Structure Analysis of Solution Surface by Photoelectron Yield XAFS Method.

通过光电子产额 XAFS 方法分析溶液表面的结构。

• 批准号: 05453057
• 负责人: WATANABE Iwao
• 金额: $ 4.29万
• 依托单位: Osaka University
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for General Scientific Research (B)
• 财政年份: 1993
• 资助国家: 日本
• 起止时间: 1993 至 1994
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/en/grant/KAKENHI-PROJECT-05453057/
• 关键词: Solution surface; Solvation structure; EXAFS; Bromide ion; Total-reflection XAFS; Surfactant; Photoelectron yield XAFS; 光電子収率XAFS; 電子収率XAFS; 全反射XAFS; ルビジウムイオン

The X-ray absorption fine structure (XAFS) spectroscopy is a powerful tool for the short range structure analyzes of amorphous samples and liquids. In this study its application is extended to the chemical species at air/water interface. The surface active ions and molecules segregated at the solution surface are playing important role in the processes of solvent extraction, phase -transfer, and the formation of the Langmuir-Blodgett film, although almost nothing is known about the solvation structures of the surface species.The monochromatized X-ray beam was introduced into the solution cell at a grazing incidence angle of 1mrad under the total-reflection condition. The cell contains a 66mm x 216mm trough which is cooled to 1? A1C and the cell is filled with helium gas at an atmospheric pressure. The XAFS of the surface species was determined by detecting the conversion electron current or the helium ion current. Stearyltrimethylammonium bromide aqueous solution at 0.1mM concentration gave quite an intense signal for Br K-edge absorption. The spectrum was different from that of bulk solution by the transmission method.

X射线吸收精细结构（XAFS）光谱是对无定形样品和液体进行短范围结构分析的强大工具。在这项研究中，其应用扩展到空气/水界面的化学物种。在溶液表面隔离的表面活性离子和分子在溶剂提取，相转移的过程中起着重要作用，尽管几乎一无所知，尽管几乎什么都没知道，因此在表面物种的溶剂化结构中，单染色仪的X射线束在溶液中以溶液的形式构成了溶液中的溶液，并在溶液中呈现了一个格局，总计是一个graz contiver conterive contrad-1Mr-1MR rat-1mr。该单元包含一个66mm x 216mm的槽，冷却至1？ A1C和电池在大气压下充满了氦气。通过检测转换电子电流或氦离子电流来确定表面物种的XAF。 0.1mm浓度下的氯苯基三甲基铵水溶液给出了BR K边缘吸收的强烈信号。通过传输方法，频谱与散装解决方案不同。

项目成果

M.Takahashi: "Electron and Helium lon Yield XAFS of Sputter-Deposited lron Silidcide Thin Films." Physica B. (印刷中). (1995)

M. Takahashi：“溅射沉积铁硅化物薄膜的电子和氦产率 XAFS”。Physica B.（1995 年出版）。

H.Tanida: "Photoelectron Emission Spectroscopy Applied to Anions in Solution." J.Molecular Liquids. (印刷中). (1995)

H.Tanida：“应用于溶液中阴离子的光电子发射光谱”（J.Molecular Liquids）（出版中）。

S.Kohiki, M.Nishitani, T.Negami, T.Wada, H.Monjushiro, I,Watanabe and Y.Yokoyama: "UV Photoelectron Yield Spectroscopy of Chalcopyrite Structure Cu-In-Se Thin Films" Thin Solid Films. 238. 195-198 (1994)

S.Kohiki、M.Nishitani、T.Negami、T.Wada、H.Monjushiro、I、Watanabe 和 Y.Yokoyama：“黄铜矿结构 Cu-In-Se 薄膜的紫外光电子产率光谱”固体薄膜。

T.Miyanaga: "EXAFS Debye-Waller Factor and Ligand Exchange Reaction of Hydrated Metal Complexes." Bull.Chem.Soc.Jpn.(in press).

T.Miyanaga：“EXAFS Debye-Waller 因子和水合金属配合物的配体交换反应。”

I.Watanabe: "EXAFS of Bromide Ion in Solvents and at Air/Solution Interface." J.Molecular Liquids. (in press).

I.Watanabe：“溶剂中和空气/溶液界面处溴离子的 EXAFS”。