chiralFEBID - Direct writing of chiral and nonlinear plasmonic devices

资讯科技的发展，大大推动了资讯科技的技术革新，而资讯科技已渗透到各行各业。未来的IT系统将依赖于光子而不是电子，这引发了对纳米级光学设备的需求。等离子体纳米结构构成了一种有前途的方法，因为它们的最小几何特征不受衍射极限的限制。本计画将著重于设计、制作及测试以电浆纳米结构为基础之三维奈米元件。提出的器件是一个手性圆偏振转换器和手性全光转换器缩小电信光到可见光的芯片上的二次和三次谐波产生。偏振敏感波导将用于从近场到远场的输入耦合和输出耦合。设想的器件原型的占地面积将小于1 μm^2，这是实现器件小型化的关键一步。该装置的制造需要结合完整的几何形状控制与所需的材料性能。在这方面，用电子直接写入是最佳选择。虽然聚焦电子占最小的结构特征，但直接写入在一个步骤中提供了对三维的访问。结合基于离子束的图案化，可以在一个真空室内制造复杂的器件。由于等离子体激元系统需要具有优选低损耗的金属光学响应，因此沉积和图案化的材料将关于它们在可见光范围内的光学响应而被优化。材料和设备将采用各种光谱技术进行表征。数值模拟和分析计算构成了实验的骨干。总之，该项目将为等离子体器件的制造建立一条新的路线，并加深对纳米级光-物质相互作用的理解。

Progress in miniaturisation constitutes an enormous impetus for technical innovations in information technology, permeating all economic sectors. Future IT systems will rely on photons instead of electrons what triggers the need for nanoscale optical devices. Plasmonic nanostructures constitute a promising approach since their minimum geometric features are not restricted by the diffraction limit. This project will focus on designing, fabricating and testing of threedimensional nano-devices based on plasmonic nanostructures. The proposed devices are a chiral circular polarization converter and a chiral all-optical converter downscaling telecom light to visible light on chip by second and third harmonic generation. Polarisation sensitive waveguides will serve for in- and out-coupling from near to far-field. The envisaged footprint of the device prototypes will be smaller than 1 μm^2 constituting a crucial step towards device miniaturisation. The device fabrication requires the combination of full geometric shape control with desired material properties. In this regard direct writing with electrons is the optimum choice. While the focused electrons account for minimum structural features, the direct writing provides access to three dimensions in a single step. In combination with ionbeam based pattering complex devices can be fabricated within one vacuum chamber. Since plasmonic systems require a metallic optical response with preferably low losses, deposited and patterned materials will be optimized concerning their optical response in the visible range. Materials and devices will be characterized with various spectroscopic techniques. Numerical simulations and analytical calculations constitue the backbone of the experiments. In summary, the proposed project will establish a novel route for plasmonic device fabrication and lead to a deeper understanding of light-matter interaction at the nanoscale.