Conference: 6th US Gallium Oxide Workshop

氧化镓是一种新兴的超宽带隙(UWBG)半导体，近年来在下一代电力和无线应用中引起了人们的极大兴趣。在击穿电压和器件优值系数方面，氧化镓器件的性能一直是惊人的。这种性能的提高得到了大面积块状衬底的支持。尽管取得了这些进展，但在基础材料的理解和器件技术向现实世界应用的过渡方面，仍然存在巨大的挑战。为了促进富有成效的讨论、合作和学生培训，美国第六届氧化镓研讨会于2023年8月13-16日在纽约布法罗大学(SUNY)校区举行。这一首屈一指的美国国内会议将为研究人员和学生提供一个展示他们成果的广阔平台。通过支持学生参与，该项目将有助于劳动力的发展。该项目还将增加代表不足的少数族裔(URM)学生的参与。除了介绍他们的工作外，学生们还将有机会听取三位主旨演讲者和十二位由学术界和业界领袖发表的特邀演讲者的演讲。会议将涵盖氧化镓及其相关材料(理论、合成、表征、器件、电路和系统)的广泛主题，从而覆盖广泛的网络，以吸引更多不同的学生和与会者。所有这些话题都在经济和能源安全方面产生了强烈的积极社会影响。这些活动将增加半导体制造业的知识库，半导体制造业是美国经济的重要贡献者。该奖项反映了NSF的法定使命，并通过使用基金会的智力优势和更广泛的影响审查标准进行评估，被认为值得支持。

Gallium oxide is an emerging ultrawidebandgap (UWBG) semiconductor that has attracted a lot of interest in recent years for next generation power and wireless applications. The gallium oxide device performance has been phenomenal in terms of breakdown voltages and device figures of merit. This performance enhancement has been underpinned by the availability of large area bulk substrates. Despite this progress there are still significant challenges both at the fundamental materials understanding and the device technology transition to real world applications. To foster fruitful discussions, collaborations and student training, the 6th US Gallium Oxide Workshop is organized in August 13-16, 2023, at the University at Buffalo (SUNY) campus in Buffalo, NY. This premier US domestic conference will provide researchers and students with a broad platform to present their results. By supporting student participation, this project will contribute towards workforce development. The project will also increase the participation of underrepresented minority (URM) students. In addition to presenting their work, the students will get an opportunity to listen to three keynote speakers and twelve invited speakers presented by academic and industry leaders. The conference will cover a wide range of topics in gallium oxide and related materials (theory, synthesis, characterization, devices, circuits, and systems), thus casting a wide net to capture more diverse students and attendees. All these topics have strong positive social impact both in terms of economic and energy security. The activities will increase the knowledge base in semiconductor manufacturing which is a significant contributor to the US economy.This award reflects NSF's statutory mission and has been deemed worthy of support through evaluation using the Foundation's intellectual merit and broader impacts review criteria.