GOALI: Ultra-Low Wear Plasma Enhanced Atomic Layer Deposited Nitride Thin Films: Exploring Processing, Structure, Properties and Mechanisms
GOALI: Ultra-Low Wear Plasma Enhanced Atomic Layer Deposited Nitride Thin Films: Exploring Processing, Structure, Properties and Mechanisms
批准号:
1826251
负责人:
Nick Strandwitz
金额:
$51.25万
依托单位:
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
2019
资助国家:
美国
项目状态:
已结题
起止时间:
2019-01-01 至 2023-12-31
中文摘要
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英文摘要
Friction and wear of materials accounts for enormous losses in performance and lifetime of materials, devices and structures, at considerable cost to the US manufacturing, energy, and infrastructure sectors. Approaches to mitigate friction and wear are thus beneficial to the US economy. This Grant Opportunities for Academic Liaison with Industry (GOALI) award supports scientific research to understand mechanisms of friction and wear in metal nitride coatings. Preliminary studies revealed metal nitride coatings are among the most wear-resistant materials ever discovered, showing promise for significantly reducing the financial and environmental impacts of wear. In this research project, thin layers of metal nitride compounds are synthesized and their friction and wear properties are investigated. The aim of this work is to identify the relationships between how the films were created (processing) and their wear behavior (properties). Understanding these relationships allows for enhanced control of the mechanical behavior, and can lead to high-performance wear-resistant materials for coatings. The new materials developed are of broad importance for increasing efficiency and lifetime of mechanical systems, on both large and small scales. The work is performed in collaboration with an industrial partner, Veeco CNT. The industry team is integrally involved in the studies, which provides both educational opportunities for students involved in the research and a path to commercialization for high-performance wear-resistant coating materials. This research examines the fundamental relationships among processing, microstructure, and mechanical behavior in a class of transition metal nitrides deposited using plasma-enhanced atomic layer deposition. The high degree of synthetic tunability in this deposition technique allows for tailoring of the film composition and microstructure. Specifically, the fundamental role of composition on wear mechanism is investigated to determine the role of solid solution strengthening versus the formation of a lubricious wear-generated film in films with both vanadium and titanium cations. The impact of crystallite size on mechanical properties is determined for crystallite sizes in the 1-30 nm range using four independent synthesis parameters that control crystallite size. Adhesion and interface chemistry between the nitride films is investigated and related to macroscopic mechanical behavior, such as delamination, that is relevant to applications. Taken together, these studies reveal fundamental wear mechanisms of this highly promising material that can be related directly to the synthesis and processing parameters.This award reflects NSF's statutory mission and has been deemed worthy of support through evaluation using the Foundation's intellectual merit and broader impacts review criteria.
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Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure
氮化钼钛的等离子体增强原子层沉积:射频偏压和衬底结构的影响
DOI:
10.1116/6.0001175
发表时间:
2021
期刊:
Journal of Vacuum Science & Technology A
影响因子:
2.9
作者:
[Chowdhury, Md. Istiaque, Sowa, Mark, Van Meter, Kylie E., Babuska, Tomas F., Grejtak, Tomas, Kozen, Alexander C., Krick, Brandon A., Strandwitz, Nicholas C.]
通讯作者:
Strandwitz, Nicholas C.
Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
氮化钛-氮化钼固溶体的等离子体增强原子层沉积
DOI:
10.1116/6.0000717
发表时间:
2021
期刊:
Journal of Vacuum Science & Technology A
影响因子:
2.9
作者:
[Chowdhury, Md. Istiaque, Sowa, Mark, Kozen, Alexander C., Krick, Brandon A., Haik, Jewel, Babuska, Tomas F., Strandwitz, Nicholas C.]
通讯作者:
Strandwitz, Nicholas C.
Plasma-enhanced atomic layer deposition of vanadium nitride
氮化钒的等离子体增强原子层沉积
DOI:
10.1116/1.5109671
发表时间:
2019
期刊:
Journal of Vacuum Science & Technology A
影响因子:
2.9
作者:
[Kozen, Alexander C., Sowa, Mark J., Ju, Ling, Strandwitz, Nicholas C., Zeng, Guosong, Babuska, Tomas F., Hsain, Zakaria, Krick, Brandon A.]
通讯作者:
Krick, Brandon A.
DOI:
10.1007/s11249-022-01642-y
发表时间:
2022-12-01
期刊:
TRIBOLOGY LETTERS
影响因子:
3.2
作者:
[Babuska, Tomas F., Curry, John F., Krick, Brandon A.]
通讯作者:
Krick, Brandon A.
CAREER: Probing Crystallization of Atomic Layers Using In Situ Electron Diffraction
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批准号:1752956
-
项目类别:Continuing Grant
-
资助金额:$59.98万
-
财政年份:2018
-
负责人:Nick Strandwitz
-
依托单位:
Silicon Metal-Insulator-Semiconductor Photovoltaics with Atomic Layer Deposited Interfacial Layers
-
批准号:1605129
-
项目类别:Standard Grant
-
资助金额:$34.91万
-
财政年份:2016
-
负责人:Nick Strandwitz
-
依托单位:
Semiconductor Photoanodes for Water Oxidation and Solar Fuels Generation Stabilized Using Atomic Layer Deposition
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批准号:1042006
-
项目类别:Standard Grant
-
资助金额:$20.0万
-
财政年份:2010
-
负责人:Nick Strandwitz
-
依托单位:
国内基金
海外基金
磷脂酶Ultra特异性催化油脂体系中微量磷脂分子的调控机制研究
-
批准号:31471690
-
项目类别:面上项目
-
资助金额:90.0万元
-
批准年份:2014
-
负责人:王永华
-
依托单位:
适应纳米尺度CMOS集成电路DFM的ULTRA模型完善和偏差模拟技术研究
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批准号:60976066
-
项目类别:面上项目
-
资助金额:41.0万元
-
批准年份:2009
-
负责人:何进
-
依托单位: