Secondary Ion Generation Mechanism Studied by Multi-photon Excima Laser Ionization

多光子准激激光电离二次离子产生机理研究

• 批准号: 01460084
• 负责人: SHIMIZU Ryuichi
• 金额: $ 4.03万
• 依托单位: Osaka University
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for General Scientific Research (B)
• 财政年份: 1989
• 资助国家: 日本
• 起止时间: 1989 至 1990
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/en/grant/KAKENHI-PROJECT-01460084/
• 关键词: Quantitative Surface Analysis; Multi-photon Ionization; Secondary Ion Mass Spectroscopy; Sputtering; Ion implantation; Surface Binding Energy; エキシマレ-ザ-; 多光子励起イオン化; スパッタ-粒子; 多光子励起; 二次イオン生成; 表面分析

We have succeeded to develop Multi-Photon Ionization System, which enables us to perform quantitative secondary ion mass spectroscopy as well as precise measurement of velocity distribution of sputtered particles. Figure shown below is schematic diagram of the systems. Typical conditions of the manurement are as follows : Laser beam size, 0.9m x 0.3m ; Laser intensity 33mJ, ion be&n 1-3, muA for cleaning and lO-3OnA for the manurement of sputtered particles ; Vacuum lxlO^<-9>Torr.The results are summarized ;(1) Quantitative surface analysis for Al-Cu alloys have indicated that concentration of AI is determined so accurately as C_<A1>=25.4<plus-minus>0.446% for true concentration 26%.(2) This type of quantitative surface analysis can be performed with high stability almost unsensitive to the variation of surface cont&nination and vacuum deterioration.(3) It has, first, bean observed that velocity distribution of sputtered atoms from Cu-Ni alloy under Ar+ ion bonbardment is slightly dependent on the ion dose.(4) The analysis has led to conclusion that the primary Are ions implanted in the surface of Cu-Ni alloy do change the actual surface binding energy, i. e., high dose leads to lower the surface binding energy.

我们成功地开发了多光子电离系统，使我们能够进行定量的二次离子质谱以及溅射粒子的速度分布的精确测量。下图为系统示意图。典型的处理条件为：激光束尺寸0.9m × 0.3m，激光强度33 mJ，离子束清洗1-3 μ A，溅射粒子处理10 - 30 nA，真空度1 × 10 ~（-3）<-9>Torr<A1><plus-minus>. (2)这种定量表面分析方法稳定性高，对表面粗糙度和真空度的变化几乎不敏感。(3)本文首先观察到在Ar ~+离子轰击下Cu-Ni合金溅射原子的速度分布与离子剂量的关系不大。(4)分析得出的结论是，注入Cu-Ni合金表面的一次Are离子确实改变了实际表面结合能，即。例如，高剂量导致表面结合能降低。

项目成果

E.Kawatoh and R.Shimizu: "Analysis of Sputtered Neutrals by Nonresonant Multiphoton Ionization.2.A Quantitative Composition Analysis of Cu-Al Alloy" Jpn.J.Appl.Phys.30. 832-836 (1991)

E.Kawatoh 和 R.Shimizu：“通过非共振多光子电离分析溅射中性子。2.铜铝合金的定量成分分析”Jpn.J.Appl.Phys.30。

E.Kawatoh and R.Shimizu: "Analysis of Sputtered Neutrals by Nonresonant Multiphoton Ionization II.A Quantitative Composition Analysis of CuーAl Alloy" Jpn.J.Appl.Phys.30. (1991)

E. Kawatoh 和 R. Shimizu：“通过非共振多光子电离分析溅射中性子 II.A 铜铝合金的定量成分分析”Jpn.J.Appl.Phys.30 (1991)。

E.Kawatoh and R.Shimizu: "Analysis of Sputtered Neutrals by Nonresonant Multiphoton Ionization.3.Change of the Velocity Distribution with Time after Sputtering" Jpn.J.Appl.Phys.30. 1256-1261 (1991)

E.Kawatoh 和 R.Shimizu：“通过非共振多光子电离分析溅射中性子。3.溅射后速度分布随时间的变化”Jpn.J.Appl.Phys.30。

E. Kawatoh and R. Shimuzu: ""Analysis of Sputtered Neutrals by Nonresonant Multi-photon Ionization. I. Development of Laser Ion Counting System with a Simple Time-of-Flight Measurement"" Jpn. J. Appl. Phys.30. 608-611 (1991)

E. Kawatoh 和 R. Shimuzu：“通过非共振多光子电离分析溅射中性子。”

E.Kawatoh and R.Shimizu: "Analysis of Sputtered Neutrals by Nonresonant Multiphoton Ionization III Change of the Velocity Distribution with Time After Sputtering" Jpn.J.Appl.Phys.

E.Kawatoh 和 R.Shimizu：“通过非共振多光子电离分析溅射中性子 III 溅射后速度分布随时间的变化”Jpn.J.Appl.Phys。