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Analysis of Interfacial Phenomena between Plasmas and Solid Surfaces with Microstructure

等离子体与固体表面界面现象的微观结构分析

基本信息

批准号：
06452422
负责人：
TACHIBANA Kunihide
金额：
$ 4.35万
依托单位：
KYOTO UNIVERSITY (1995)Kyoto Institute of Technology (1994)
依托单位国家：
日本
项目类别：
Grant-in-Aid for General Scientific Research (B)
财政年份：
1994
资助国家：
日本
起止时间：
1994 至 1995
项目状态：
已结题

项目摘要

Firstly, fluxes of radicals transported from plasmas to substrates were measured as the boundary condition for surface reactions. The radicals measured are including atomic species such as H,O and N,and molecular species such as SiH_2 and CF_2. Secondly, a new method named FT-IR phase modulated spectroscopic ellipsometry (PMSE) has been developed for in-situ surface diagnostics By this method chemical bonding states on the surface are detected with a high sensitivity.By using these method, surface reactions in the etching of Si wafer was investigated as the first example. A thin fluorinated overlayr was detected on a substrate placed on the self-biased RF electrode, which was irradiated by ions bombarding with appreciable energy in addition to neutral radicals. On the other hand, polymer formation was observed on a substrate placed on the grounded electrode with less ion bombardment. These phenomena are suggested to occur at the bottom and the side wall, respectively, of a micro-trench on a patterned substrate. The effect of ion bombardment are going to be investigated in detail by using a mass spectrometer placed at the bottom of a substrate with micro channels of high aspect ratios.In the other example, roles of SiH_2 and H radicals were studied in the deposition of amorphous and polycrystalline Si films. The characteristics of deposited films were analyzed by in-situ spectroscopic ellipsometry. As an important conclusion, it has been recognized that hydrogen atoms work both in the etching of amorphous tissue and in the chemical annealing of stressed structures for enhancing the crystal growth.Through these studies some methods have been considered for increasing the spatial resolution in the gas-phase and surface diagnostics. With the improved resolution this project has been continued for better understandings of the interaction of plasmas with micro-structured substrates.

首先，测量了从等离子体到底物的自由基通量作为表面反应的边界条件。测定的自由基包括氢、氧、氮等原子种和SiH_2、CF_2等分子种。其次，提出了一种原位表面诊断的新方法——傅里叶红外相位调制光谱椭偏法（PMSE），该方法可以高灵敏度地检测表面的化学键态。利用该方法对硅片刻蚀过程中的表面反应进行了初步研究。在放置在自偏置射频电极上的衬底上检测到薄的氟化覆盖层，该衬底由除中性自由基外具有可观能量的离子轰击照射。另一方面，在放置在接地电极上的基板上观察到聚合物的形成，离子轰击较少。这些现象被认为分别发生在图案衬底上的微沟槽的底部和侧壁。离子轰击的影响将通过放置在具有高宽高比微通道的衬底上的质谱仪来详细研究。在另一个例子中，研究了SiH_2和H自由基在非晶和多晶Si薄膜沉积中的作用。利用原位椭偏光谱分析了沉积膜的特性。作为一个重要的结论，人们已经认识到氢原子在非晶组织的蚀刻和应力结构的化学退火中都起着促进晶体生长的作用。通过这些研究，考虑了一些提高气相和表面诊断空间分辨率的方法。随着分辨率的提高，该项目继续进行，以更好地理解等离子体与微结构衬底的相互作用。