Elementary processes of photon, radical, and electron irradiation and their synergetic effects for plasma-surface interaction

光子、自由基和电子辐照的基本过程及其对等离子体-表面相互作用的协同效应

• 批准号: 19204056
• 负责人: HAMAGUCHI Satoshi
• 金额: $ 28.29万
• 依托单位: Osaka University
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Scientific Research (A)
• 财政年份: 2007
• 资助国家: 日本
• 起止时间: 2007 至 2009
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/en/grant/KAKENHI-PROJECT-19204056/
• 关键词: 反応性プラズマ; プラズマプロセス; 膜堆積; プラズマ; 光物性; 分子動力学; 反応性ラジカル; プラズマCVD; プラズマエッチング

The goal of this research is to clarify the interactions between incoming species from the plasma and the surface material in a plasma process and their synergetic effects, i.e., nonlinear effects that cannot be accounted for by superposition of elementary reaction processes. In this study, it has been shown that, under certain conditions, effects of ultraviolet (UV) irradiation from the plasma on etching rates cannot be negligible and the conditions under which damages and relaxation processes caused by hydrogen injection affect the final states of the processed materials have been obtained. With these results, it has been clarified how energies and fluxes of hydrogen and UV irradiations need to be controlled for high-precision plasma processing.

本研究的目的是阐明等离子体过程中来自等离子体的物质与表面物质之间的相互作用及其协同效应，即不能用基本反应过程叠加来解释的非线性效应。本研究表明，在一定条件下，来自等离子体的紫外线照射对蚀刻速率的影响是不可忽略的，并且得到了氢注入引起的损伤和松弛过程影响加工材料最终状态的条件。通过这些结果，阐明了如何控制氢和紫外线辐照的能量和通量以进行高精度等离子体处理。

项目成果

Molecular Dynamics Simulation on Plasma Surface Interaction-from Industrial Plasma Processing to Fusion Applications

等离子体表面相互作用的分子动力学模拟——从工业等离子体处理到聚变应用

• 发表时间: 2009
• 作者: M. Yamashiro;A. Suzuki;M. Isobe;S. Hamaguchi
• 通讯作者: S. Hamaguchi

Atmospheric Pressure Plasmas and Their Biological Applications

大气压等离子体及其生物学应用

• 发表时间: 2009
• 作者: S. Hamaguchi;S. Ikawa;T. Ito;K. Kitano;A. Tani
• 通讯作者: A. Tani

Atmospheric Pressure Plasmas and Their Biological Applications,

大气压等离子体及其生物应用，

• 发表时间: 2009
• 作者: Tetsuyuki Yamada;Akane Mawatari;Makoto Tanabe;Kohtaro Osakada;Tomoaki Tanase;河村公隆;S. Takahashi;T. Harada;T. Koide;H. Yoshida;S.Hamaguchi
• 通讯作者: S.Hamaguchi

CHxFy+イオン照射によるエッチング反応の評価

CHxFy+离子照射的蚀刻反应评价

• 发表时间: 2009
• 作者: Y. Tsuboi;T. Shoji;M. Nishino;S. Masuda;K. Ishimori;N. Kitamura.;神崎正美・薛献宇;伊藤智子
• 通讯作者: 伊藤智子

Measurement of sticking probability and sputtering yield of Au by low-energy mass selected ion beams with a quartz crystal microbalance

石英晶体微天平低能质量选择离子束测量 Au 的粘附概率和溅射产率

• 发表时间: 2008
• 期刊: Journal of Physics: Conference Series 106
• 作者: K. Ikuse;S. Yoshimura;M. Kiuchi;K. Hine;S. Hamaguchi
• 通讯作者: S. Hamaguchi