVD)工艺,用于将金属选择性地沉积到热敏材料上,如有机薄膜。从能量采集到传感到有机/分子电子学,可靠地形成稳定的金属与有机薄膜的接触是许多技术的关键。光辅助低温化学气相沉积技术的发展将使分子组装集成到复杂的器件中,从而推动有机电子学的发展。在这个合作项目中,设计和合成作为光敏CVD前体的Ru、Plat金和Au配合物之后是一个筛选过程,包括鉴定主要的光过程,测定配体损失的量子产率,阐明热分解步骤,以及模拟衬底表面官能团的反应性。以自组装单分子膜(SAM)为模型衬底体系进行了光解化学气相沉积实验。SAMS被用作底物,因为它们具有高度组织化的结构和均匀密度的末端有机官能团,这将允许对前体-分子相互作用的定量研究。此外,可以很容易地对自组装膜进行图案化,以产生多功能表面,用于确定沉积反应的选择性。
项目成果
期刊论文数量(0)
专著数量(0)
科研奖励数量(0)
会议论文数量(0)
专利数量(0)
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Lisa McElwee-White其他文献
Reaction of (CO)<sub>5</sub>W(THF) with triphenylmethyl azide and triptycyl azide
- DOI:
10.1016/0022-328x(94)24776-f - 发表时间:
1995-01-11 - 期刊:
- 影响因子:
- 作者:
Scott T. Massey;Baubak Mansour;Lisa McElwee-White - 通讯作者:
Lisa McElwee-White
Electrochemical oxidation of ethanol using Nafion electrodes modified with heterobimetallic catalysts
- DOI:
10.1016/j.ica.2011.01.011 - 发表时间:
2011-04-15 - 期刊:
- 影响因子:
- 作者:
Ahmed Moghieb;Marie C. Correia;Lisa McElwee-White - 通讯作者:
Lisa McElwee-White
Computational study on transamination of alkylamides with NH<sub>3</sub> during metalorganic chemical vapor deposition of tantalum nitride
- DOI:
10.1016/j.jcrysgro.2009.05.003 - 发表时间:
2009-07-01 - 期刊:
- 影响因子:
- 作者:
Yong Sun Won;Sung Soo Park;Young Seok Kim;Timothy J. Anderson;Lisa McElwee-White - 通讯作者:
Lisa McElwee-White
Microwave spectrum and molecular structure calculations for η<sup>4</sup>-butadiene ruthenium tricarbonyl
- DOI:
10.1016/j.jms.2024.111949 - 发表时间:
2024-10-01 - 期刊:
- 影响因子:
- 作者:
Adam M. Daly;Kristen K. Roehling;Rhett P. Hill;Myla G. Gonzalez;Xin Kang;Lisa McElwee-White;Stephen G. Kukolich - 通讯作者:
Stephen G. Kukolich
Lisa McElwee-White的其他文献
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{{ truncateString('Lisa McElwee-White', 18)}}的其他基金
Collaborative Research: Photoassisted CVD for Low Temperature Area Selective Deposition
合作研究:用于低温区域选择性沉积的光辅助 CVD
- 批准号:
2216070 - 财政年份:2022
- 资助金额:
$ 30.74万 - 项目类别:
Standard Grant
Collaborative Research: Surface Reactivity of Organometallic Precursors in Electron- and Ion-Induced Deposition of Metal Nanostructures
合作研究:电子和离子诱导金属纳米结构沉积中有机金属前体的表面反应性
- 批准号:
1904802 - 财政年份:2019
- 资助金额:
$ 30.74万 - 项目类别:
Standard Grant
Support of the American Chemical Society Graduate Student Symposium, New Orleans, March 18-20, 2018
美国化学会研究生研讨会的支持,新奥尔良,2018 年 3 月 18-20 日
- 批准号:
1819609 - 财政年份:2018
- 资助金额:
$ 30.74万 - 项目类别:
Standard Grant
MRI: Acquisition of an X-Ray Diffractometer for Next Generation Functional Molecules and Materials
MRI:购买用于下一代功能分子和材料的 X 射线衍射仪
- 批准号:
1828064 - 财政年份:2018
- 资助金额:
$ 30.74万 - 项目类别:
Standard Grant
Collaborative Research: Designing Organometallic Precursors for Focused Electron Beam Induced Deposition of Metal Nanostructures
合作研究:设计用于聚焦电子束诱导金属纳米结构沉积的有机金属前体
- 批准号:
1607547 - 财政年份:2016
- 资助金额:
$ 30.74万 - 项目类别:
Standard Grant
GOALI: CVD of Metal Oxides for Optoelectronic Applications
GOALI:用于光电应用的金属氧化物 CVD
- 批准号:
1213965 - 财政年份:2012
- 资助金额:
$ 30.74万 - 项目类别:
Standard Grant
CCI Phase I: Center for Nanostructured Electronic Materials
CCI第一期:纳米结构电子材料中心
- 批准号:
1038015 - 财政年份:2010
- 资助金额:
$ 30.74万 - 项目类别:
Standard Grant
Mechanism-Based Approaches for CVD/ALD of Cu Barriers
基于机制的铜势垒 CVD/ALD 方法
- 批准号:
0911640 - 财政年份:2009
- 资助金额:
$ 30.74万 - 项目类别:
Continuing Grant
Alternative Chemistries for Barrier Materials in Cu Metallization
铜金属化中阻挡材料的替代化学物质
- 批准号:
0304810 - 财政年份:2003
- 资助金额:
$ 30.74万 - 项目类别:
Continuing Grant
Formation of Organic Products by Oxidation of Metal Carbynes
金属卡宾氧化形成有机产物
- 批准号:
9421434 - 财政年份:1995
- 资助金额:
$ 30.74万 - 项目类别:
Continuing Grant
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