Basic study on lithium coating and plasma-surface processes
Basic study on lithium coating and plasma-surface processes
批准号:
05680391
负责人:
TOYODA Hirotaka
金额:
$1.28万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for General Scientific Research (C)
财政年份:
1993
资助国家:
日本
项目状态:
已结题
起止时间:
1993 至 1994
中文摘要
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英文摘要
1. Establishment of Lithium Coating TechniqueLithium coating with evaporation method is investigated. It was found that the evaporation speed can be easily controlled by the oven temperature around 400 C.To suppress impurity from heated oven, RF inductive heating is used, which effectively heat the lithium itself without heating other materials.2. Chemical reaction of lithium with various gasesChemical reactivity of lithium film with various gases such as O_2, H_2, CH_4 or CO was investigated. It is found that the lithium is highly reactive with the oxygen gas, and the coated lithium film is completely oxidized when the oxygen gas is fed into the vessel. CO and CH_4 are also reactive with lithium, but reaction is limited up to a few monolayrs of lithium film surface. Hydrogen does not react with lithium film.3. Interaction of lithium film with hydrogen plasmaInteraction of lithium film with hydrogen DC glow plasma is investigated. Lithium film absorbs large amount of hydrogen. Hydrogen absorption is almost comparable to the coated lithium, which implies that the one lithium atom reacts with one hydrogen atom, and that the hydrogen penetrates into bulk of lithium film irrespective to the ion implantation range of hydrogen ion into the lithium film (less than a few hundred nano-meters).4. Lithium coating of JIPPT-IIU fusion experiment device.Lithium coating is successfully applied to the JIPPT-IIU fusion experiment device at National Institute for Fusion Science. Lithium (0.5g) is evaporated on the vessel wall of JIPPT-IIU,with coating area of about Im^2. It was found that the hydrogen recycling is reduced in the initial stage of tokamak discharge, and that the oxygen and carbon impurities is reduced.
期刊论文(6)
专著(0)
科研奖励(0)
会议论文
H.Sugai: "Wall Conditioning by Lithium Evaporation" J.Nucl.Mater.(in press).
H.Sugai:“通过锂蒸发进行壁调节”J.Nucl.Mater.(正在印刷中)。
DOI:
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发表时间:
期刊:
影响因子:
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作者:
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通讯作者:
H.Sugai, H.Toyoda, K.Nakamura, K.Furuta, M.Ohori, K.Toi, S.Hirokura and K.Sato: "Wall Conditioning by Lithium Evaporation" J.Nucl.Mater. (in press). (1995)
H.Sugai、H.Toyoda、K.Nakamura、K.Furuta、M.Ohori、K.Toi、S.Hirokura 和 K.Sato:“锂蒸发的墙壁调节”J.Nucl.Mater。
DOI:
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发表时间:
期刊:
影响因子:
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作者:
[]
通讯作者:
Magnet-free microwave sputter deposition with uniform target utilization
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批准号:24654189
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项目类别:Grant-in-Aid for Challenging Exploratory Research
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资助金额:$2.41万
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财政年份:2012
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负责人:TOYODA Hirotaka
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依托单位:
High Precision Measurement of Plasma Density in Atmospheric Pressure Plasma
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批准号:21540509
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项目类别:Grant-in-Aid for Scientific Research (C)
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资助金额:$2.83万
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财政年份:2009
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负责人:TOYODA Hirotaka
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依托单位:
Development of New Magnetron Plasma Source with Particle Energy Control
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批准号:18540489
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项目类别:Grant-in-Aid for Scientific Research (C)
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资助金额:$2.12万
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财政年份:2006
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负责人:TOYODA Hirotaka
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依托单位:
Surface Reaction Processes of Fluorocarbon Molecule and Fundamental Research on New Etching Process
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批准号:15540474
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项目类别:Grant-in-Aid for Scientific Research (C)
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资助金额:$1.98万
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财政年份:2003
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负责人:TOYODA Hirotaka
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依托单位:
Lower-Temperature Deposition of Poly-crystalline Silicon Film by High-Density Plasma
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批准号:09558055
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项目类别:Grant-in-Aid for Scientific Research (B)
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资助金额:$4.29万
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财政年份:1997
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负责人:TOYODA Hirotaka
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依托单位:
Diagnostic and Control of Silane Plasmas by Newlv Developed Radical Measurement Technique
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批准号:07680505
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项目类别:Grant-in-Aid for Scientific Research (C)
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资助金额:$1.28万
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财政年份:1995
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负责人:TOYODA Hirotaka
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依托单位: