Diagnostics of Gas-Phase and Surface Reactions of Atomic Radicals in Processing Plasmas by Vacuum Ultraviolet Laser Spectroscopy

真空紫外激光光谱诊断等离子体处理中原子自由基的气相和表面反应

• 批准号: 13480126
• 负责人: TACHIBANA Kunihide
• 金额: $ 9.6万
• 依托单位: KYOTO UNIVERSITY
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Scientific Research (B)
• 财政年份: 2001
• 资助国家: 日本
• 起止时间: 2001 至 2002
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/en/grant/KAKENHI-PROJECT-13480126/
• 关键词: Atomic radicals; VUV laser; Absorption spectroscopy; Processing plasma; Carbon atom; Oxygen atom; Hydrogen atom; Fluorine atom; 真空紫外レーザー; 誘導結合プラズマ; 絶対密度測定

Atomic species such as H, C, N, F and Cl play important roles in gas-phase and surface reactions for various kinds of plasma material processing. In this project, we have developed a tunable VUV (vacuum ultra-violet) laser absorption spectroscopy system in the range from 800 to 1700 nm by using the two-photon resonant four-wave mixing method (ν_<VUV> = 2ν_1 + ν_2), and applied it to the diagnostics of those species in order to make clear the reaction mechanisms and obtain the guiding principles for the process control.Following the quantitative measurement on F atoms, we applied the VUV absorption method Successfully to the measurement of C atoms in various kinds of fluorocarbon gas plasmas. The obtained results were analyzed for the role of C atoms in the etching of SiO_2 (see the paper published in J. Appl. Phys for more details). Then, we proceeded to the measurement of O atoms for better understandings of photo-resist ashing and Si oxidation processes.For the measurements of H and N atoms, the wavelengths corresponding to ν_1 and ν_2 become 210 and 800 - 900 nm, respectively, for the VUV generation around 120 nm. Therefore, We have modified the laser system by substituting the pumping excimer laser with a YAG-laser for the better VUV conversion efficiency. As the result, we have succeeded in the measurement of H atoms in H_2 and CH_4 gases, and are continuing the quantitative measurement in the processing plasmas for the surface cleaning and diamond-like carbon deposition.

氢、碳、氮、氟和氯等原子物种在各种等离子体材料加工的气相和表面反应中起着重要作用。本项目采用双光子共振四波混频（ν = 2ν_1 + ν_2）方法，研制了一套波长在800 ~ 1700 nm的可调谐真空紫外激光吸收光谱系统<VUV>，并将其应用于这些物种的诊断，以明确反应机理，为过程控制提供指导原则。在对F原子的测量中，我们成功地将真空紫外吸收法应用于各种氟碳气体等离子体中C原子的测量。分析了C原子在SiO_2刻蚀中的作用（详见J. Appl. Phys发表的论文）。为了更好地理解光刻胶灰化和Si氧化过程，我们对O原子进行了测量;对于H和N原子的测量，V1和V2对应的波长分别为210和800 - 900 nm，对应于120 nm附近的VUV产生。因此，我们对激光系统进行了改进，用YAG激光器代替泵浦准分子激光器，以获得更好的VUV转换效率。结果，我们成功地测量了H_2和CH_4气体中的H原子，并继续在用于表面清洗和类金刚石碳沉积的加工等离子体中进行定量测量。

项目成果

Kunihide Tachibana: "Measurements of atomic carbon density in processing plasmas by vacuum ultraviolet laser, absorption spectroscopy"Journal of Applied Physics. 92・10. 5684-5690 (2002)

Kunihide Tachibana：“通过真空紫外激光、吸收光谱法测量等离子体中的原子碳密度”应用物理杂志92・10（2002）。

T.Yokomizo: "Measurement of atomic radicals using tunable VUV laser absorption spectroscopy"Proceedings of The 20^<th> Symposium on Plasma Processing. 239-240 (2003)

T.Yokomizo：“使用可调谐 VUV 激光吸收光谱测量原子自由基”第 20 届等离子体加工研讨会论文集。

N.Tanaka: "Measurements of atomic carbon density in processing plasmas by vacuum ultraviolet laser absorption spectroscopy"Journal of Applied Physics. 92・10. 5684-5690 (2002)

N. Tanaka：“通过真空紫外激光吸收光谱法测量等离子体中的原子碳密度”应用物理学杂志 92・10（2002 年）。

Kunihide Tachibana: "Measurement of atomic carbon density in processing plasmas by vacuum ultraviolet laser absorption spectroscopy"Proceedings of 15^<th> International Symposium on Plasma Chemistry. Vol.5. 2256-2261 (2001)

Kunihide Tachibana：“通过真空紫外激光吸收光谱法测量处理等离子体中的原子碳密度”第15届国际等离子体化学研讨会论文集。

Kunihide Tachibana: "Diagnostics of plasmas for surface treatment technologies"Abs. Joint Int. Plasma Symp. of 6^<th> APCPST, 15^<th> SPS** OS 2002 & 11^<th> KAPRA.

Kunihide Tachibana：“表面处理技术的等离子体诊断”Abs。