Elementary processes of photon, radical, and electron irradiation and their synergetic effects for plasma-surface interaction

这项研究的目的是阐明等离子体过程中从等离子体进入的物质与表面材料之间的相互作用及其协同效应，即不能用基本反应过程叠加来解释的非线性效应。研究表明，在一定条件下，等离子体的紫外线(UV)辐照对刻蚀速率的影响是不可忽略的，并得到了注氢引起的损伤和松弛过程影响加工材料最终状态的条件。通过这些结果，阐明了如何控制氢和紫外线辐射的能量和通量，以进行高精度的等离子体处理。

The goal of this research is to clarify the interactions between incoming species from the plasma and the surface material in a plasma process and their synergetic effects, i.e., nonlinear effects that cannot be accounted for by superposition of elementary reaction processes. In this study, it has been shown that, under certain conditions, effects of ultraviolet (UV) irradiation from the plasma on etching rates cannot be negligible and the conditions under which damages and relaxation processes caused by hydrogen injection affect the final states of the processed materials have been obtained. With these results, it has been clarified how energies and fluxes of hydrogen and UV irradiations need to be controlled for high-precision plasma processing.