Development of New Magnetron Plasma Source with Particle Energy Control

磁控管等离子体广泛应用于多层薄膜的沉积，如光学镀膜、磁记录介质、半导体制造等。薄膜沉积工艺的保真度研究进展，要求在纳米尺度上沉积具有极高光洁度和高界面质量的薄膜。对于具有磁性各向异性的磁性多层膜（Pt/Co等），已知界面的平滑度和抑制原子混合会极大地影响膜的磁性。然而，到目前为止，这种精确的界面控制被认为是溅射沉积过程中非常困难的，了解这种现象的机理和抑制是重要的问题之一。对于多层界面特性的控制，我们重点研究磁控管等离子体中的高能稀有气体。本课题建立了高能稀有气体原子的质谱诊断技术，并对高能稀有气体原子控制的新技术进行了研究。首先，利用带能量分析仪的质谱仪对常规平面直流电浆中Ar原子的能量分布进行了评价。将得到的结果与原始开发的仿真程序进行了比较，验证了测量技术的可行性。接下来，我们提出了两种磁控溅射技术，即VHF-DC叠加磁控溅射等离子体和圆柱形磁控溅射等离子体。通过AM-能量分布测量，证实了VHF-DC和圆柱形磁控管等离子体都能抑制高能Ar原子。最后，将甚高频直流磁控管等离子体源应用于磁性多层膜的沉积。在甚高频直流磁控溅射沉积的情况下，观察到磁性能非常好的多层磁膜，其层厚非常薄，只有几nm，这种良好的膜性能表明，抑制高能Ar原子通量抑制了膜界面处的原子混合。少

Magnetron plasmas are widely used for deposition of mutilayer films such as optical coating, magnetic recording media, semiconductor fabrication, and so on. Recent progress of fidelity in film deposition processes, it is required to deposit film with very high smoothness and high interface quality in nano-scale. In the case of magnetic multilayer films (Pt/Co etc.) those exhibit magnetic anisotropy, it is known that smoothness and suppression of atom mixing at the interface drastically influence the magnetic property of the film. So far, however, such precise interface control of the multilayer films are considered to be very difficult by the sputter deposition process, and understanding of the mechanism and suppression of such phenomena is one of important issues.For the control of the multilayer interface property, we focus on high energy rare gas species in magnetron plasmas. In this project, we established the diagnostic technique of such high energy rare gas atoms by mass spectrom … More etry, and studied on the new technology to control such high energy atoms.At first, we evaluated energy distribution of Ar atom in conventional planer DC magnetron plasma by using a mass spectrometer with an energy analyzer. The obtained results are compared with an originally-developed simulation code and feasibility of the measurement technique was confirmed. Next, we proposed two magnetron sputter techniques, i.e., VHF-DC superimposed magnetron sputter plasma and cylindrical magnetron sputter plasma. From the AM- energy distribution measurement, it was confirmed that both VHF-DC and cylindrical magnetron plasmas can suppress high energy Ar atoms. Finally, VHF-DC magnetron plasma source was applied to the deposition of magnetic multilayer films. In the case of VHF-DC magnetron sputter deposition, magnetic multilayer film with very good magnetic property was observed with very thin layer thickness in order of a few nm. Such good film property suggest that the atom mixing at the film interface was suppressed by suppression of high energy Ar atom flux. Less