课题基金 / 基金详情

GOALI: CVD of Metal Oxides for Optoelectronic Applications

GOALI: CVD of Metal Oxides for Optoelectronic Applications
GOALI:用于光电应用的金属氧化物 CVD
批准号:
1213965
负责人:
Lisa McElwee-White
金额:
$45.0万
依托单位:
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
2012
资助国家:
美国
项目状态:
已结题
起止时间:
2012-08-01 至 2017-07-31

项目摘要

项目成果

Lisa McElwee-White的其他基金

相似基金

相关文献

中文摘要
翻译
点击翻译按钮获取中文摘要
英文摘要
In this project funded by the Chemistry Division and the Office of Multidisciplinary Activities of the Directorate for Mathematical and Physical Sciences, Professors Lisa McElwee-White and Tim Anderson of the University of Florida will work with Dr. Gary S. Silverman of Arkema Inc. on a vertically integrated approach to developing chemistries for cost-effective and scalable chemical vapor deposition of tungsten oxide injection layers for organic optoelectronic devices. The researchers use mechanism-based precursor design accompanied by computational chemistry tools to evaluate potential precursors before synthesis. Synthesis of the precursors is followed by a rapid screening process that sends only the most promising precursors to the film demonstration step. Aalternative precursor delivery systems designed for all molecules independent of volatility are also considered, thus including the full range of possible precursors. Close collaboration with industry will facilitate process development and optimization including reactor modeling, thus increasing the likelihood of successful technology transfer.This project brings together collaborators with complementary chemistry, chemical engineering, materials and industrial process development expertise to address a critical problem in the manufacture of organic optoelectronic devices. The target application is OLED devices for general illumination, which have the potential for significant energy savings. Through working on an interdisciplinary project involving academic-industrial collaboration, students will gain exposure to team-based training and problem solving skills that reach outside their own disciplines of graduate study. Six-month internships at the Arkema site will give students exposure to industrial practice that will broaden their perspectives beyond academic research. In addition, participating faculty will have the opportunity to integrate their added insight from industrial collaboration into their courses.
期刊论文(0)
专著(0)
科研奖励(0)
会议论文
Collaborative Research: Photoassisted CVD for Low Temperature Area Selective Deposition
  • 批准号:
    2216070
  • 项目类别:
    Standard Grant
  • 资助金额:
    $41.34万
  • 财政年份:
    2022
  • 负责人:
    Lisa McElwee-White
  • 依托单位:
Collaborative Research: Surface Reactivity of Organometallic Precursors in Electron- and Ion-Induced Deposition of Metal Nanostructures
  • 批准号:
    1904802
  • 项目类别:
    Standard Grant
  • 资助金额:
    $33.0万
  • 财政年份:
    2019
  • 负责人:
    Lisa McElwee-White
  • 依托单位:
Support of the American Chemical Society Graduate Student Symposium, New Orleans, March 18-20, 2018
  • 批准号:
    1819609
  • 项目类别:
    Standard Grant
  • 资助金额:
    $1.0万
  • 财政年份:
    2018
  • 负责人:
    Lisa McElwee-White
  • 依托单位:
MRI: Acquisition of an X-Ray Diffractometer for Next Generation Functional Molecules and Materials
  • 批准号:
    1828064
  • 项目类别:
    Standard Grant
  • 资助金额:
    $28.0万
  • 财政年份:
    2018
  • 负责人:
    Lisa McElwee-White
  • 依托单位:
国内基金
海外基金
超宽禁带半导体金刚石CVD制备与掺杂技术研发
CVD 金刚石薄膜在原子气室中的抗弛豫原理 与方法研究
  • 批准号:
    Q24F040034
  • 项目类别:
    省市级项目
  • 资助金额:
    --
  • 批准年份:
    2024
  • 负责人:
    于会尧
  • 依托单位:
“缓释控源”CVD精准合成转角二维范德华异质结及其神经突触器件研究
  • 批准号:
    62404060
  • 项目类别:
    青年科学基金项目
  • 资助金额:
    --
  • 批准年份:
    2024
  • 负责人:
    刘明强
  • 依托单位:
(xZrC-yHfC-zSiC)/SiC多层交替涂层的多相共沉积机理及其一步CVD法制备研究
  • 批准号:
    52302071
  • 项目类别:
    青年科学基金项目
  • 资助金额:
    30.00万元
  • 批准年份:
    2023
  • 负责人:
    李博
  • 依托单位: