MRI:Acquisition of Ultra high Performance Electron Beam Lithography System for the Western New York Region

这个主要的研究仪器项目是获得一个高性能的电子束光刻系统的研究，教育和更广泛的影响，在西纽约地区。该系统使用超窄的高能电子束（1.8 nm宽）来定义数十纳米尺度的特征。这种先进的纳米纤维工具的独特功能将使工程，物理，化学，材料科学和生物学等广泛领域的关键研究成为可能。这一最先进的工具将安装在布法罗大学，为该地区的大量学生、教师、研究人员和企业家提供现场和远程访问。该工具的独特功能是能够在大面积上以快速写入速度定义亚10 nm尺寸结构。这一特性对于电子学和光子学的前沿研究非常重要。其目的是将在学术实验室获得的基础知识迅速转化为真实的世界应用。该工具的另一个功能是能够在柔性衬底上定义纳米结构，这对于生物医学应用至关重要。工程和科学学科的本科生和研究生将有机会使用该工具。他们将通过布法罗大学电气工程系提供的课程和项目接受使用培训。该工具将使跨计算，通信，医疗保健和教育的前沿研究成为可能。为本科生和研究生提供的研究机会将有助于培养未来劳动力的技能，以适应知识型经济，并保持美国的经济竞争力。该工具将改善纽约西部地区的研究基础设施，并对该地区的经济产生积极影响。远程访问功能将使学生能够从任何地点提交他们的设计进行制造。该工具还将有助于在工程和应用科学强有力的外联方案。电子束光刻是电子学、光子学、物理学和材料科学领域高级研究不可或缺的工具。该工具将使研究范围广泛的主题：低功率非易失性高速铁电和磁电基逻辑和存储器件，用于节能数据密集型计算应用;新兴的低功率和高效量子器件;基于二维材料的纳米电子学;基于宽带隙半导体的高功率柔性电子学;基于III-V族半导体中光学声子与石墨烯等离子体结构耦合的室温THz器件;理解相关电子系统中的基本物理;用于化学和生物传感的THz等离子体结构;用于THz通信的石墨烯等离子体阵列;以及二维材料、异质界面和器件的表征。这些高影响力的研究具有从计算，通信，能源和健康的应用范围。它也将有助于理解相关材料的基本物理和技术上重要的反铁磁氧化物的开关动力学。拟收购的工具将具有大的加速电压，亚10纳米光刻分辨率，高光束位置分辨率，亚20纳米拼接和重叠精度，可调字段大小高达3000微米的高吞吐量写入，和高度校正功能的柔性基板上写入。该奖项反映了NSF的法定使命，并通过使用基金会的知识价值和更广泛的影响审查标准进行评估，被认为值得支持。

This major research instrumentation project is to acquire a high-performance Electron Beam Lithography system for research, education and broader impact in the Western New York region. The system uses an ultra-narrow beam of high energy electrons (1.8 nm wide) to define features on the scale of tens of nanometers. The unique capabilities of this advanced nanofabrication tool will enable crucial research in a broad range of fields spanning engineering, physics, chemistry, materials science and biology. The state-of-the-art tool will be installed at the University at Buffalo and provide both onsite and remote access to a large number of students, faculty, researchers and entrepreneurs across the region. The unique feature of the tool is the ability to define sub-10 nm dimension structures with fast writing speed over large areas. This feature is very important for cutting edge research in electronics and photonics. The aim is to rapidly translate the fundamental knowledge gained in academic laboratories to real world applications. Another feature of the tool is the ability to define nm structures on flexible substrates that are essential for biomedical applications. Undergraduate and graduate students in the engineering and science disciplines will have access to the tool. They will be trained in its use through courses and programs offered by the electrical engineering department at the University at Buffalo. The tool will enable cutting-edge research across computing, communications, healthcare, and education. The research opportunity given to undergraduate and graduate students will help build the skills of the future workforce for knowledge-based economy and maintain the economic competitiveness of the US. The tool will improve the research infrastructure in the western New York region and positively impact the economy of the region. The remote access feature will enable students to submit their designs for fabrication from any location. The instrument will also contribute to strong outreach programs in engineering and applied sciences. Investigators will provide mentorship to underrepresented students in science and engineering.Electron beam lithography is an indispensable tool for advanced research in electronics, photonics, physics, and materials science. The tool will enable research in a broad range of topics: low power non-volatile high speed ferroelectric and magneto-electric based logic and memory devices for energy efficient data intensive computing applications; emerging low power and efficient quantum devices; nano-electronics based on two-dimensional (2D) materials; high power flexible electronics based on widebandgap semiconductors; room temperature THz devices based on coupling of optical phonons in III-V semiconductors to graphene plasmonic structures; understanding of the fundamental physics in correlated electron systems; THz plasmonic structures for chemical and biological sensing; graphene plasmonic array for THz communication; and characterization of 2D materials, heterointerfaces, and devices. These high impact research have applications that range from computing, communication, energy and health. It will also help in understanding fundamental physics in correlated materials and the switching dynamics in technologically important antiferromagnetic oxides. The proposed tool to be acquired will have large acceleration voltage, sub-10nm lithographic resolution, high beam position resolution, sub-20 nm stitching and overlay accuracy, tunable field size up to 3000 micrometers for high throughput writing, and height correction feature for writing on flexible substrates. These unique features are essential to carry out the proposed research.This award reflects NSF's statutory mission and has been deemed worthy of support through evaluation using the Foundation's intellectual merit and broader impacts review criteria.