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EXCIMER LASER INDUCED MODIFICATION OF CERAMICS SURFACE

准分子激光诱导陶瓷表面改性

基本信息

批准号：
61460070
负责人：
NAKAYAMA Takeyoshi
金额：
$ 2.11万
依托单位：
KINKI UNIVERSITY
依托单位国家：
日本
项目类别：
Grant-in-Aid for General Scientific Research (B)
财政年份：
1986
资助国家：
日本
起止时间：
1986 至 1987
项目状态：
已结题

项目摘要

The aim of the present project is a surface modification of ceramics by excimer laser implantation. By this technique, it is possible to make a conductive thin layer and/or a special coating film on dielectric materials. The ceramics used in this experiment are quartz (SiO_2), alumina (Al_2O_3) and human dental enamel as hydroxyapatite (Ca_<10>(PO_4)_6(OH)_2). Au atoms were implanted into the oxides and Ag and F atoms were implanted into the enamel. The analysis for implanted part was done by Ratherford backscattering spectroscopy (RBS) for the depth distribution and X-ray micro analysis XMA for the plane distribution.The main features obtained in this project are as follows.1. SiO_2 and Al_2O_3These oxides were irradiated by excimer laser (<lambda>=248nm ,<tau>=23ns ) after vopour deposition of Au atoms on ceramics surface.(1)The amount of implanted Au atoms decreases with increasing irradiation energy density. Maximum amount was obtained at around 0.5 J/cm^2.(2)Maximum depth was 350nm for SiO_2 at [0.5 J/cm^2 and 650nm for Al_2O_3 at [0.2 J/cm^2.(3)The ratio ,Ns/Nb is a function of energy density where Ns and Nb are the amount of Au atoms near surface and in the bulk , respectively.(4)Above experimental results are completely different from that obtained by useing with IR- and visible-laser light.2. Ca_<10>(PO_4)_6(OH)_2In this case , CO_2 laser(<lambda>=10.6<micrn>m ,<tau>=0.5s ) irradiation was done fluoride (Ag(NH_3)_2F)- coated enamel surface.(1)Maximum depth of implanted F atoms was observed at 20 J/cm^2 and was about 1.2<micrn>m. This maximum depth is about 1.7 times larger than the case of an unirradiated enamel.(2)Part of Ag atoms was sputtered from enamel surface by laser irradiation.

本项目的目的是通过准分子激光注入对陶瓷进行表面改性。通过这种技术，可以在介质材料上制造导电薄层和/或特殊涂层。本实验所用陶瓷为石英(SiO_2)、氧化铝(Al_2O_3)和人牙釉质羟基磷灰石(Ca_&lt；10&gt；(PO_4)_6(OH)_2)。将金原子注入氧化物中，将银、氟原子注入牙釉质中。采用Ratherford背散射光谱(RBS)测量深度分布，X射线微区分析XMA分析平面分布，对植入部位进行分析，得出以下主要特点：1.对注入部位进行了X射线显微分析。在陶瓷表面沉积金原子后，用准分子激光(&lt；lambda&gt；=248 nm，&lt；tau&gt；=23 ns)辐照SiO_2和Al_2O_3氧化物：(1)随着辐照能量密度的增加，注入的Au原子量减少。(2)在0.5J/cm~2处，SiO_2的最大深度为350 nm，Al_2O_3在[0.2J/cm~2]处的最大深度为650 nm。(3)NS/Nb是能量密度的函数，其中NS和Nb分别是Au原子在表面附近和体内的数量。在这种情况下，CO_2激光(&lt；lambda&gt；m，&lt；tau&gt；=0.5s)被氟化物(Ag(NH_3)_2F)包覆在牙釉质表面。这一最大深度大约是未辐照牙釉质的1.7倍。(2)激光辐照可使部分银原子从牙釉质表面溅射出来。