Wafer-Scale Ultrathin Layered Device Array Assembly through a Precision Soft-Robotic Stamp Transfer Process
通过精密软机器人印模转移工艺组装晶圆级超薄分层器件阵列
基本信息
- 批准号:2243477
- 负责人:
- 金额:$ 52.09万
- 依托单位:
- 依托单位国家:美国
- 项目类别:Standard Grant
- 财政年份:2023
- 资助国家:美国
- 起止时间:2023-05-01 至 2026-04-30
- 项目状态:未结题
- 来源:
- 关键词:
项目摘要
MMonolayer materials such as graphene can be vertically stacked into van der Waals heterostructures (vdWH) to realize new ultrathin layered optoelectronic, electronic, and quantum devices, which have significant potential to revolutionize nanoelectronics for a wide range of applications. Despite the tremendous opportunity, today’s assembly of vdWH-based devices is mainly through manual operation, which lacks the precision, repeatability, and throughput needed to manufacture vdWH-based device arrays at scale. This award supports fundamental research to remove technical barriers toward a scalable, precise, and high-yield technology to assemble patterned monolayer materials into vdWH-based device arrays at wafer scale. The researched new assembly approach uses a novel soft-robotic stamp transfer process with precision alignment and adhesion control. Inline measurements and data analytics enable defect monitoring and feedback control. This research holds a strong potential to enable deterministic, high-throughput, and high-yield manufacturing of vdWH-based device arrays and circuits for next-generation transparent displays, sensor arrays, and logic and memory circuits, thereby benefiting society at large. In addition, this award supports the training of graduate and undergraduate students in research, incorporating the research into curricula, and outreach to K-12 students.Two scientific barriers prevent the realization of deterministic and scalable stamp transfer assembly of vdWH-based device arrays at wafer scale: (a) the lack of quantitative knowledge in the adhesion control for the stamp-monolayer-substrate interfaces, and (b) the lack of methods to achieve precise interlayer registration over a large area. This project aims to address these knowledge gaps and to enable the scalable, precise, and high-yield assembly of patterned monolayer materials into vdWH device arrays. In particular, this project (i) characterizes the interfacial adhesion between the stamp, monolayer materials, and substrates under various stimuli aiming to achieve the deterministic control of monolayer pick-up and release, (ii) creates a novel soft-robotic stamp transfer machine prototype that can provide precision interlayer alignment with micron-level accuracy and deterministic transfer actions, and (iii) creates inline and offline metrology and data analysis tools and use the measurements to improve the manufacturing process and thus reduce defect rate. The performance of the envisioned manufacturing machine and process is evaluated through experiments involving vdWH device array assembly and a series of metrology results for the process and productsThis award reflects NSF's statutory mission and has been deemed worthy of support through evaluation using the Foundation's intellectual merit and broader impacts review criteria.
石墨烯等单层材料可以垂直堆叠成范德华异质结构(vdWH),以实现新型超薄层状光电、电子和量子器件,这些器件具有在广泛应用领域彻底改变纳米电子学的巨大潜力。尽管存在巨大的机会,但当今基于 vdWH 的器件的组装主要通过手动操作,缺乏大规模制造基于 vdWH 的器件阵列所需的精度、可重复性和吞吐量。该奖项支持基础研究,以消除可扩展、精确和高产量技术的技术障碍,以将图案化单层材料组装成晶圆级基于 vdWH 的器件阵列。研究的新组装方法采用新型软机器人印模转移工艺,具有精确对准和粘附控制功能。在线测量和数据分析可实现缺陷监控和反馈控制。这项研究具有强大的潜力,可以实现基于 vdWH 的器件阵列和电路的确定性、高通量和高产量制造,用于下一代透明显示器、传感器阵列以及逻辑和存储电路,从而造福整个社会。此外,该奖项还支持研究生和本科生的研究培训,将研究纳入课程,并推广到 K-12 学生。两个科学障碍阻碍了在晶圆级实现基于 vdWH 的器件阵列的确定性和可扩展的印模转移组装:(a) 缺乏印模-单层-基板界面粘附控制的定量知识,以及 (b) 缺乏实现的方法 大面积的精确层间配准。该项目旨在解决这些知识差距,并实现将图案化单层材料可扩展、精确且高产量地组装成 vdWH 器件阵列。特别是,该项目(i)表征了印模、单层材料和基材在各种刺激下的界面粘附力,旨在实现单层拾取和释放的确定性控制,(ii)创建了一种新型软机器人印模转移机原型,可以提供微米级精度和确定性转移动作的精密层间对准,以及(iii)创建在线和离线计量和数据分析工具 并利用测量结果来改进制造工艺,从而降低缺陷率。设想的制造机器和工艺的性能通过涉及 vdWH 器件阵列组装的实验以及工艺和产品的一系列计量结果进行评估。该奖项反映了 NSF 的法定使命,并通过使用基金会的智力价值和更广泛的影响审查标准进行评估,被认为值得支持。
项目成果
期刊论文数量(1)
专著数量(0)
科研奖励数量(0)
会议论文数量(0)
专利数量(0)
Semi-Automated Soft Robotic Stamp Transfer Machine for Van Der Waals Heterostructure Device Assembly
用于范德瓦尔斯异质结构器件组装的半自动软机器人印章转移机
- DOI:10.1115/msec2023-101118
- 发表时间:2023
- 期刊:
- 影响因子:0
- 作者:Ahn, Seong-Hyo;Chavarria, Juan;Mu, Haoxuan;Liao, Yifeng;Warner, Jamie;Zhou, Lei
- 通讯作者:Zhou, Lei
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Lei Zhou其他文献
Vortex-induced vibration control of a streamline box girder using the wake perturbation of horizontal axis micro-wind turbines
利用水平轴微型风力发电机尾流扰动控制流线型箱梁涡激振动
- DOI:
10.1016/j.jfluidstructs.2021.103444 - 发表时间:
2022-01 - 期刊:
- 影响因子:3.6
- 作者:
Hongfu Zhang;Han Zhang;Dabo Xin;Jian Zhan;Rui Wang;Lei Zhou - 通讯作者:
Lei Zhou
A Traffic Equilibrium Mapping Method with Energy Minimization for 3D NoC-Bus Mesh Architecture
一种用于 3D NoC-Bus 网状架构的能量最小化流量均衡映射方法
- DOI:
- 发表时间:
2015 - 期刊:
- 影响因子:0
- 作者:
Taotao Zhang;Ning Wu;Fang Zhou;Lei Zhou;Xiaoqiang Zhang - 通讯作者:
Xiaoqiang Zhang
Synthesis of 3‐Amino‐1‐(difluoromethylidene)‐tetralins via Relay Photocatalytic Cascade Reactions of Arylalanines and 2‐Bromo‐3,3,3‐trifluoropropene
通过芳基丙氨酸和2-溴-3,3,3-三氟丙烯的中继光催化级联反应合成3-氨基-1-(二氟亚甲基)-四氢化萘
- DOI:
10.1002/adsc.202200612 - 发表时间:
2022-08 - 期刊:
- 影响因子:5.4
- 作者:
Weidi Zeng;Linyong Li;Chihao Wang;Duozhi Wang;Lei Zhou - 通讯作者:
Lei Zhou
Highly Water-Dispersible, Highly Conductive, and Biocompatible Polypyrrole-Coated Silica Particles Stabilized and Doped by Chondroitin Sulfate
硫酸软骨素稳定和掺杂的高水分散性、高导电性和生物相容性聚吡咯涂层二氧化硅颗粒
- DOI:
10.1002/ppsc.201500157 - 发表时间:
2015 - 期刊:
- 影响因子:2.7
- 作者:
Lei Zhou;Guoxin Tan;Kongyou Ouyang;Yan Liu;Chengyun Ning - 通讯作者:
Chengyun Ning
Effects of oxygen concentrations on the ignition and quasi-steady processes
氧气浓度对点火和准稳态过程的影响
- DOI:
- 发表时间:
2018 - 期刊:
- 影响因子:7.4
- 作者:
Haiqiao Wei;Wanhui Zhao;Zhen Lu;Lei Zhou - 通讯作者:
Lei Zhou
Lei Zhou的其他文献
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{{ truncateString('Lei Zhou', 18)}}的其他基金
Next-Generation Safe and Dexterous Robot Hands using High-Torque Direct-Drive Actuation
采用高扭矩直驱驱动的下一代安全灵巧的机器人手
- 批准号:
2221051 - 财政年份:2023
- 资助金额:
$ 52.09万 - 项目类别:
Standard Grant
Support for Student Teams to Participate in International Challenge at Annual Conference of American Society of Precision Engineering; Boston, Massachusetts; 13-18 November 2023
支持学生团队参加美国精密工程学会年会国际挑战赛;
- 批准号:
2332102 - 财政年份:2023
- 资助金额:
$ 52.09万 - 项目类别:
Standard Grant
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