Photonic Moire Nanostructures for Scalable Fabrication of Quantum Structures

用于可扩展制造量子结构的光子莫尔纳米结构

• 批准号: 2028773
• 负责人: Teri Odom
• 金额: $ 40万
• 依托单位: Northwestern University
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2020
• 资助国家: 美国
• 起止时间: 2020-09-01 至 2024-08-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=2028773&HistoricalAwards=false
• 关键词: Photonic; Moire; Nanostructures; Scalable; Fabrication

Scalable manufacturing procedures that can generate nanoscale patterns with no natural geometric analog are useful in the formation of nanostructured device structures. Ultrathin nanostructures (one thousandth the diameter of a human hair) composed of metallic building units can control the flow of light in new ways and transform modern bulky devices. Such surfaces will accelerate progress in fabricating new materials and the emergence of domestic industries involving quantum communication, enhanced light collection for solar cells, and compact light emitters for optical circuits. Historically, the creation of complex nanostructured designs has required precise, slow-production tools that are expensive and time consuming. This research will explore highly reproducible and broadly flexible methods to form surfaces with unconventional geometries for light manipulation from simple and accessible lithography tools. By incorporating the expertise of materials science engineers and computational scientists, this research expands our nation’s leadership in scalable manufacturing processes critical for quantum information processing and anti-counterfeiting for national security. This work will also increase scientific literacy through a combination of hands-on demonstrations to under-represented communities and widely available video tutorials depicting the techniques used in this research.Superimposing periodic arrays at specific rotational offsets produce interference patterns known as moiré patterns. Depending on the offset angle, the moiré pattern may be highly symmetric or aperiodic. Stacking two layers of 2D atomic materials at a “magic angle” has resulted in electronic moiré potentials that show unexpected physical properties including superconductivity and topological excitonic states. This project develops scalable nanofabrication methods to generate large-area photonic moiré nanostructures by building on moiré nanolithography. Although periodic nanostructures can be fabricated by techniques such as nanoimprinting and laser interference lithography, the patterns are typically limited to arrays with a single repeating unit. With multiple exposures and a library of periodic masks, however, moiré nanolithography can drastically expand the number of symmetries beyond those realized by stacking 2D atomic materials. Pattern formation, transfer, and processing will be optimized to investigate photonic properties that may only be realized by nanoarchitectures organized into super-symmetries. One application will focus on the nanomanufacturing of photonic structures that may support topological states or that can be coupled to quantum emitters for unprecedented light-matter interactions.This award reflects NSF's statutory mission and has been deemed worthy of support through evaluation using the Foundation's intellectual merit and broader impacts review criteria.

可以生成没有自然几何模拟的纳米级图案的可缩放制造过程在纳米结构化器件结构的形成中是有用的。由金属构建单元组成的超薄纳米结构（人类头发直径的千分之一）可以以新的方式控制光的流动，并改变现代笨重的设备。这些表面将加速制造新材料的进展，以及涉及量子通信、太阳能电池增强光收集和光学电路紧凑型光发射器的国内产业的出现。从历史上看，创建复杂的纳米结构设计需要精确、缓慢的生产工具，这些工具既昂贵又耗时。这项研究将探索高度可重复和广泛灵活的方法，以形成具有非常规几何形状的表面，用于从简单和可访问的光刻工具进行光操作。通过整合材料科学工程师和计算科学家的专业知识，这项研究扩大了我国在可扩展制造工艺方面的领导地位，这些工艺对量子信息处理和国家安全防伪至关重要。这项工作还将通过向代表性不足的社区进行实际演示和广泛提供描述这项研究中使用的技术的视频教程来提高科学素养。在特定的旋转偏移处叠加周期性阵列会产生称为莫尔条纹的干涉图案。根据偏移角，莫尔图案可以是高度对称的或非周期性的。以“魔角”堆叠两层2D原子材料产生了电子莫尔势，显示出意想不到的物理特性，包括超导性和拓扑激子态。该项目开发了可扩展的纳米制造方法，通过构建莫尔纳米光刻来生成大面积光子莫尔纳米结构。虽然周期性纳米结构可以通过诸如纳米压印和激光干涉光刻的技术来制造，但是图案通常限于具有单个重复单元的阵列。然而，通过多次曝光和周期性掩模库，莫尔纳米光刻可以大大扩展对称性的数量，超出通过堆叠2D原子材料实现的对称性。图案的形成，转移和处理将被优化，以调查光子特性，可能只能通过组织成超对称的纳米架构实现。一个应用将集中在光子结构的纳米制造，可以支持拓扑状态或可以耦合到量子发射器的前所未有的光-物质相互作用。这个奖项反映了NSF的法定使命，并已被认为是值得通过使用基金会的智力价值和更广泛的影响审查标准进行评估的支持。