Time-resolved local-stress measurement of MEMS resonating structure using micro Raman spectroscopy
Time-resolved local-stress measurement of MEMS resonating structure using micro Raman spectroscopy
批准号:
24656087
负责人:
TSUCHIYA Toshiyuki
金额:
$2.58万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Challenging Exploratory Research
财政年份:
2012
资助国家:
日本
项目状态:
已结题
起止时间:
2012-04-01 至 2014-03-31
中文摘要
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英文摘要
A pull-in type electrostatic optical chopper using silicon-on-glass (SOG) wafer was proposed, fabricated, and tested to develop time-resolved micro-Raman spectroscopy for measuring local dynamic stress of silicon micro-electro-mechanical system (MEMS) resonators. The moving mass of electrostatic actuator made of the silicon device layer of SOG wafer is used as an optical chopper. The silicon mass has many slits where the incident laser light penetrates. At the OFF-state, the penetrated light terminated at aluminum shields on the glass substrate. By actuating the mass by electrostatic parallel plate electrodes, the penetrated light goes through the chopper (ON-state). Inserting the chopper to the micro Raman spectroscope, time-resolved analysis will be realized. The mechanical and optical responses of the chopper were measured. The double-side-drive type of chopper has a response time of around 50 us, which is good enough for the application.
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シリコンの破壊と疲労(第1編 第12章 3節) 服部敏雄他編:破壊力学大系
硅的断裂和疲劳(第 1 部分,第 12 章,第 3 节)Toshio Hattori 等编辑:断裂力学系统
DOI:
--
发表时间:
2012
期刊:
影响因子:
--
作者:
[小北雄亮, 谷山彰, 平井義和, 田畑修, 土屋智由, Toshiyuki Tsuchiya, 佐藤 一雄,土屋智由]
通讯作者:
佐藤 一雄,土屋智由
Material and Device Reliability in Si MEMS Sensors
Si MEMS 传感器的材料和器件可靠性
DOI:
--
发表时间:
2012
期刊:
影响因子:
--
作者:
[小北雄亮, 谷山彰, 平井義和, 田畑修, 土屋智由, Toshiyuki Tsuchiya]
通讯作者:
Toshiyuki Tsuchiya
時間分解顕微ラマン分光のためのプルイン型MEMS光チョッパの動作特性
用于时间分辨微拉曼光谱的牵引式 MEMS 光学斩波器的工作特性
DOI:
--
发表时间:
2013
期刊:
影响因子:
--
作者:
[谷山彰, 小北雄亮, 平井義和, 田畑修, 土屋智由]
通讯作者:
土屋智由
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DOI:
--
发表时间:
期刊:
影响因子:
--
作者:
[]
通讯作者:
Fatigue Testing of Polycrystalline Silicon Thin-film Membrane Using Out-of-plane Bending Vibration
利用面外弯曲振动进行多晶硅薄膜疲劳测试
DOI:
10.1143/jjap.51.11pa02
发表时间:
2012
期刊:
Japanese Journal of Applied Physics
影响因子:
1.5
作者:
[Tomoki Tanemura, Shuichi Yamashita, Hiroyuki Wado, Yukihiro, Takeuchi, Toshiyuki Tsuchiya, Osamu Tabata]
通讯作者:
Osamu Tabata
共 6 条
Explanation of reaction layer fatigue in silicon microstructure for development of highly-reliable MEMS devices
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批准号:19676002
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项目类别:Grant-in-Aid for Young Scientists (S)
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资助金额:$71.8万
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财政年份:2007
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负责人:TSUCHIYA Toshiyuki
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依托单位:
Land Conservation NPOs in Japan and United States : Present and Future
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批准号:14597002
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项目类别:Grant-in-Aid for Scientific Research (C)
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资助金额:$2.24万
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财政年份:2002
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负责人:TSUCHIYA Toshiyuki
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依托单位:
Natural resource management policy in New Zealand
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批准号:09041049
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项目类别:Grant-in-Aid for international Scientific Research
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资助金额:$5.95万
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财政年份:1997
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负责人:TSUCHIYA Toshiyuki
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依托单位:
海外基金